JIAN MA

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Advanced mask patterning with patterning layer
- Patent number 8,734,660
- Issue date May 27, 2014
- Intel Corporation
- Jian Ma
- B44 - DECORATIVE ARTS
Information Patent Grant
Advanced mask patterning with patterning layer
- Patent number 7,460,209
- Issue date Dec 2, 2008
- Intel Corporation
- Jian Ma
- B44 - DECORATIVE ARTS

Patents Applicationslast 30 patents

Information Patent Application
Phase-shift photomask and patterning method
- Publication number 20110159411
- Publication date Jun 30, 2011
- Bennett Olson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADVANCED MASK PATTERNING WITH PATTERNING LAYER
- Publication number 20080308527
- Publication date Dec 18, 2008
- Intel Corporation
- JIAN MA
- B44 - DECORATIVE ARTS
Information Patent Application
Advanced mask patterning with patterning layer
- Publication number 20060215135
- Publication date Sep 28, 2006
- Jian Ma
- B44 - DECORATIVE ARTS