Jerald P. Dykstra

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for controlling a gas cluster ion beam formed...
- Patent number 7,825,389
- Issue date Nov 2, 2010
- TEL Epion Inc.
- John J. Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam size diagnostics and workpiece processing
- Patent number 6,770,874
- Issue date Aug 3, 2004
- Epion Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detector and method for cluster ion beam diagnostics
- Patent number 6,737,643
- Issue date May 18, 2004
- Epion Corporation
- Richard P. Torti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam low mass ion filter
- Patent number 6,635,883
- Issue date Oct 21, 2003
- Epion Corporation
- Richard P. Torti
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ionizer for gas cluster ion beam formation
- Patent number 6,629,508
- Issue date Oct 7, 2003
- Epion Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced etching/smoothing of dielectric surfaces
- Patent number 6,624,081
- Issue date Sep 23, 2003
- Epion Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced etching/smoothing of dielectric surfaces
- Patent number 6,331,227
- Issue date Dec 18, 2001
- Epion Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam implanter for providing cross plane focusing
- Patent number 5,177,366
- Issue date Jan 5, 1993
- Eaton Corporation
- Monroe L. King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced path ion beam implanter
- Patent number 5,091,655
- Issue date Feb 25, 1992
- Eaton Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam pattern control system for an ion implanter
- Patent number 4,943,728
- Issue date Jul 24, 1990
- Eaton Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer rotation control for an ion implanter
- Patent number 4,929,840
- Issue date May 29, 1990
- Eaton Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam implanter control system
- Patent number 4,700,077
- Issue date Oct 13, 1987
- Eaton Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic mass measurement system
- Patent number 4,514,637
- Issue date Apr 30, 1985
- Eaton Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for controlling a gas cluster ion beam formed...
- Publication number 20090140165
- Publication date Jun 4, 2009
- TEL Epion Inc.
- John J. Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ionizer for gas cluster ion beam formation
- Publication number 20020162508
- Publication date Nov 7, 2002
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas cluster ion beam size diagnostics and workpiece processing
- Publication number 20020036261
- Publication date Mar 28, 2002
- Epion Corporation
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced etching/smoothing of dielectric surfaces
- Publication number 20020016079
- Publication date Feb 7, 2002
- Jerald P. Dykstra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detector and method for cluster ion beam diagnostics
- Publication number 20010054686
- Publication date Dec 27, 2001
- Richard P. Torti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas cluster ion beam low mass ion filter
- Publication number 20010033128
- Publication date Oct 25, 2001
- Richard P. Torti
- H01 - BASIC ELECTRIC ELEMENTS

Jerald P. Dykstra

Person

Patents Grantslast 30 patents

Method and apparatus for controlling a gas cluster ion beam formed...

Gas cluster ion beam size diagnostics and workpiece processing

Detector and method for cluster ion beam diagnostics

Gas cluster ion beam low mass ion filter

Ionizer for gas cluster ion beam formation

Enhanced etching/smoothing of dielectric surfaces

Enhanced etching/smoothing of dielectric surfaces

Ion beam implanter for providing cross plane focusing

Reduced path ion beam implanter

Beam pattern control system for an ion implanter

Wafer rotation control for an ion implanter

Ion beam implanter control system

Atomic mass measurement system

Patents Applicationslast 30 patents

Method and apparatus for controlling a gas cluster ion beam formed...

Ionizer for gas cluster ion beam formation

Gas cluster ion beam size diagnostics and workpiece processing

Enhanced etching/smoothing of dielectric surfaces

Detector and method for cluster ion beam diagnostics

Gas cluster ion beam low mass ion filter