Jing JIANG

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Nanoimprint and etch fabrication of optical devices
- Patent number 12,092,956
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Jing Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-slippery stamp landing ring
- Patent number 11,567,417
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Jing Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
TRANSITION METAL DICHALCOGENIDE COATED FLAT OPTICAL DEVICES HAVING...
- Publication number 20240111075
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Russell Chin Yee TEO
- G02 - OPTICS
Information Patent Application
PITCH AND ORIENTATION UNIFORMITY FOR NANOIMPRINT STAMP FORMATION
- Publication number 20230375919
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Jing JIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOIMPRINT AND ETCH FABRICATION OF OPTICAL DEVICES
- Publication number 20220326611
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Jing JIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-SLIPPERY STAMP LANDING RING
- Publication number 20220229370
- Publication date Jul 21, 2022
- Applied Materials, Inc.
- Jing JIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUTY CYCLE TRANSITION ZONE MASK CORRECTION
- Publication number 20220221788
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Jing JIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY