Jianhui Shan

Person

Branchburg, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compositions and processes for self-assembly of block copolymers
- Patent number 11,067,893
- Issue date Jul 20, 2021
- Merck Patent GmbH
- Hengpeng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions and use thereof for modification of substrate surfaces
- Patent number 10,155,879
- Issue date Dec 18, 2018
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Guanyang Lin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Compositions and processes for self-assembly of block copolymers
- Patent number 9,574,104
- Issue date Feb 21, 2017
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- JiHoon Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer composition for promoting self assembly and method of ma...
- Patent number 9,093,263
- Issue date Jul 28, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antireflective coating composition and process thereof
- Patent number 8,906,590
- Issue date Dec 9, 2014
- AZ Electronic Materials USA Corp.
- Dalil M Rahman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective compositions and methods of using same
- Patent number 8,507,192
- Issue date Aug 13, 2013
- AZ Electronic Materials USA Corp.
- Huirong Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions
- Patent number 8,221,965
- Issue date Jul 17, 2012
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective compositions for photoresists
- Patent number 7,691,556
- Issue date Apr 6, 2010
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective composition for photoresists
- Patent number 7,638,262
- Issue date Dec 29, 2009
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for making polyesters
- Patent number 7,081,511
- Issue date Jul 25, 2006
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Modified alginic acid of alginic acid derivatives and thermosetting...
- Patent number 7,008,476
- Issue date Mar 7, 2006
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
NOVEL COMPOSITIONS AND PROCESSES FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS
- Publication number 20200019062
- Publication date Jan 16, 2020
- RIDGEFIELD ACQUISITION
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOSITIONS AND USE THEREOF FOR MODIFICATION OF SUBSTRATE SU...
- Publication number 20170174931
- Publication date Jun 22, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Guanyang Lin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MA...
- Publication number 20150093912
- Publication date Apr 2, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF
- Publication number 20120251943
- Publication date Oct 4, 2012
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF
- Publication number 20120251956
- Publication date Oct 4, 2012
- AZ Electronic Materials USA Corp.
- M. Dalil RAHMAN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Compositions and Methods of Using Same
- Publication number 20110200938
- Publication date Aug 18, 2011
- Huirong Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spin On Organic Antireflective Coating Composition Comprising Polym...
- Publication number 20100316949
- Publication date Dec 16, 2010
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20100009293
- Publication date Jan 14, 2010
- Huirong Yao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Composition
- Publication number 20090042133
- Publication date Feb 12, 2009
- Zhong Xiang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Underlayer Coating Composition Based on a Crosslinkable Polymer
- Publication number 20090035704
- Publication date Feb 5, 2009
- Hong Zhuang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20080286689
- Publication date Nov 20, 2008
- Hong Zhuang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective composition for photoresists
- Publication number 20080038659
- Publication date Feb 14, 2008
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective compositions for photoresists
- Publication number 20060057501
- Publication date Mar 16, 2006
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective compositions for photoresists
- Publication number 20060058468
- Publication date Mar 16, 2006
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for making polyesters
- Publication number 20050234201
- Publication date Oct 20, 2005
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Modified alginic acid of alginic acid derivatives and thermosetting...
- Publication number 20040253532
- Publication date Dec 16, 2004
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Jianhui Shan

Person

Patents Grantslast 30 patents

Compositions and processes for self-assembly of block copolymers

Compositions and use thereof for modification of substrate surfaces

Compositions and processes for self-assembly of block copolymers

Underlayer composition for promoting self assembly and method of ma...

Antireflective coating composition and process thereof

Antireflective compositions and methods of using same

Antireflective coating compositions

Antireflective compositions for photoresists

Antireflective composition for photoresists

Process for making polyesters

Modified alginic acid of alginic acid derivatives and thermosetting...

Patents Applicationslast 30 patents

NOVEL COMPOSITIONS AND PROCESSES FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS

NOVEL COMPOSITIONS AND USE THEREOF FOR MODIFICATION OF SUBSTRATE SU...

UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MA...

ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF

ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF

Antireflective Compositions and Methods of Using Same

Spin On Organic Antireflective Coating Composition Comprising Polym...

Antireflective Coating Compositions

Antireflective Coating Composition

Underlayer Coating Composition Based on a Crosslinkable Polymer

Antireflective Coating Compositions

Antireflective composition for photoresists

Antireflective compositions for photoresists

Antireflective compositions for photoresists

Process for making polyesters

Modified alginic acid of alginic acid derivatives and thermosetting...