Jin Li

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Kakegawa-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Composition for forming resist underlayer
- Patent number 9,328,198
- Issue date May 3, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Superfine pattern mask, method for production thereof, and method e...
- Patent number 8,796,398
- Issue date Aug 5, 2014
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Superfine-patterned mask, method for production thereof, and method...
- Patent number 8,501,394
- Issue date Aug 6, 2013
- AZ Electronic Materials USA Corp.
- Yusuke Takano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hardmask process for forming a reverse tone image using polysilazane
- Patent number 8,084,186
- Issue date Dec 27, 2011
- AZ Electronic Materials USA Corp.
- David Abdallah
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER
- Publication number 20150118624
- Publication date Apr 30, 2015
- Shigemasa NAKASUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Superfine Pattern Mask, Method for Production Thereof, and Method E...
- Publication number 20120160801
- Publication date Jun 28, 2012
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SUPERFINE-PATTERNED MASK, METHOD FOR PRODUCTION THEREOF, AND METHOD...
- Publication number 20100308015
- Publication date Dec 9, 2010
- Yusuke Takano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Hardmask Process for Forming a Reverse Tone Image Using Polysilazane
- Publication number 20100203299
- Publication date Aug 12, 2010
- David Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY