Jihui Huang

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Mask bias approximation
- Patent number 10,705,420
- Issue date Jul 7, 2020
- ASML US, LLC
- Song Lan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Application of FreeForm MRC to SRAF optimization based on ILT mask...
- Patent number 10,656,530
- Issue date May 19, 2020
- ASML US, LLC
- Jihui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern generation based on fast marching method
- Patent number 10,578,963
- Issue date Mar 3, 2020
- ASML US, LLC
- Yuan He
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full chip lithographic mask generation
- Patent number 10,146,124
- Issue date Dec 4, 2018
- Xtal, Inc.
- Jiangwei Li
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
Dose Map Optimization for Mask Making
- Publication number 20200096876
- Publication date Mar 26, 2020
- ASML US, LLC f/k/a/ ASML US, INC.
- Jie Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Bias Approximation
- Publication number 20190354005
- Publication date Nov 21, 2019
- Xtal, Inc.
- Song Lan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Application of FreeForm MRC to SRAF Optimization Based on ILT Mask...
- Publication number 20190346768
- Publication date Nov 14, 2019
- Xtal, Inc.
- Jihui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Pattern Generation Based on Fast Marching Method
- Publication number 20190324366
- Publication date Oct 24, 2019
- Xtal, Inc.
- Yuan He
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Full Chip Lithographic Mask Generation
- Publication number 20170242333
- Publication date Aug 24, 2017
- Xtal, Inc.
- Jiangwei Li
- G06 - COMPUTING CALCULATING COUNTING