Jian-An Ke

Person

New Taipei City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for semiconductor device fabrication
- Patent number 10,037,920
- Issue date Jul 31, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial growth of doped film for source and drain regions
- Patent number 9,583,393
- Issue date Feb 28, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Asymmetric cyclic deposition and etch process for epitaxial formati...
- Patent number 9,502,298
- Issue date Nov 22, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for semiconductor device fabrication
- Patent number 9,455,200
- Issue date Sep 27, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial growth of doped film for source and drain regions
- Patent number 9,362,175
- Issue date Jun 7, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Asymmetric cyclic depositon and etch process for epitaxial formatio...
- Patent number 9,093,468
- Issue date Jul 28, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial growth of doped film for source and drain regions
- Patent number 8,877,592
- Issue date Nov 4, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR SEMICONDUCTOR DEVICE FABRICATION
- Publication number 20170011968
- Publication date Jan 12, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Epitaxial Growth of Doped Film for Source and Drain Regions
- Publication number 20160284597
- Publication date Sep 29, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Semiconductor Device Fabrication
- Publication number 20160042952
- Publication date Feb 11, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Asymmetric Cyclic Deposition and Etch Process for Epitaxial Formati...
- Publication number 20150318212
- Publication date Nov 5, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL GROWTH OF DOPED FILM FOR SOURCE AND DRAIN REGIONS
- Publication number 20150017776
- Publication date Jan 15, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASYMMETRIC CYCLIC DEPOSITON AND ETCH PROCESS FOR EPITAXIAL FORMATIO...
- Publication number 20140264636
- Publication date Sep 18, 2014
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL GROWTH OF DOPED FILM FOR SOURCE AND DRAIN REGIONS
- Publication number 20140273379
- Publication date Sep 18, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method for semiconductor device fabrication

Epitaxial growth of doped film for source and drain regions

Asymmetric cyclic deposition and etch process for epitaxial formati...

Method for semiconductor device fabrication

Epitaxial growth of doped film for source and drain regions

Asymmetric cyclic depositon and etch process for epitaxial formatio...

Epitaxial growth of doped film for source and drain regions

Patents Applicationslast 30 patents

METHOD FOR SEMICONDUCTOR DEVICE FABRICATION

Epitaxial Growth of Doped Film for Source and Drain Regions

Method for Semiconductor Device Fabrication

Asymmetric Cyclic Deposition and Etch Process for Epitaxial Formati...

EPITAXIAL GROWTH OF DOPED FILM FOR SOURCE AND DRAIN REGIONS

ASYMMETRIC CYCLIC DEPOSITON AND ETCH PROCESS FOR EPITAXIAL FORMATIO...

EPITAXIAL GROWTH OF DOPED FILM FOR SOURCE AND DRAIN REGIONS