JIANHUA JU

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Patterning method
- Patent number 10,427,185
- Issue date Oct 1, 2019
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Transistor and fabrication method thereof
- Patent number 10,056,301
- Issue date Aug 21, 2018
- Semiconductor Manufacturing International (Shanghai) Corporation
- Fei Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor
- Patent number 9,853,030
- Issue date Dec 26, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Mieno Fumitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and fabrication method thereof, and static...
- Patent number 9,607,995
- Issue date Mar 28, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jianhua Ju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning apparatus and patterning methods thereof
- Patent number 9,547,236
- Issue date Jan 17, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- Qiang Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
FinFET device and fabrication method thereof
- Patent number 9,514,994
- Issue date Dec 6, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jianhua Ju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin-type field effect transistor and manufacturing method thereof
- Patent number 9,455,255
- Issue date Sep 27, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- JianHua Ju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field effect transistor and method for forming the same
- Patent number 9,362,286
- Issue date Jun 7, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Mieno Fumitake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and adjusting thresh...
- Patent number 9,331,084
- Issue date May 3, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jianhua Ju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for circuit layout and rapid thermal annealing method for se...
- Patent number 8,392,863
- Issue date Mar 5, 2013
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jianhua Ju
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Rapid thermal annealing method for a semiconductor device
- Patent number 8,249,737
- Issue date Aug 21, 2012
- Semiconductor Manufacturing International (Shanghai) Corp.
- Jianhua Ju
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TRANSISTOR, SEMICONDUCTOR STRUCTURE, AND FABRICATION METHOD THEREOF
- Publication number 20170365527
- Publication date Dec 21, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- FEI ZHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHOD
- Publication number 20170080456
- Publication date Mar 23, 2017
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FIN FIELD EFFECT TRANSISTOR
- Publication number 20160247807
- Publication date Aug 25, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- MIENO FUMITAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET DEVICE AND FABRICATION METHOD THEREOF
- Publication number 20160197017
- Publication date Jul 7, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- JIANHUA JU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF, AND STATIC...
- Publication number 20160197085
- Publication date Jul 7, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jianhua Ju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN-TYPE FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF
- Publication number 20150311201
- Publication date Oct 29, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- JianHua JU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20150311125
- Publication date Oct 29, 2015
- Semiconductor Manufacturing International (Beijing) Corporation
- Jianhua JU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING APPARATUS AND PATTERNING METHODS THEREOF
- Publication number 20150205209
- Publication date Jul 23, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- QIANG WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20150200194
- Publication date Jul 16, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jianhua JU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD EFFECT TRANSISTOR AND METHOD FOR FORMING THE SAME
- Publication number 20150171085
- Publication date Jun 18, 2015
- Semiconductor Manufacturing International (Shanghai) Corporation
- MIENO FUMITAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Design Method for Circuit Layout and Rapid Thermal Annealing Method...
- Publication number 20110078647
- Publication date Mar 31, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jianhua Ju
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Rapid Thermal Annealing Method for a Semiconductor Device
- Publication number 20110066270
- Publication date Mar 17, 2011
- Semiconductor Manufacturing International (Shanghai) Corporation
- Jianhua Ju
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Patterning method

Transistor and fabrication method thereof

Fin field effect transistor

Semiconductor structure and fabrication method thereof, and static...

Patterning apparatus and patterning methods thereof

FinFET device and fabrication method thereof

Fin-type field effect transistor and manufacturing method thereof

Fin field effect transistor and method for forming the same

Method of manufacturing a semiconductor device and adjusting thresh...

Method for circuit layout and rapid thermal annealing method for se...

Rapid thermal annealing method for a semiconductor device

Patents Applicationslast 30 patents

TRANSISTOR, SEMICONDUCTOR STRUCTURE, AND FABRICATION METHOD THEREOF

PATTERNING METHOD

FIN FIELD EFFECT TRANSISTOR

FINFET DEVICE AND FABRICATION METHOD THEREOF

SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF, AND STATIC...

FIN-TYPE FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

PATTERNING APPARATUS AND PATTERNING METHODS THEREOF

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

FIN FIELD EFFECT TRANSISTOR AND METHOD FOR FORMING THE SAME

Design Method for Circuit Layout and Rapid Thermal Annealing Method...

Rapid Thermal Annealing Method for a Semiconductor Device