Jensheng Huang

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compact modeling for the negative tone development processes
- Patent number 10,852,635
- Issue date Dec 1, 2020
- Synopsys, Inc.
- Chun-Chieh Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling mask errors using aerial image sensitivity
- Patent number 8,812,145
- Issue date Aug 19, 2014
- Synopsys, Inc.
- Yongfa Fan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System and technique for modeling resist profile change sensitivity...
- Patent number 8,631,359
- Issue date Jan 14, 2014
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for using aerial image sensitivity to model ma...
- Patent number 8,355,807
- Issue date Jan 15, 2013
- Synopsys, Inc.
- Yongfa Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch-aware OPC model calibration by using an etch bias filter
- Patent number 8,255,838
- Issue date Aug 28, 2012
- Synopsys, Inc.
- Jing Xue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for calibrating a photolithography process mod...
- Patent number 8,250,498
- Issue date Aug 21, 2012
- Synopsys, Inc.
- JenSheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a photolithography process mod...
- Patent number 8,181,128
- Issue date May 15, 2012
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a process model that models th...
- Patent number 7,934,176
- Issue date Apr 26, 2011
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling mask corner rounding effects using multiple mask layers
- Patent number 7,853,919
- Issue date Dec 14, 2010
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining a process model that models th...
- Patent number 7,743,357
- Issue date Jun 22, 2010
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining whether a sub-resolution assis...
- Patent number 7,727,687
- Issue date Jun 1, 2010
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facilitating process model accuracy by modeling mask corner roundin...
- Patent number 7,707,539
- Issue date Apr 27, 2010
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compensating for effects of topography variation by using a variabl...
- Patent number 7,491,479
- Issue date Feb 17, 2009
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for determining an accurate photolithography p...
- Patent number 7,454,739
- Issue date Nov 18, 2008
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPACT MODELING FOR THE NEGATIVE TONE DEVELOPMENT PROCESSES
- Publication number 20190072847
- Publication date Mar 7, 2019
- Synopsys, Inc.
- Chun-Chieh Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODELING MASK ERRORS USING AERIAL IMAGE SENSITIVITY
- Publication number 20130131857
- Publication date May 23, 2013
- Synopsys, Inc.
- Yongfa Fan
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR CALIBRATING A PHOTOLITHOGRAPHY PROCESS MOD...
- Publication number 20110185324
- Publication date Jul 28, 2011
- Synopsys, Inc.
- JenSheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR USING AERIAL IMAGE SENSITIVITY TO MODEL MA...
- Publication number 20110184546
- Publication date Jul 28, 2011
- Synopsys, Inc.
- Yongfa Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCH-AWARE OPC MODEL CALIBRATION BY USING AN ETCH BIAS FILTER
- Publication number 20110179393
- Publication date Jul 21, 2011
- Synopsys, Inc.
- Jing Xue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A PROCESS MODEL THAT MODELS TH...
- Publication number 20100218160
- Publication date Aug 26, 2010
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING MASK CORNER ROUNDING EFFECTS USING MULTIPLE MASK LAYERS
- Publication number 20100146476
- Publication date Jun 10, 2010
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A PHOTOLITHOGRAPHY PROCESS MOD...
- Publication number 20100095264
- Publication date Apr 15, 2010
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACILITATING PROCESS MODEL ACCURACY BY MODELING MASK CORNER ROUNDI...
- Publication number 20090089736
- Publication date Apr 2, 2009
- Synopsys, Inc.
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for determining whether a sub-resolution assis...
- Publication number 20070292777
- Publication date Dec 20, 2007
- Lawrence S. Melvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for determining an accurate photolithography p...
- Publication number 20070283312
- Publication date Dec 6, 2007
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for determining a process model that models th...
- Publication number 20070282574
- Publication date Dec 6, 2007
- Jensheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compensating for effects of topography variation by using a variabl...
- Publication number 20070082281
- Publication date Apr 12, 2007
- Lawrence S. Melvin
- G06 - COMPUTING CALCULATING COUNTING

Jensheng Huang

Person

Patents Grantslast 30 patents

Compact modeling for the negative tone development processes

Modeling mask errors using aerial image sensitivity

System and technique for modeling resist profile change sensitivity...

Method and apparatus for using aerial image sensitivity to model ma...

Etch-aware OPC model calibration by using an etch bias filter

Method and apparatus for calibrating a photolithography process mod...

Method and apparatus for determining a photolithography process mod...

Method and apparatus for determining a process model that models th...

Modeling mask corner rounding effects using multiple mask layers

Method and apparatus for determining a process model that models th...

Method and apparatus for determining whether a sub-resolution assis...

Facilitating process model accuracy by modeling mask corner roundin...

Compensating for effects of topography variation by using a variabl...

Method and apparatus for determining an accurate photolithography p...

Patents Applicationslast 30 patents

COMPACT MODELING FOR THE NEGATIVE TONE DEVELOPMENT PROCESSES

MODELING MASK ERRORS USING AERIAL IMAGE SENSITIVITY

METHOD AND APPARATUS FOR CALIBRATING A PHOTOLITHOGRAPHY PROCESS MOD...

METHOD AND APPARATUS FOR USING AERIAL IMAGE SENSITIVITY TO MODEL MA...

ETCH-AWARE OPC MODEL CALIBRATION BY USING AN ETCH BIAS FILTER

METHOD AND APPARATUS FOR DETERMINING A PROCESS MODEL THAT MODELS TH...

MODELING MASK CORNER ROUNDING EFFECTS USING MULTIPLE MASK LAYERS

METHOD AND APPARATUS FOR DETERMINING A PHOTOLITHOGRAPHY PROCESS MOD...

FACILITATING PROCESS MODEL ACCURACY BY MODELING MASK CORNER ROUNDI...

Method and apparatus for determining whether a sub-resolution assis...

Method and apparatus for determining an accurate photolithography p...

Method and apparatus for determining a process model that models th...

Compensating for effects of topography variation by using a variabl...