Jessica Sevanne Kachian

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-limiting and saturating chemical vapor deposition of a silicon...
- Patent number 10,553,425
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Jessica S. Kachian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD silicon monolayer formation method and gate oxide ALD formation...
- Patent number 10,373,824
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Andrew C. Kummel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition through formation of self-assembled monolayers
- Patent number 10,366,878
- Issue date Jul 30, 2019
- Applied Materials, Inc.
- Jessica Sevanne Kachian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface functionalization and passivation with a control layer
- Patent number 10,262,858
- Issue date Apr 16, 2019
- Applied Materials, Inc.
- Naomi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for selective deposition
- Patent number 10,199,215
- Issue date Feb 5, 2019
- Applied Materials, Inc.
- Abhishek Dube
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
FCVD line bending resolution by deposition modulation
- Patent number 9,896,326
- Issue date Feb 20, 2018
- Applied Materials, Inc.
- Jingmei Liang
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
CVD silicon monolayer formation method and gate oxide ALD formation...
- Patent number 9,824,889
- Issue date Nov 21, 2017
- Applied Materials, Inc.
- Andrew C. Kummel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-limiting and saturating chemical vapor deposition of a silicon...
- Patent number 9,773,663
- Issue date Sep 26, 2017
- Applied Materials, Inc.
- Jessica S. Kachian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for selective deposition
- Patent number 9,768,013
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Abhishek Dube
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etch for metal-containing materials
- Patent number 9,711,366
- Issue date Jul 18, 2017
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carbon and/or nitrogen incorporation in silicon based films using s...
- Patent number 9,685,325
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- Mark Saly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-free metal etch
- Patent number 9,472,417
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective etch for metal-containing materials
- Patent number 9,299,582
- Issue date Mar 29, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF TREATING A SUBSTRATE TO FORM A LAYER THEREON FOR APPLICA...
- Publication number 20190326114
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- JESSICA S. KACHIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SELECTIVE DEPOSITION
- Publication number 20190148131
- Publication date May 16, 2019
- Applied Materials, Inc.
- Abhishek DUBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD SILICON MONOLAYER FORMATION METHOD AND GATE OXIDE ALD FORMATION...
- Publication number 20180033610
- Publication date Feb 1, 2018
- Applied Materials, Inc.
- Andrew C. KUMMEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON...
- Publication number 20180019116
- Publication date Jan 18, 2018
- Applied Materials, Inc.
- Jessica S. KACHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SELECTIVE DEPOSITION
- Publication number 20170352531
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Abhishek DUBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Deposition Through Formation Of Self-Assembled Monolayers
- Publication number 20170323781
- Publication date Nov 9, 2017
- Applied Materials, Inc.
- JESSICA SEVANNE KACHIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE FUNCTIONALIZATION AND PASSIVATION WITH A CONTROL LAYER
- Publication number 20170309479
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Naomi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SELECTIVE DEPOSITION
- Publication number 20170084449
- Publication date Mar 23, 2017
- Applied Materials, Inc.
- Abhishek DUBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON...
- Publication number 20170040159
- Publication date Feb 9, 2017
- Applied Materials, Inc.
- Jessica S. KACHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE ALD ON SEMICONDUCTOR AND METALLIC SURFACES
- Publication number 20170040158
- Publication date Feb 9, 2017
- Applied Materials, Inc.
- Jessica S. KACHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FCVD LINE BENDING RESOLUTION BY DEPOSITION MODULATION
- Publication number 20160181089
- Publication date Jun 23, 2016
- Applied Materials, Inc.
- Jingmei LIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH FOR METAL-CONTAINING MATERIALS
- Publication number 20160118268
- Publication date Apr 28, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Carbon and/or Nitrogen Incorporation in Silicon Based Films Using S...
- Publication number 20160020091
- Publication date Jan 21, 2016
- Applied Materials, Inc.
- Mark Saly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD SILICON MONOLAYER FORMATION METHOD AND GATE OXIDE ALD FORMATION...
- Publication number 20150303058
- Publication date Oct 22, 2015
- Applied Materials, Inc.
- Andrew C. KUMMEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH FOR METAL-CONTAINING MATERIALS
- Publication number 20150129545
- Publication date May 14, 2015
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-FREE METAL ETCH
- Publication number 20150129546
- Publication date May 14, 2015
- Applied Materials, Inc.
- Nitin K. Ingle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jessica Sevanne Kachian

Person

Patents Grantslast 30 patents

Self-limiting and saturating chemical vapor deposition of a silicon...

CVD silicon monolayer formation method and gate oxide ALD formation...

Selective deposition through formation of self-assembled monolayers

Surface functionalization and passivation with a control layer

Apparatus and method for selective deposition

FCVD line bending resolution by deposition modulation

CVD silicon monolayer formation method and gate oxide ALD formation...

Self-limiting and saturating chemical vapor deposition of a silicon...

Apparatus and method for selective deposition

Selective etch for metal-containing materials

Carbon and/or nitrogen incorporation in silicon based films using s...

Plasma-free metal etch

Selective etch for metal-containing materials

Patents Applicationslast 30 patents

METHODS OF TREATING A SUBSTRATE TO FORM A LAYER THEREON FOR APPLICA...

APPARATUS AND METHOD FOR SELECTIVE DEPOSITION

CVD SILICON MONOLAYER FORMATION METHOD AND GATE OXIDE ALD FORMATION...

SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON...

APPARATUS AND METHOD FOR SELECTIVE DEPOSITION

Selective Deposition Through Formation Of Self-Assembled Monolayers

SURFACE FUNCTIONALIZATION AND PASSIVATION WITH A CONTROL LAYER

APPARATUS AND METHOD FOR SELECTIVE DEPOSITION

SELF-LIMITING AND SATURATING CHEMICAL VAPOR DEPOSITION OF A SILICON...

LOW TEMPERATURE ALD ON SEMICONDUCTOR AND METALLIC SURFACES

FCVD LINE BENDING RESOLUTION BY DEPOSITION MODULATION

SELECTIVE ETCH FOR METAL-CONTAINING MATERIALS

Carbon and/or Nitrogen Incorporation in Silicon Based Films Using S...

CVD SILICON MONOLAYER FORMATION METHOD AND GATE OXIDE ALD FORMATION...

SELECTIVE ETCH FOR METAL-CONTAINING MATERIALS

PLASMA-FREE METAL ETCH