Jianping Zhao

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cyclic low temperature film growth processes
- Patent number 12,176,204
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing with broadband RF waveforms
- Patent number 12,020,902
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband plasma processing systems and methods
- Patent number 11,830,709
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask deposition using direct current superimposed radio freque...
- Patent number 11,773,484
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electric pressure systems for control of plasma properties and unif...
- Patent number 11,728,135
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cyclic low temperature film growth processes
- Patent number 11,605,536
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Quantification of processing chamber species by electron energy sweep
- Patent number 11,430,643
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance matching apparatus and control method
- Patent number 11,348,761
- Issue date May 31, 2022
- Tokyo Electron Limited
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband plasma processing systems and methods
- Patent number 11,295,937
- Issue date Apr 5, 2022
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broadband plasma processing systems and methods
- Patent number 11,170,981
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system with synchronized signal modulation
- Patent number 10,991,554
- Issue date Apr 27, 2021
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma device
- Patent number 10,796,916
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cell resonator microwave surface-wave plasma apparatus
- Patent number 10,424,462
- Issue date Sep 24, 2019
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-ambipolar electric pressure plasma uniformity control
- Patent number 10,388,528
- Issue date Aug 20, 2019
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low electron temperature, edge-density enhanced, surface-wave plasm...
- Patent number 10,375,812
- Issue date Aug 6, 2019
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling etch rate drift and particles during plasma processing
- Patent number 10,354,837
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generation and control using a DC ring
- Patent number 10,354,841
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Top dielectric quartz plate and slot antenna concept
- Patent number 9,947,516
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,947,515
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma device
- Patent number 9,941,126
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma device
- Patent number 9,934,974
- Issue date Apr 3, 2018
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for high precision etching of substrates
- Patent number 9,881,804
- Issue date Jan 30, 2018
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dipole ring magnet assisted microwave radial line slot antenna plas...
- Patent number 9,852,893
- Issue date Dec 26, 2017
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,793,095
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma tuning rods in microwave resonator plasma sources
- Patent number 9,728,416
- Issue date Aug 8, 2017
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scalable and uniformity controllable diffusion plasma source
- Patent number 9,431,218
- Issue date Aug 30, 2016
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency (RF) power coupling system utilizing multiple RF po...
- Patent number 9,396,900
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Barton Lane
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma tuning rods in microwave resonator processing systems
- Patent number 9,396,955
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low electron temperature, edge-density enhanced, surface wave plasm...
- Patent number 9,301,383
- Issue date Mar 29, 2016
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electric pressure systems for control of plasma properties and unif...
- Patent number 9,209,032
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Impedance Matching Network and Control Method
- Publication number 20240321552
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS
- Publication number 20240312766
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALD PROCESS WITH PLASMA TREATMENT
- Publication number 20240203706
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VHF Broadband Coaxial Adapter
- Publication number 20240170256
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing with Broadband RF Waveforms
- Publication number 20240021410
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK DEPOSITION USING DIRECT CURRENT SUPERIMPOSED RADIO FREQUE...
- Publication number 20230399739
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems and Methods for Plasma Process
- Publication number 20230386789
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Charles Schlechte
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cyclic Low Temperature Film Growth Processes
- Publication number 20230154745
- Publication date May 18, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Enhanced Film Formation Method
- Publication number 20230143204
- Publication date May 11, 2023
- TOKYO ELECTRON LIMITED
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS SURFACE MONITORING
- Publication number 20220380896
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Quantification of Processing Chamber Species by Electron Energy Sweep
- Publication number 20220102123
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC LOW TEMPERATURE FILM GROWTH PROCESSES
- Publication number 20220093395
- Publication date Mar 24, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Impedance Matching Apparatus and Control Method
- Publication number 20220076923
- Publication date Mar 10, 2022
- TOKYO ELECTRON LIMITED
- John Carroll
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Broadband Plasma Processing Systems and Methods
- Publication number 20220028659
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hard Mask Deposition Using Direct Current Superimposed Radio Freque...
- Publication number 20210404055
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing System with Synchronized Signal Modulation
- Publication number 20210249226
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BROADBAND PLASMA PROCESSING SYSTEMS AND METHODS
- Publication number 20210082666
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Broadband Plasma Processing Systems and Methods
- Publication number 20210082667
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM WITH SYNCHRONIZED SIGNAL MODULATION
- Publication number 20190148113
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA DEVICE
- Publication number 20180226255
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING ETCH RATE DRIFT AND PARTICLES DURING PLASMA PROCESSING
- Publication number 20180138016
- Publication date May 17, 2018
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Generation and Control Using a DC Ring
- Publication number 20160300738
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIPOLE RING MAGNET ASSISTED MICROWAVE RADIAL LINE SLOT ANTENNA PLAS...
- Publication number 20160293389
- Publication date Oct 6, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL
- Publication number 20160268136
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR HIGH PRECISION ETCHING OF SUBSTRATES
- Publication number 20160218011
- Publication date Jul 28, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ELECTRON TEMPERATURE, EDGE-DENSITY ENHANCED, SURFACE-WAVE PLASM...
- Publication number 20160212833
- Publication date Jul 21, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRIC PRESSURE SYSTEMS FOR CONTROL OF PLASMA PROPERTIES AND UNIF...
- Publication number 20160056018
- Publication date Feb 25, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Top Dielectric Quartz Plate and Slot Antenna Concept
- Publication number 20150348761
- Publication date Dec 3, 2015
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING ETCH RATE DRIFT AND PARTICLES DURING PLASMA PROCESSING
- Publication number 20150126036
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CELL RESONATOR MICROWAVE SURFACE-WAVE PLASMA APPARATUS
- Publication number 20150126046
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS

Jianping Zhao

Person

Patents Grantslast 30 patents

Cyclic low temperature film growth processes

Plasma processing with broadband RF waveforms

Broadband plasma processing systems and methods

Hard mask deposition using direct current superimposed radio freque...

Electric pressure systems for control of plasma properties and unif...

Cyclic low temperature film growth processes

Quantification of processing chamber species by electron energy sweep

Impedance matching apparatus and control method

Broadband plasma processing systems and methods

Broadband plasma processing systems and methods

Plasma processing system with synchronized signal modulation

Microwave plasma device

Multi-cell resonator microwave surface-wave plasma apparatus

Non-ambipolar electric pressure plasma uniformity control

Low electron temperature, edge-density enhanced, surface-wave plasm...

Controlling etch rate drift and particles during plasma processing

Plasma generation and control using a DC ring

Top dielectric quartz plate and slot antenna concept

Microwave surface-wave plasma device

Microwave plasma device

Microwave plasma device

Method and system for high precision etching of substrates

Dipole ring magnet assisted microwave radial line slot antenna plas...

Microwave surface-wave plasma device

Plasma tuning rods in microwave resonator plasma sources

Scalable and uniformity controllable diffusion plasma source

Radio frequency (RF) power coupling system utilizing multiple RF po...

Plasma tuning rods in microwave resonator processing systems

Low electron temperature, edge-density enhanced, surface wave plasm...

Electric pressure systems for control of plasma properties and unif...

Patents Applicationslast 30 patents

Impedance Matching Network and Control Method

PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS

ALD PROCESS WITH PLASMA TREATMENT

VHF Broadband Coaxial Adapter

Plasma Processing with Broadband RF Waveforms

HARD MASK DEPOSITION USING DIRECT CURRENT SUPERIMPOSED RADIO FREQUE...

Systems and Methods for Plasma Process

Cyclic Low Temperature Film Growth Processes

Plasma Enhanced Film Formation Method

SEMICONDUCTOR PROCESS SURFACE MONITORING

Quantification of Processing Chamber Species by Electron Energy Sweep

CYCLIC LOW TEMPERATURE FILM GROWTH PROCESSES

Impedance Matching Apparatus and Control Method

Broadband Plasma Processing Systems and Methods

Hard Mask Deposition Using Direct Current Superimposed Radio Freque...

Plasma Processing System with Synchronized Signal Modulation

BROADBAND PLASMA PROCESSING SYSTEMS AND METHODS

Broadband Plasma Processing Systems and Methods

PLASMA PROCESSING SYSTEM WITH SYNCHRONIZED SIGNAL MODULATION

MICROWAVE PLASMA DEVICE

CONTROLLING ETCH RATE DRIFT AND PARTICLES DURING PLASMA PROCESSING

Plasma Generation and Control Using a DC Ring

DIPOLE RING MAGNET ASSISTED MICROWAVE RADIAL LINE SLOT ANTENNA PLAS...

NON-AMBIPOLAR ELECTRIC PRESSURE PLASMA UNIFORMITY CONTROL

METHOD AND SYSTEM FOR HIGH PRECISION ETCHING OF SUBSTRATES

LOW ELECTRON TEMPERATURE, EDGE-DENSITY ENHANCED, SURFACE-WAVE PLASM...

ELECTRIC PRESSURE SYSTEMS FOR CONTROL OF PLASMA PROPERTIES AND UNIF...

Top Dielectric Quartz Plate and Slot Antenna Concept

CONTROLLING ETCH RATE DRIFT AND PARTICLES DURING PLASMA PROCESSING

MULTI-CELL RESONATOR MICROWAVE SURFACE-WAVE PLASMA APPARATUS