Jiancheng Zhang

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Photolithography plate and mask correction method
- Patent number 10,990,000
- Issue date Apr 27, 2021
- Semiconductor Manufacturing (Shanghai) International Corporation
- Jiancheng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOLITHOGRAPHY PLATE AND MASK CORRECTION METHOD
- Publication number 20190179226
- Publication date Jun 13, 2019
- SEMICONDUCTOR MANUFACTURING INTERNATIONAL (Shangha i) CORPORATION
- Jiancheng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY