Jin J. Wu

Person

Ossining, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dual mask process for semiconductor devices
- Patent number 6,429,067
- Issue date Aug 6, 2002
- International Business Machines Corporation
- Joyce C. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contact for closely spaced transistors
- Patent number 6,294,449
- Issue date Sep 25, 2001
- International Business Machines Corporation
- Teresa J. Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of fluorine or chlorine residue by liquid CO.sub.2
- Patent number 5,976,264
- Issue date Nov 2, 1999
- International Business Machines Corporation
- Kenneth John McCullough
- B08 - CLEANING
Information Patent Grant
Residue removal by supercritical fluids
- Patent number 5,908,510
- Issue date Jun 1, 1999
- International Business Machines Corporation
- Kenneth John McCullough
- B08 - CLEANING
Information Patent Grant
Vapor drying system and method
- Patent number 5,815,942
- Issue date Oct 6, 1998
- Kabushiki Kaisha Toshiba
- Jin Jwang Wu
- F26 - DRYING
Information Patent Grant
Film removal by chemical transformation and aerosol clean
- Patent number 5,792,275
- Issue date Aug 11, 1998
- International Business Machines Corporation
- Wesley Charles Natzle
- B08 - CLEANING
Information Patent Grant
Cryogenic aerosol separator
- Patent number 5,699,679
- Issue date Dec 23, 1997
- International Business Machines Corporation
- Jin Jwang Wu
- B07 - SEPARATING SOLIDS FROM SOLIDS SORTING
Information Patent Grant
Mounting apparatus for cryogenic aerosol cleaning
- Patent number 5,486,132
- Issue date Jan 23, 1996
- International Business Machines Corporation
- William A. Cavaliere
- B24 - GRINDING POLISHING
Information Patent Grant
Heat exchanger
- Patent number 5,400,603
- Issue date Mar 28, 1995
- International Business Machines Corporation
- Tibor L. Bauer
- B08 - CLEANING
Information Patent Grant
Apparatus for producing cryogenic aerosol
- Patent number 5,377,911
- Issue date Jan 3, 1995
- International Business Machines Corporation
- Tibor L. Bauer
- B24 - GRINDING POLISHING
Information Patent Grant
Process for fabricating a semiconductor structure having sidewalls
- Patent number 5,378,312
- Issue date Jan 3, 1995
- International Business Machines Corporation
- George G. Gifford
- B08 - CLEANING
Information Patent Grant
Aerosol cleaning method
- Patent number 5,372,652
- Issue date Dec 13, 1994
- International Business Machines Corporation
- Kris V. Srikrishnan
- B08 - CLEANING
Information Patent Grant
Nozzle apparatus for producing aerosol
- Patent number 5,366,156
- Issue date Nov 22, 1994
- International Business Machines Corporation
- Tibor L. Bauer
- B08 - CLEANING
Information Patent Grant
Surface cleaning using an argon or nitrogen aerosol
- Patent number 5,294,261
- Issue date Mar 15, 1994
- Air Products and Chemicals, Inc.
- Wayne T. McDermott
- B08 - CLEANING
Information Patent Grant
Apparatus to clean solid surfaces using a cryogenic aerosol
- Patent number 5,209,028
- Issue date May 11, 1993
- Air Products and Chemicals, Inc.
- Wayne T. McDermott
- B08 - CLEANING
Information Patent Grant
Surface cleaning using a cryogenic aerosol
- Patent number 5,062,898
- Issue date Nov 5, 1991
- Air Products and Chemicals, Inc.
- Wayne T. McDermott
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
DUAL MASK PROCESS FOR SEMICONDUCTOR DEVICES
- Publication number 20020094637
- Publication date Jul 18, 2002
- International Business Machines Corporation
- Joyce C. Liu
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Dual mask process for semiconductor devices

Self-aligned contact for closely spaced transistors

Removal of fluorine or chlorine residue by liquid CO.sub.2

Residue removal by supercritical fluids

Vapor drying system and method

Film removal by chemical transformation and aerosol clean

Cryogenic aerosol separator

Mounting apparatus for cryogenic aerosol cleaning

Heat exchanger

Apparatus for producing cryogenic aerosol

Process for fabricating a semiconductor structure having sidewalls

Aerosol cleaning method

Nozzle apparatus for producing aerosol

Surface cleaning using an argon or nitrogen aerosol

Apparatus to clean solid surfaces using a cryogenic aerosol

Surface cleaning using a cryogenic aerosol

Patents Applicationslast 30 patents

DUAL MASK PROCESS FOR SEMICONDUCTOR DEVICES