Jim Shiely

Person

Aloha, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
3D resist profile aware resolution enhancement techniques
- Patent number 11,200,362
- Issue date Dec 14, 2021
- Synopsys, Inc.
- Hua Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
3D resist profile aware etch-bias model
- Patent number 9,646,127
- Issue date May 9, 2017
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling and correcting short-range and long-range effects in E-bea...
- Patent number 9,484,186
- Issue date Nov 1, 2016
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast 3D mask model based on implicit countors
- Patent number 8,972,229
- Issue date Mar 3, 2015
- Synopsys, Inc.
- Zhijie Deng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Detection and removal of self-aligned double patterning artifacts
- Patent number 8,826,193
- Issue date Sep 2, 2014
- Synopsys, Inc.
- Yuelin Du
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-patterning for sharp corner printing
- Patent number 8,689,149
- Issue date Apr 1, 2014
- Synopsys, Inc.
- Yuelin Du
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling EUV lithography shadowing effect
- Patent number 8,601,404
- Issue date Dec 3, 2013
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography flare calculation and compensation
- Patent number 8,443,308
- Issue date May 14, 2013
- Synopsys Inc.
- James Shiely
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling thin-film stack topography effect on a photolithography pr...
- Patent number 8,423,917
- Issue date Apr 16, 2013
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-linear rasterized contour filters
- Patent number 8,291,353
- Issue date Oct 16, 2012
- Synopsys, Inc.
- Zhijie Deng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for performing lithography verification for a dou...
- Patent number 8,132,128
- Issue date Mar 6, 2012
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for correlating physical model representation to...
- Patent number 7,933,471
- Issue date Apr 26, 2011
- Synopsys, Inc.
- Jianliang Li
- G02 - OPTICS
Information Patent Grant
Method and apparatus for identifying a manufacturing problem area i...
- Patent number 7,784,018
- Issue date Aug 24, 2010
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for improving depth of focus during optical li...
- Patent number 7,494,751
- Issue date Feb 24, 2009
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for identifying a problem edge in a mask layou...
- Patent number 7,320,119
- Issue date Jan 15, 2008
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for correcting 3D mask effects
- Patent number 7,308,673
- Issue date Dec 11, 2007
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for identifying a manufacturing problem area i...
- Patent number 7,251,807
- Issue date Jul 31, 2007
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for identifying a manufacturing problem area i...
- Patent number 7,243,332
- Issue date Jul 10, 2007
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calculating etch proximity-correction using object-precision techni...
- Patent number 7,234,129
- Issue date Jun 19, 2007
- Synopsys, Inc.
- Dan Beale
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calculating etch proximity-correction using image-precision techniques
- Patent number 7,207,029
- Issue date Apr 17, 2007
- Synopsys, Inc.
- Dan Beale
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
3D RESIST PROFILE AWARE RESOLUTION ENHANCEMENT TECHNIQUES
- Publication number 20170220723
- Publication date Aug 3, 2017
- Synopsys, Inc.
- Hua Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
3D RESIST PROFILE AWARE ETCH-BIAS MODEL
- Publication number 20160335384
- Publication date Nov 17, 2016
- Synopsys, Inc.
- Hua Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETECTION AND REMOVAL OF SELF-ALIGNED DOUBLE PATTERNING ARTIFACTS
- Publication number 20140245239
- Publication date Aug 28, 2014
- Synopsys, Inc.
- Yuelin Du
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...
- Publication number 20140114634
- Publication date Apr 24, 2014
- Synopsys, Inc.
- Hua Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fast 3D Mask Model Based on Implicit Countors
- Publication number 20140032199
- Publication date Jan 30, 2014
- Synopsys, Inc.
- Zhijie Deng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV LITHOGRAPHY FLARE CALCULATION AND COMPENSATION
- Publication number 20120284675
- Publication date Nov 8, 2012
- Synopsys Inc.
- James SHIELY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING EUV LITHOGRAPHY SHADOWING EFFECT
- Publication number 20120240086
- Publication date Sep 20, 2012
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Non-Linear Rasterized Contour Filters
- Publication number 20120060132
- Publication date Mar 8, 2012
- Synopsys, Inc.
- Zhijie Deng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR MODELING THIN-FILM TOPOGRAPHY EFFECT ON A...
- Publication number 20110029940
- Publication date Feb 3, 2011
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR PERFORMING LITHOGRAPHY VERIFICATION FOR A DOU...
- Publication number 20100115489
- Publication date May 6, 2010
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for correlating physical model representation to...
- Publication number 20080219590
- Publication date Sep 11, 2008
- Jianliang Li
- G02 - OPTICS
Information Patent Application
Method and apparatus for identifying a manufacturing problem area i...
- Publication number 20070250804
- Publication date Oct 25, 2007
- Lawrence S. Melvin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for identifying a manufacturing problem area i...
- Publication number 20060190912
- Publication date Aug 24, 2006
- Lawrence S. Melvin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for identifying a problem edge in a mask layou...
- Publication number 20060190914
- Publication date Aug 24, 2006
- Lawrence S. Melvin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for identifying a manufacturing problem area i...
- Publication number 20060190913
- Publication date Aug 24, 2006
- Lawrence S. Melvin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for improving depth of focus during optical li...
- Publication number 20060166110
- Publication date Jul 27, 2006
- Lawrence S. Melvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for correcting 3D mask effects
- Publication number 20060156270
- Publication date Jul 13, 2006
- Lawrence S. Melvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calculating etch proximity-correction using image-precision techniques
- Publication number 20060075378
- Publication date Apr 6, 2006
- Dan Beale
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calculating etch proximity-correction using object-precision techni...
- Publication number 20060075380
- Publication date Apr 6, 2006
- Dan Beale
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

3D resist profile aware resolution enhancement techniques

3D resist profile aware etch-bias model

Modeling and correcting short-range and long-range effects in E-bea...

Fast 3D mask model based on implicit countors

Detection and removal of self-aligned double patterning artifacts

Multi-patterning for sharp corner printing

Modeling EUV lithography shadowing effect

EUV lithography flare calculation and compensation

Modeling thin-film stack topography effect on a photolithography pr...

Non-linear rasterized contour filters

Method and system for performing lithography verification for a dou...

Method and system for correlating physical model representation to...

Method and apparatus for identifying a manufacturing problem area i...

Method and apparatus for improving depth of focus during optical li...

Method and apparatus for identifying a problem edge in a mask layou...

Method and apparatus for correcting 3D mask effects

Method and apparatus for identifying a manufacturing problem area i...

Method and apparatus for identifying a manufacturing problem area i...

Calculating etch proximity-correction using object-precision techni...

Calculating etch proximity-correction using image-precision techniques

Patents Applicationslast 30 patents

3D RESIST PROFILE AWARE RESOLUTION ENHANCEMENT TECHNIQUES

3D RESIST PROFILE AWARE ETCH-BIAS MODEL

DETECTION AND REMOVAL OF SELF-ALIGNED DOUBLE PATTERNING ARTIFACTS

MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...

Fast 3D Mask Model Based on Implicit Countors

EUV LITHOGRAPHY FLARE CALCULATION AND COMPENSATION

MODELING EUV LITHOGRAPHY SHADOWING EFFECT

Non-Linear Rasterized Contour Filters

METHOD AND APPARATUS FOR MODELING THIN-FILM TOPOGRAPHY EFFECT ON A...

METHOD AND SYSTEM FOR PERFORMING LITHOGRAPHY VERIFICATION FOR A DOU...

Method and system for correlating physical model representation to...

Method and apparatus for identifying a manufacturing problem area i...

Method and apparatus for identifying a manufacturing problem area i...

Method and apparatus for identifying a problem edge in a mask layou...

Method and apparatus for identifying a manufacturing problem area i...

Method and apparatus for improving depth of focus during optical li...

Method and apparatus for correcting 3D mask effects

Calculating etch proximity-correction using image-precision techniques

Calculating etch proximity-correction using object-precision techni...