Jenspeter Rau

Person

Munchen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for determining local variation of the reflect...
- Patent number 7,408,646
- Issue date Aug 5, 2008
- Infineon Technologies AG
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for measuring an exposure intensity on a wafer
- Patent number 7,400,379
- Issue date Jul 15, 2008
- Infineon Technologies AG
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming an opening in a light-absorbing layer on a mask
- Patent number 7,229,723
- Issue date Jun 12, 2007
- Infineon Technologies AG
- Jenspeter Rau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflection mask and method for fabricating the reflection mask
- Patent number 7,090,948
- Issue date Aug 15, 2006
- Infineon Technologies AG
- Jenspeter Rau
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mirror for lithographic exposure and production method
- Patent number 7,060,399
- Issue date Jun 13, 2006
- Infineon Technologies AG
- Frank-Michael Kamm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive coating material for a substrate and process for exp...
- Patent number 7,029,808
- Issue date Apr 18, 2006
- Infineon Technologies AG
- Jenspeter Rau
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
EUV reflection mask
- Patent number 6,707,123
- Issue date Mar 16, 2004
- Infineon Technologies AG
- Jenspeter Rau
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Photosensitive coating material for a substrate
- Publication number 20060147839
- Publication date Jul 6, 2006
- Infineon Technologies AG
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for determining local variation of the reflect...
- Publication number 20050195414
- Publication date Sep 8, 2005
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for measuring an exposure intensity on a wafer
- Publication number 20050037268
- Publication date Feb 17, 2005
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective mirror for lithographic exposure and production method
- Publication number 20050027905
- Publication date Feb 3, 2005
- Frank-Michael Kamm
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for forming an opening in a light-absorbing layer on a mask
- Publication number 20040197676
- Publication date Oct 7, 2004
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive coating material for a substrate and process for exp...
- Publication number 20040115563
- Publication date Jun 17, 2004
- Jenspeter Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective mirror for lithographic exposure and production method
- Publication number 20040030814
- Publication date Feb 12, 2004
- Frank-Michael Kamm
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflection mask and method for fabricating the reflection mask
- Publication number 20030123605
- Publication date Jul 3, 2003
- Jenspeter Rau
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV reflection mask
- Publication number 20030013216
- Publication date Jan 16, 2003
- Jenspeter Rau
- B82 - NANO-TECHNOLOGY

Jenspeter Rau

Person

Patents Grantslast 30 patents

Method and apparatus for determining local variation of the reflect...

Apparatus for measuring an exposure intensity on a wafer

Method for forming an opening in a light-absorbing layer on a mask

Reflection mask and method for fabricating the reflection mask

Reflective mirror for lithographic exposure and production method

Photosensitive coating material for a substrate and process for exp...

EUV reflection mask

Patents Applicationslast 30 patents

Photosensitive coating material for a substrate

Method and apparatus for determining local variation of the reflect...

Apparatus for measuring an exposure intensity on a wafer

Reflective mirror for lithographic exposure and production method

Method for forming an opening in a light-absorbing layer on a mask

Photosensitive coating material for a substrate and process for exp...

Reflective mirror for lithographic exposure and production method

Reflection mask and method for fabricating the reflection mask

EUV reflection mask