Jimmy Granstrom

Person

Tualatin, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing slurry for cobalt removal
- Patent number 9,576,818
- Issue date Feb 21, 2017
- Fujimi Incorporated
- Anne Miller
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SILICON NITRIDE CHEMICAL MECHANICAL POLISHING SLURRY WITH SILICON N...
- Publication number 20220315800
- Publication date Oct 6, 2022
- Fujimi Incorporated
- Jimmy Granstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMP SLURRIES
- Publication number 20220098442
- Publication date Mar 31, 2022
- Jimmy Granstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT POST-CMP DEFECT REDUCTION USING CLEANERS CONTAINING OXIDI...
- Publication number 20220098530
- Publication date Mar 31, 2022
- FUJIMI INCORPORATED
- Brandon Crockett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH MOLECULAR WEIGHT POLYVINYL PYRROLIDONE FOR LOW-K REMOVAL RATE...
- Publication number 20210079263
- Publication date Mar 18, 2021
- FUJIMI INCORPORATED
- Jimmy Erik GRANSTROM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION
- Publication number 20190031919
- Publication date Jan 31, 2019
- FUJIMI INCORPORATED
- Hisashi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION USING AMINO ACIDS
- Publication number 20180273802
- Publication date Sep 27, 2018
- FUJIMI INCORPORATED
- Jimmy Erik Granstrom
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SLURRY FOR COBALT REMOVAL
- Publication number 20140243250
- Publication date Aug 28, 2014
- Anne Miller
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Jimmy Granstrom

Person

Patents Grantslast 30 patents

Polishing slurry for cobalt removal

Patents Applicationslast 30 patents

SILICON NITRIDE CHEMICAL MECHANICAL POLISHING SLURRY WITH SILICON N...

CMP SLURRIES

EFFICIENT POST-CMP DEFECT REDUCTION USING CLEANERS CONTAINING OXIDI...

HIGH MOLECULAR WEIGHT POLYVINYL PYRROLIDONE FOR LOW-K REMOVAL RATE...

POLISHING COMPOSITION

POLISHING COMPOSITION USING AMINO ACIDS

POLISHING SLURRY FOR COBALT REMOVAL