Jerome S. Hubacek

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for plasma processes and method for manufacture and use t...
- Patent number 8,845,855
- Issue date Sep 30, 2014
- Lam Research Corporation
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon parts having reduced metallic impurity concentration for pl...
- Patent number 7,517,803
- Issue date Apr 14, 2009
- Lam Research Corporation
- Daxing Ren
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for silicon electrode assembly etch rate and etch uniformit...
- Patent number 7,442,114
- Issue date Oct 28, 2008
- Lam Research Corporation
- Tuochuan Huang
- B24 - GRINDING POLISHING
Information Patent Grant
Silicon parts having reduced metallic impurity concentration for pl...
- Patent number 6,846,726
- Issue date Jan 25, 2005
- Lam Research Corporation
- Daxing Ren
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatically clamped edge ring for plasma processing
- Patent number 6,475,336
- Issue date Nov 5, 2002
- Lam Research Corporation
- Jerome Hubacek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution apparatus for semiconductor processing
- Patent number 6,451,157
- Issue date Sep 17, 2002
- Lam Research Corporation
- Jerome Hubacek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing equipment having tiled ceramic liner
- Patent number 6,408,786
- Issue date Jun 25, 2002
- Lam Research Corporation
- William S. Kennedy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing assembly for plasma reaction chamber and us...
- Patent number 6,376,385
- Issue date Apr 23, 2002
- Lam Research Corporation
- John Lilleland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for plasma processes and method for a manufacture and use...
- Patent number 6,194,322
- Issue date Feb 27, 2001
- Lam Research Corporation
- John Lilleland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for plasma processes and method for manufacture and use t...
- Patent number 6,148,765
- Issue date Nov 21, 2000
- Lam Research Corporation
- John Lilleland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for plasma processes and method for manufacture and use t...
- Patent number 6,073,577
- Issue date Jun 13, 2000
- Lam Research Corporation
- John Lilleland
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEV...
- Publication number 20240355650
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20240145272
- Publication date May 2, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE MANUFACTURING OF SILICON COMPONENTS
- Publication number 20230348311
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Seyedalireza TORBATISARRAF
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20230290657
- Publication date Sep 14, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20230045336
- Publication date Feb 9, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEAR NETSHAPE ADDITIVE MANUFACTURING USING LOW TEMPERATURE PLASMA JETS
- Publication number 20220285134
- Publication date Sep 8, 2022
- LAM RESEARCH CORPORATION
- Abhinav Shekhar RAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrode for plasma processes and method for manufacture and use t...
- Publication number 20080026589
- Publication date Jan 31, 2008
- LAM RESEARCH CORPORATION
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for silicon electrode assembly etch rate and etch uniformit...
- Publication number 20060138081
- Publication date Jun 29, 2006
- Lam Research Corporation
- Tuochuan Huang
- B08 - CLEANING
Information Patent Application
Silicon parts having reduced metallic impurity concentration for pl...
- Publication number 20050045593
- Publication date Mar 3, 2005
- Lam Research Corporation
- Daxing Ren
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon parts having reduced metallic impurity concentration for pl...
- Publication number 20040161943
- Publication date Aug 19, 2004
- Daxing Ren
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrode for plasma processes and method for manufacture and use t...
- Publication number 20020127853
- Publication date Sep 12, 2002
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION APPARATUS FOR SEMICONDUCTOR PROCESSING
- Publication number 20020123230
- Publication date Sep 5, 2002
- JEROME HUBACEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrode for plasma processes and method for manufacture and use t...
- Publication number 20010031557
- Publication date Oct 18, 2001
- John Lilleland
- H01 - BASIC ELECTRIC ELEMENTS

Jerome S. Hubacek

Person

Patents Grantslast 30 patents

Integrated dry processes for patterning radiation photoresist patte...

Electrode for plasma processes and method for manufacture and use t...

Silicon parts having reduced metallic impurity concentration for pl...

Methods for silicon electrode assembly etch rate and etch uniformit...

Silicon parts having reduced metallic impurity concentration for pl...

Electrostatically clamped edge ring for plasma processing

Gas distribution apparatus for semiconductor processing

Semiconductor processing equipment having tiled ceramic liner

Method of manufacturing assembly for plasma reaction chamber and us...

Electrode for plasma processes and method for a manufacture and use...

Electrode for plasma processes and method for manufacture and use t...

Electrode for plasma processes and method for manufacture and use t...

Patents Applicationslast 30 patents

DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEV...

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

ADDITIVE MANUFACTURING OF SILICON COMPONENTS

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

NEAR NETSHAPE ADDITIVE MANUFACTURING USING LOW TEMPERATURE PLASMA JETS

Electrode for plasma processes and method for manufacture and use t...

Methods for silicon electrode assembly etch rate and etch uniformit...

Silicon parts having reduced metallic impurity concentration for pl...

Silicon parts having reduced metallic impurity concentration for pl...

Electrode for plasma processes and method for manufacture and use t...

GAS DISTRIBUTION APPARATUS FOR SEMICONDUCTOR PROCESSING

Electrode for plasma processes and method for manufacture and use t...