Jiangwei Li

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Correction for flare effects in lithography system
- Patent number 10,423,745
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for cost function based simultaneous OPC and S...
- Patent number 9,619,607
- Issue date Apr 11, 2017
- ASML Netherlands B.V.
- Jun Tao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multivariable solver for optical proximity correction
- Patent number 8,938,699
- Issue date Jan 20, 2015
- ASML Netherlands B.V.
- William S. Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction for flare effects in lithography system
- Patent number 8,887,104
- Issue date Nov 11, 2014
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for process window optimized optical proximity correction
- Patent number 8,832,610
- Issue date Sep 9, 2014
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for cost function based simultaneous OPC and S...
- Patent number 8,812,998
- Issue date Aug 19, 2014
- ASML Netherlands B.V.
- Jun Tao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of pattern selection for source and mask optimization
- Patent number 8,739,082
- Issue date May 27, 2014
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for performing pattern decomposition for a full chip design
- Patent number 8,572,521
- Issue date Oct 29, 2013
- ASML Netherlands B.V.
- Luoqui Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multivariable solver for optical proximity correction
- Patent number 8,448,099
- Issue date May 21, 2013
- ASML Netherlands B.V.
- William S. Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for process window optimized optical proximity correction
- Patent number 8,413,081
- Issue date Apr 2, 2013
- ASML Netherlands B.V.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multivariable solver for optical proximity correction
- Patent number 8,291,352
- Issue date Oct 16, 2012
- ASML Netherlands B.V.
- William S. Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multivariable solver for optical proximity correction
- Patent number 7,707,538
- Issue date Apr 27, 2010
- Brion Technologies, Inc.
- William S. Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for process window optimized optical proximity correction
- Patent number 7,694,267
- Issue date Apr 6, 2010
- Brion Technologies, Inc.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20150058815
- Publication date Feb 26, 2015
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR COST FUNCTION BASED SIMULTANEOUS OPC AND S...
- Publication number 20140359543
- Publication date Dec 4, 2014
- ASML NETHERLANDS B.V.
- Jun Tao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION
- Publication number 20130311959
- Publication date Nov 21, 2013
- ASML NETHERLANDS B.V.
- William S. WONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PROCESS WINDOW OPTIMIZED OPTICAL PROXIMITY CORRECTION
- Publication number 20130219348
- Publication date Aug 22, 2013
- ASML NETHERLANDS B.V.
- Jun YE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20130185681
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Multivariable Solver for Optical Proximity Correction
- Publication number 20130042212
- Publication date Feb 14, 2013
- ASML NETHERLANDS B.V.
- William S. Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Cost Function Based Simultaneous OPC and S...
- Publication number 20130000505
- Publication date Jan 3, 2013
- ASML NETHERLANDS B.V.
- Jun Tao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Pattern Selection for Source and Mask Optimization
- Publication number 20120216156
- Publication date Aug 23, 2012
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR PROCESS WINDOW OPTIMIZED OPTICAL PROXIMITY CORRECTION
- Publication number 20100180251
- Publication date Jul 15, 2010
- Brion Technology, Inc.
- Jun Ye
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION
- Publication number 20100161093
- Publication date Jun 24, 2010
- Brion Technology, Inc.
- William S. Wong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION
- Publication number 20080309897
- Publication date Dec 18, 2008
- BRION TECHNOLOGIES, INC.
- William S. WONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jiangwei Li

Person

Patents Grantslast 30 patents

Correction for flare effects in lithography system

Method and apparatus for cost function based simultaneous OPC and S...

Multivariable solver for optical proximity correction

Correction for flare effects in lithography system

Method for process window optimized optical proximity correction

Method and apparatus for cost function based simultaneous OPC and S...

Method of pattern selection for source and mask optimization

Method for performing pattern decomposition for a full chip design

Multivariable solver for optical proximity correction

Method for process window optimized optical proximity correction

Multivariable solver for optical proximity correction

Multivariable solver for optical proximity correction

Method for process window optimized optical proximity correction

Patents Applicationslast 30 patents

CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM

METHOD AND APPARATUS FOR COST FUNCTION BASED SIMULTANEOUS OPC AND S...

MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION

METHOD FOR PROCESS WINDOW OPTIMIZED OPTICAL PROXIMITY CORRECTION

CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM

Multivariable Solver for Optical Proximity Correction

Method and Apparatus for Cost Function Based Simultaneous OPC and S...

Method of Pattern Selection for Source and Mask Optimization

METHOD FOR PROCESS WINDOW OPTIMIZED OPTICAL PROXIMITY CORRECTION

MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION

MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION