Ji-Yi Yang

Person

Taoyuan City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming SOI-like structure in a bulk semiconductor substr...
- Patent number 8,673,736
- Issue date Mar 18, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ji-Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-K dielectric metal gate device structure
- Patent number 7,829,949
- Issue date Nov 9, 2010
- Taiwan Semconductor Manufacturing Co., Ltd
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-k dielectric metal gate device structure and method for formin...
- Patent number 7,625,791
- Issue date Dec 1, 2009
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective nitride liner formation for shallow trench isolation
- Patent number 7,327,009
- Issue date Feb 5, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective nitride liner formation for shallow trench isolation
- Patent number 7,176,138
- Issue date Feb 13, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming SOI-like structure in a bulk semiconductor substr...
- Patent number 7,157,350
- Issue date Jan 2, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ji-Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with a dielectric layer and its producing m...
- Patent number 6,284,621
- Issue date Sep 4, 2001
- National Science Council
- Kow-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
High-K dielectric metal gate device structure
- Publication number 20100044800
- Publication date Feb 25, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K DIELECTRIC METAL GATE DEVICE STRUCTURE AND METHOD FOR FORMIN...
- Publication number 20090108365
- Publication date Apr 30, 2009
- Taiwan Semiconductor Manufacturing Co., LTD
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE NITRIDE LINER FORMATION FOR SHALLOW TRENCH ISOLATION
- Publication number 20070105337
- Publication date May 10, 2007
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOI-like structures in a bulk semiconductor substrate
- Publication number 20070063282
- Publication date Mar 22, 2007
- Ji-Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming SOI-like structure in a bulk semiconductor substr...
- Publication number 20070032037
- Publication date Feb 8, 2007
- Ji-Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective nitride liner formation for shallow trench isolation
- Publication number 20060099771
- Publication date May 11, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOI-like structure in a bulk semiconductor substrate and method of...
- Publication number 20050253194
- Publication date Nov 17, 2005
- Ji-Yi Yang
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method of forming SOI-like structure in a bulk semiconductor substr...

High-K dielectric metal gate device structure

High-k dielectric metal gate device structure and method for formin...

Selective nitride liner formation for shallow trench isolation

Selective nitride liner formation for shallow trench isolation

Method of forming SOI-like structure in a bulk semiconductor substr...

Semiconductor structure with a dielectric layer and its producing m...

Patents Applicationslast 30 patents

High-K dielectric metal gate device structure

HIGH-K DIELECTRIC METAL GATE DEVICE STRUCTURE AND METHOD FOR FORMIN...

SELECTIVE NITRIDE LINER FORMATION FOR SHALLOW TRENCH ISOLATION

SOI-like structures in a bulk semiconductor substrate

Method of forming SOI-like structure in a bulk semiconductor substr...

Selective nitride liner formation for shallow trench isolation

SOI-like structure in a bulk semiconductor substrate and method of...