Jian Ding

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for interconnecting solar cells
- Patent number 10,693,027
- Issue date Jun 23, 2020
- Alta Devices, Inc.
- Liguang Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Statistical remultiplexing of compressed video segments
- Patent number 8,437,389
- Issue date May 7, 2013
- Software Site Applications, Limited Liability Company
- Ji Zhang
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Process for etching a metal layer suitable for use in photomask fab...
- Patent number 8,202,441
- Issue date Jun 19, 2012
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Statistical remultiplexing of compressed video segments
- Patent number 7,835,437
- Issue date Nov 16, 2010
- Ji Zhang
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
System and method for adaptive operation of storage capacities of R...
- Patent number 7,774,542
- Issue date Aug 10, 2010
- Ji Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of reducing critical dimension bias during fabrication of a...
- Patent number 7,737,040
- Issue date Jun 15, 2010
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for etching a metal layer suitable for use in photomask fab...
- Patent number 7,682,518
- Issue date Mar 23, 2010
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Input/output decoupling system method having a cache for exchanging...
- Patent number 7,640,381
- Issue date Dec 29, 2009
- Ji Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process for etching photomasks
- Patent number 7,521,000
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reticle fabrication using a removable hard mask
- Patent number 7,365,014
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated phase angle and optical critical dimension measurement m...
- Patent number 7,250,309
- Issue date Jul 31, 2007
- Applied Materials, Inc.
- Alfred W. Mak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low ceiling temperature process for a plasma reactor with heated so...
- Patent number 6,818,140
- Issue date Nov 16, 2004
- Jian Ding
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etch process in a single inter-level dielectric etch
- Patent number 6,399,511
- Issue date Jun 4, 2002
- Applied Materials, Inc.
- Betty Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ integrated oxide etch process particularly useful for coppe...
- Patent number 6,380,096
- Issue date Apr 30, 2002
- Applied Materials, Inc.
- Hoiman Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process for selectively etching oxide using fluoropropane or...
- Patent number 6,361,705
- Issue date Mar 26, 2002
- Applied Materials, Inc.
- Ruiping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated self aligned contact etch
- Patent number 6,329,292
- Issue date Dec 11, 2001
- Applied Materials, Inc.
- Raymond Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-density plasma etching of carbon-based low-k materials in a in...
- Patent number 6,284,149
- Issue date Sep 4, 2001
- Applied Materials, Inc.
- Zongyu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High pressure high non-reactive diluent gas content high plasma ion...
- Patent number 6,238,588
- Issue date May 29, 2001
- Applied Materials, Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Counterbore dielectric plasma etch process particularly useful for...
- Patent number 6,211,092
- Issue date Apr 3, 2001
- Applied Materials, Inc.
- Betty Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable process for selectively etching oxide using fluoropropylene...
- Patent number 6,183,655
- Issue date Feb 6, 2001
- Applied Materials, Inc.
- Ruiping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching an oxidized organo-silane film
- Patent number 6,168,726
- Issue date Jan 2, 2001
- Applied Materials, Inc.
- Zongyu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method manifesting a wide process window and using hexafluoropropan...
- Patent number 6,074,959
- Issue date Jun 13, 2000
- Applied Materials, Inc.
- Ruiping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligned contact etch using difluoromethane and trifluoromethane
- Patent number 5,965,035
- Issue date Oct 12, 1999
- Applied Materials, Inc.
- Raymond Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck usable in high density plasma
- Patent number 5,583,737
- Issue date Dec 10, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective coating for dielectric material on wafer support used in...
- Patent number 5,560,780
- Issue date Oct 1, 1996
- Applied Materials, Inc.
- Robert Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck usable in high density plasma
- Patent number 5,539,609
- Issue date Jul 23, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining a dechucking voltage which nullifies a residu...
- Patent number 5,491,603
- Issue date Feb 13, 1996
- Applied Materials, Inc.
- Manoocher Birang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR INTERCONNECTING SOLAR CELLS
- Publication number 20170200846
- Publication date Jul 13, 2017
- Alta Devices, Inc.
- Liguang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVELY COLORING METAL CONTACTS IN OPTOELECTRONIC DE...
- Publication number 20170200835
- Publication date Jul 13, 2017
- Alta Devices, Inc.
- Liguang LAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STATISTICAL REMULTIPLEXING OF COMPRESSED VIDEO SEGMENTS
- Publication number 20110026584
- Publication date Feb 3, 2011
- Ji ZHANG
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...
- Publication number 20100178600
- Publication date Jul 15, 2010
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of reducing critical dimension bias during fabrication of a...
- Publication number 20080096138
- Publication date Apr 24, 2008
- APPLIED MATERIALS, INC.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT M...
- Publication number 20070296980
- Publication date Dec 27, 2007
- ALFRED W. MAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for etching photomasks
- Publication number 20070184354
- Publication date Aug 9, 2007
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...
- Publication number 20070105381
- Publication date May 10, 2007
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for preparing data for encrypted transmission
- Publication number 20050207569
- Publication date Sep 22, 2005
- Exavio, Inc
- Ji Zhang
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Reticle fabrication using a removable hard mask
- Publication number 20050170655
- Publication date Aug 4, 2005
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated phase angle and optical critical dimension measurement m...
- Publication number 20050153564
- Publication date Jul 14, 2005
- APPLIED MATERIALS, INC.
- Alfred W. Mak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma dielectric etch process using a long fluorocarbon
- Publication number 20020142598
- Publication date Oct 3, 2002
- Betty Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low ceiling temperature process for a plasma reactor with heated so...
- Publication number 20020092826
- Publication date Jul 18, 2002
- JIAN DING
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW CEILING TEMPERATURE PROCESS FOR A PLASMA REACTOR WITH HEATED SO...
- Publication number 20010054601
- Publication date Dec 27, 2001
- JIAN DING
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU INTEGRATED OXIDE ETCH PROCESS PARTICULARLY USEFUL FOR COPPE...
- Publication number 20010008226
- Publication date Jul 19, 2001
- HOIMAN HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etch process in a single inter-level dielectric etch
- Publication number 20010004552
- Publication date Jun 21, 2001
- Betty Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etch process in a single inter-level dielectric etch
- Publication number 20010000246
- Publication date Apr 12, 2001
- Betty Tang
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method for interconnecting solar cells

Statistical remultiplexing of compressed video segments

Process for etching a metal layer suitable for use in photomask fab...

Statistical remultiplexing of compressed video segments

System and method for adaptive operation of storage capacities of R...

Method of reducing critical dimension bias during fabrication of a...

Process for etching a metal layer suitable for use in photomask fab...

Input/output decoupling system method having a cache for exchanging...

Process for etching photomasks

Reticle fabrication using a removable hard mask

Integrated phase angle and optical critical dimension measurement m...

Low ceiling temperature process for a plasma reactor with heated so...

Plasma etch process in a single inter-level dielectric etch

In-situ integrated oxide etch process particularly useful for coppe...

Plasma process for selectively etching oxide using fluoropropane or...

Integrated self aligned contact etch

High-density plasma etching of carbon-based low-k materials in a in...

High pressure high non-reactive diluent gas content high plasma ion...

Counterbore dielectric plasma etch process particularly useful for...

Tunable process for selectively etching oxide using fluoropropylene...

Etching an oxidized organo-silane film

Method manifesting a wide process window and using hexafluoropropan...

Self aligned contact etch using difluoromethane and trifluoromethane

Electrostatic chuck usable in high density plasma

Protective coating for dielectric material on wafer support used in...

Electrostatic chuck usable in high density plasma

Method of determining a dechucking voltage which nullifies a residu...

Patents Applicationslast 30 patents

METHOD FOR INTERCONNECTING SOLAR CELLS

METHOD FOR SELECTIVELY COLORING METAL CONTACTS IN OPTOELECTRONIC DE...

STATISTICAL REMULTIPLEXING OF COMPRESSED VIDEO SEGMENTS

PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...

Method of reducing critical dimension bias during fabrication of a...

INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT M...

Process for etching photomasks

PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...

Methods and apparatus for preparing data for encrypted transmission

Reticle fabrication using a removable hard mask

Integrated phase angle and optical critical dimension measurement m...

Plasma dielectric etch process using a long fluorocarbon

Low ceiling temperature process for a plasma reactor with heated so...

LOW CEILING TEMPERATURE PROCESS FOR A PLASMA REACTOR WITH HEATED SO...

IN-SITU INTEGRATED OXIDE ETCH PROCESS PARTICULARLY USEFUL FOR COPPE...

Plasma etch process in a single inter-level dielectric etch

Plasma etch process in a single inter-level dielectric etch