Jeroen Huijbregtse

Person

Breda, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Optical element and optical system for EUV lithography, and method...
- Patent number 10,690,812
- Issue date Jun 23, 2020
- Carl Zeiss SMT GmbH
- Hermanus Hendricus Petrus Theodorus Bekman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation system and optical device
- Patent number 10,359,710
- Issue date Jul 23, 2019
- ASML Netherlands B.V.
- Hendrikus Gijsbertus Schimmel
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Radiation source-collector and method for manufacture
- Patent number 9,773,578
- Issue date Sep 26, 2017
- ASML Netherlands B.V.
- Alexey Sergeevich Kuznetsov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 8,139,217
- Issue date Mar 20, 2012
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,880,880
- Issue date Feb 1, 2011
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, method of determining a model parameter, de...
- Patent number 7,558,643
- Issue date Jul 7, 2009
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,439,531
- Issue date Oct 21, 2008
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,332,732
- Issue date Feb 19, 2008
- ASML Netherlands, B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,329,888
- Issue date Feb 12, 2008
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,297,971
- Issue date Nov 20, 2007
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
A Radiation System and Optical Device
- Publication number 20180307146
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Hendrikus Gijsbertus SCHIMMEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...
- Publication number 20160187543
- Publication date Jun 30, 2016
- Carl Zeiss SMT GMBH
- Hermanus Hendricus Petrus Theodorus BEKMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radiation Source-Collector and Method for Manufacture
- Publication number 20160012929
- Publication date Jan 14, 2016
- ASML NETHERLANDS B.V.
- Alexey Sergeevich KUZNETSOV
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD OF PRODUCING IT
- Publication number 20120200913
- Publication date Aug 9, 2012
- ASML NETHERLANDS B.V.
- MAARTEN VAN KAMPEN
- G02 - OPTICS
Information Patent Application
HYDROGEN RADICAL GENERATOR
- Publication number 20120006258
- Publication date Jan 12, 2012
- ASML NETHERLANDS B.V.
- Gerard Frans Jozef Schasfoort
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS
- Publication number 20110128520
- Publication date Jun 2, 2011
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20070176128
- Publication date Aug 2, 2007
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060091330
- Publication date May 4, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060086910
- Publication date Apr 27, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081791
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081792
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081790
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20050189502
- Publication date Sep 1, 2005
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, method of determining a model parameter, de...
- Publication number 20050147902
- Publication date Jul 7, 2005
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, method of determining a model parameter, de...
- Publication number 20050123843
- Publication date Jun 9, 2005
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jeroen Huijbregtse

Person

Patents Grantslast 30 patents

Optical element and optical system for EUV lithography, and method...

Radiation system and optical device

Radiation source-collector and method for manufacture

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Lithographic apparatus, method of determining a model parameter, de...

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Patents Applicationslast 30 patents

A Radiation System and Optical Device

OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...

Radiation Source-Collector and Method for Manufacture

REFLECTIVE OPTICAL ELEMENT AND METHOD OF PRODUCING IT

HYDROGEN RADICAL GENERATOR

ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Lithographic apparatus, method of determining a model parameter, de...

Lithographic apparatus, method of determining a model parameter, de...