Jin Wuk Sung

Person

Northborough, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Coating compositions suitable for use with an overcoated photoresist
- Patent number 10,703,917
- Issue date Jul 7, 2020
- Rohm and Haas Electronic Materials LLC
- John P. Amara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions suitable for use with an overcoated photoresist
- Patent number 10,539,873
- Issue date Jan 21, 2020
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Pattern treatment methods
- Patent number 10,133,179
- Issue date Nov 20, 2018
- Rohm and Haas Electronic Materials LLC
- Jin Wuk Sung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of negative tone development using a copolymer multilayer el...
- Patent number 9,910,353
- Issue date Mar 6, 2018
- Dow Global Technologies LLC
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of negative tone development using a copolymer multilayer el...
- Patent number 9,910,355
- Issue date Mar 6, 2018
- Rohm and Haas Electronic Materials LLC
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions suitable for use with an overcoated photoresist
- Patent number 9,708,493
- Issue date Jul 18, 2017
- Rohm and Haas Electronic Materials LLC
- John P. Amara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions and methods for pattern treatment
- Patent number 9,703,203
- Issue date Jul 11, 2017
- Dow Global Technologies LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions and methods for pattern treatment
- Patent number 9,684,241
- Issue date Jun 20, 2017
- Dow Global Technologies LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern treatment methods
- Patent number 9,671,697
- Issue date Jun 6, 2017
- Dow Global Technologies LLC
- Huaxing Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern treatment methods
- Patent number 9,665,005
- Issue date May 30, 2017
- Dow Global Technologies LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generators and photoresists comprising same
- Patent number 9,499,513
- Issue date Nov 22, 2016
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern shrink methods
- Patent number 9,448,483
- Issue date Sep 20, 2016
- Dow Global Technologies LLC
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generators and photoresists comprising same
- Patent number 8,945,814
- Issue date Feb 3, 2015
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Coating compositions suitable for use with an overcoated photoresist
- Patent number 8,940,472
- Issue date Jan 27, 2015
- James F. Cameron
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating compositions suitable for use with an overcoated photoresist
- Patent number 8,883,407
- Issue date Nov 11, 2014
- Rohm and Haas Electronic Materials LLC
- John P. Amara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions
- Patent number 7,326,518
- Issue date Feb 5, 2008
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods, photoresists and substrates for ion-implant lithography
- Patent number 7,297,616
- Issue date Nov 20, 2007
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER EL...
- Publication number 20180031971
- Publication date Feb 1, 2018
- DOW GLOBAL TECHNOLOGIES LLC
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER EL...
- Publication number 20180031972
- Publication date Feb 1, 2018
- DOW GLOBAL TECHNOLOGIES LLC
- Phillip D. Hustad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN TREATMENT METHODS
- Publication number 20180031975
- Publication date Feb 1, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Jin Wuk Sung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20170313889
- Publication date Nov 2, 2017
- Rohm and Haas Electronic Materials L.L.C.
- John P. Amara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BLOCK COPOLYMERS AND PATTERN TREATMENT COMPOSITIONS AND METHODS
- Publication number 20170123316
- Publication date May 4, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Huaxing Zhou
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20170108776
- Publication date Apr 20, 2017
- Rohm and Haas Electronic Materials L.L.C.
- James F. Cameron
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PATTERN TREATMENT METHODS
- Publication number 20160357109
- Publication date Dec 8, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN TREATMENT METHODS
- Publication number 20160357110
- Publication date Dec 8, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Huaxing Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS AND METHODS FOR PATTERN TREATMENT
- Publication number 20160357111
- Publication date Dec 8, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS AND METHODS FOR PATTERN TREATMENT
- Publication number 20160357112
- Publication date Dec 8, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN SHRINK METHODS
- Publication number 20160033869
- Publication date Feb 4, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Phillip D. HUSTAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20160009924
- Publication date Jan 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- John P. Amara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20160002199
- Publication date Jan 7, 2016
- Rohm and Haas Electronic Materials, L.L.C.
- James F. Cameron
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS
- Publication number 20140080062
- Publication date Mar 20, 2014
- James W. THACKERAY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20140080058
- Publication date Mar 20, 2014
- James F. CAMERON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20110003250
- Publication date Jan 6, 2011
- Rohm and Haas Electronic Materials L.L.C.
- John P. Amara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating compositions suitable for use with an overcoated photoresist
- Publication number 20100297556
- Publication date Nov 25, 2010
- Rohm and Haas Electronic Materials L.L.C.
- James F. Cameron
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating compositions suitable for use with an overcoated photoresist
- Publication number 20100297557
- Publication date Nov 25, 2010
- Rohm and Haas Electronic Materials L.L.C.
- James F. Cameron
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating compositions for use with an overcoated photoresist
- Publication number 20090148789
- Publication date Jun 11, 2009
- Rohm and Haas Electronic Materials L.L.C.
- John P. Amara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists and methods for use thereof
- Publication number 20080220597
- Publication date Sep 11, 2008
- Rohm and Haas Electronic Materials L.L.C.
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist compositions
- Publication number 20060172223
- Publication date Aug 3, 2006
- Rohm and Haas Electronic Materials L.L.C.
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist compositions
- Publication number 20060172224
- Publication date Aug 3, 2006
- Rohm and Haas Electronic Materials L.L.C.
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresists and methods for use thereof
- Publication number 20050032373
- Publication date Feb 10, 2005
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jin Wuk Sung

Person

Patents Grantslast 30 patents

Coating compositions suitable for use with an overcoated photoresist

Coating compositions suitable for use with an overcoated photoresist

Pattern treatment methods

Method of negative tone development using a copolymer multilayer el...

Method of negative tone development using a copolymer multilayer el...

Coating compositions suitable for use with an overcoated photoresist

Compositions and methods for pattern treatment

Compositions and methods for pattern treatment

Pattern treatment methods

Pattern treatment methods

Acid generators and photoresists comprising same

Pattern shrink methods

Acid generators and photoresists comprising same

Coating compositions suitable for use with an overcoated photoresist

Coating compositions suitable for use with an overcoated photoresist

Photoresist compositions

Methods, photoresists and substrates for ion-implant lithography

Patents Applicationslast 30 patents

METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER EL...

METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER EL...

PATTERN TREATMENT METHODS

COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST

BLOCK COPOLYMERS AND PATTERN TREATMENT COMPOSITIONS AND METHODS

COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST

PATTERN TREATMENT METHODS

PATTERN TREATMENT METHODS

COMPOSITIONS AND METHODS FOR PATTERN TREATMENT

COMPOSITIONS AND METHODS FOR PATTERN TREATMENT

PATTERN SHRINK METHODS

COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST

Coating compositions suitable for use with an overcoated photoresist

Coating compositions suitable for use with an overcoated photoresist

Coating compositions for use with an overcoated photoresist

Photoresists and methods for use thereof

Photoresist compositions

Photoresist compositions

Photoresists and methods for use thereof