Jeroen Hubert Rommers

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Lommel, BE

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Patents Grantslast 30 patents

Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of inspecting a substrate and method of preparing a substrat...
- Patent number 8,435,593
- Issue date May 7, 2013
- ASML Netherlands B.V.
- Rik Teodoor Vangheluwe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of inspecting a substrate and method of preparing a substrat...
- Publication number 20080292780
- Publication date Nov 27, 2008
- ASML NETHERLANDS B.V.
- Rik Teodoor Vangheluwe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY