Jian Zhang

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Iodate-containing chemical-mechanical polishing compositions and me...
- Patent number 8,551,202
- Issue date Oct 8, 2013
- Cabot Microelectronics Corporation
- Shoutian Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions for CMP of semiconductor materials
- Patent number 8,529,680
- Issue date Sep 10, 2013
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions and methods for CMP of semiconductor materials
- Patent number 7,803,203
- Issue date Sep 28, 2010
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tribo-chronoamperometry as a tool for CMP application
- Patent number 7,497,938
- Issue date Mar 3, 2009
- Cabot Microelectronics Corporation
- Jian Zhang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Compositions and methods for tantalum CMP
- Patent number 7,316,603
- Issue date Jan 8, 2008
- Cabot Microelectronics Corporation
- Phillip W. Carter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polymeric inhibitors for enhanced planarization
- Patent number 7,311,856
- Issue date Dec 25, 2007
- Cabot Microelectronics Corporation
- Renjie Zhou
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Real time polishing process monitoring
- Patent number 7,052,364
- Issue date May 30, 2006
- Cabot Microelectronics Corporation
- Jian Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Method of polishing a substrate with a polishing system containing...
- Patent number 7,021,993
- Issue date Apr 4, 2006
- Cabot Microelectronics Corporation
- Jian Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition containing conducting polymer
- Patent number 6,811,474
- Issue date Nov 2, 2004
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTIVALENT GLYCAN MICROARRAY PLATFORM
- Publication number 20220099666
- Publication date Mar 31, 2022
- Z Biotech, LLC
- Jian ZHANG
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
Multivalent Glycan Microarray Platform
- Publication number 20190128881
- Publication date May 2, 2019
- Z Biotech, LLC
- Jian ZHANG
- C40 - COMBINATORIAL CHEMISTRY
Information Patent Application
COMPOSITIONS FOR CMP OF SEMICONDUCTOR MATERIALS
- Publication number 20100314576
- Publication date Dec 16, 2010
- Cabot Microelectronics Corporation
- Francesco DE REGE THESAURO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP method for copper-containing substrates
- Publication number 20070249167
- Publication date Oct 25, 2007
- Cabot Microelectronics Corporation
- Jian Zhang
- B24 - GRINDING POLISHING
Information Patent Application
Iodate-containing chemical-mechanical polishing compositions and me...
- Publication number 20070224919
- Publication date Sep 27, 2007
- Cabot Microelectronics Corporation
- Shoutian Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS
- Publication number 20070181535
- Publication date Aug 9, 2007
- Cabot Microelectronics Corporation
- Francesco De Rege Thesauro
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polymeric inhibitors for enhanced planarization
- Publication number 20060226126
- Publication date Oct 12, 2006
- Cabot Microelectronics Corporation
- Renjie Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Tribo-chronoamperometry as a tool for CMP application
- Publication number 20060213781
- Publication date Sep 28, 2006
- Cabot Microelectronics Corporation
- Jian Zhang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Compositions and methods for tantalum CMP
- Publication number 20060030158
- Publication date Feb 9, 2006
- Cabot Microelectronics
- Phillip W. Carter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Real time polishing process monitoring
- Publication number 20050277365
- Publication date Dec 15, 2005
- Cabot Microelectronics Corporation
- Jian Zhang
- B24 - GRINDING POLISHING
Information Patent Application
Electrochemical-mechanical polishing composition and method for usi...
- Publication number 20050263407
- Publication date Dec 1, 2005
- Cabot Microelectronics Corporation
- Vlasta Brusic
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of polishing a substrate with a polishing system containing...
- Publication number 20040014398
- Publication date Jan 22, 2004
- Cabot Microelectronics Corporation
- Jian Zhang
- B24 - GRINDING POLISHING
Information Patent Application
Polishing composition containing conducting polymer
- Publication number 20040014400
- Publication date Jan 22, 2004
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Iodate-containing chemical-mechanical polishing compositions and me...

Compositions for CMP of semiconductor materials

Compositions and methods for CMP of semiconductor materials

Tribo-chronoamperometry as a tool for CMP application

Compositions and methods for tantalum CMP

Polymeric inhibitors for enhanced planarization

Real time polishing process monitoring

Method of polishing a substrate with a polishing system containing...

Polishing composition containing conducting polymer

Patents Applicationslast 30 patents

MULTIVALENT GLYCAN MICROARRAY PLATFORM

Multivalent Glycan Microarray Platform

COMPOSITIONS FOR CMP OF SEMICONDUCTOR MATERIALS

CMP method for copper-containing substrates

Iodate-containing chemical-mechanical polishing compositions and me...

COMPOSITIONS AND METHODS FOR CMP OF SEMICONDUCTOR MATERIALS

Polymeric inhibitors for enhanced planarization

Tribo-chronoamperometry as a tool for CMP application

Compositions and methods for tantalum CMP

Real time polishing process monitoring

Electrochemical-mechanical polishing composition and method for usi...

Method of polishing a substrate with a polishing system containing...

Polishing composition containing conducting polymer