Membership
Tour
Register
Log in
Jingbao Liu
Follow
Person
Sunnyvale, CA, US
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Apparatus for controlling the flow of a gas in a process chamber
Patent number
9,443,753
Issue date
Sep 13, 2016
Applied Materials, Inc.
David Palagashvili
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method and apparatus for shaping a magnetic field in a magnetic fie...
Patent number
8,936,696
Issue date
Jan 20, 2015
Applied Materials, Inc.
Roger Alan Lindley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chamber with uniform flow and plasma distribution
Patent number
8,840,725
Issue date
Sep 23, 2014
Applied Materials, Inc.
David Palagashvili
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Temperature enhanced electrostatic chucking in plasma processing ap...
Patent number
8,580,693
Issue date
Nov 12, 2013
Applied Materials, Inc.
Sergey G. Belostotskiy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etch reactor with distribution of etch gases across a wafer...
Patent number
8,187,415
Issue date
May 29, 2012
Applied Materials, Inc.
Jong Mun Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for shaping a magnetic field in a magnetic fie...
Patent number
7,879,186
Issue date
Feb 1, 2011
Applied Materials, Inc.
Roger Alan Lindley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma control using dual cathode frequency mixing
Patent number
7,838,430
Issue date
Nov 23, 2010
Applied Materials, Inc.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Halogen-free amorphous carbon mask etch having high selectivity to...
Patent number
7,807,064
Issue date
Oct 5, 2010
Applied Materials, Inc.
Jong Mun Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma control using dual cathode frequency mixing and controlling...
Patent number
7,736,914
Issue date
Jun 15, 2010
Applied Materials, Inc.
Jingbao Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for shaping a magnetic field in a magnetic fie...
Patent number
7,422,654
Issue date
Sep 9, 2008
Applied Materials, Inc.
Roger Alan Lindley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus for uniformly etching a dielectric layer
Patent number
7,316,761
Issue date
Jan 8, 2008
Applied Materials, Inc.
Kenny L. Doan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Ashable layers for reducing critical dimensions of integrated circu...
Patent number
7,105,442
Issue date
Sep 12, 2006
Applied Materials, Inc.
Hongching Shan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Flash step preparatory to dielectric etch
Patent number
6,787,475
Issue date
Sep 7, 2004
Zhuxu Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnetically enhanced plasma oxide etch using hexafluorobutadiene
Patent number
6,613,689
Issue date
Sep 2, 2003
Applied Materials, Inc.
Jingbao Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnetically enhanced plasma etch process using a heavy fluorocarbo...
Patent number
6,451,703
Issue date
Sep 17, 2002
Applied Materials, Inc.
Jingbao Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etch method using a dielectric etch chamber with expanded process w...
Patent number
6,403,491
Issue date
Jun 11, 2002
Applied Materials, Inc.
Jingbao Liu
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
TEMPERATURE ENHANCED ELECTROSTATIC CHUCKING IN PLASMA PROCESSING AP...
Publication number
20140034241
Publication date
Feb 6, 2014
Sergy G. Belostotskiy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TEMPERATURE ENHANCED ELECTROSTATIC CHUCKING IN PLASMA PROCESSING AP...
Publication number
20120052690
Publication date
Mar 1, 2012
Applied Materials, Inc.
Sergey G. BELOSTOTSKIY
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS FOR CONTROLLING THE FLOW OF A GAS IN A PROCESS CHAMBER
Publication number
20120024479
Publication date
Feb 2, 2012
Applied Materials, Inc.
DAVID PALAGASHVILI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CHAMBER WITH UNIFORM FLOW AND PLASMA DISTRIBUTION
Publication number
20110162803
Publication date
Jul 7, 2011
Applied Materials, Inc.
DAVID PALAGASHVILI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIE...
Publication number
20110115589
Publication date
May 19, 2011
Applied Materials, Inc.
Roger Alan Lindley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA CONTROL USING DUAL CATHODE FREQUENCY MIXING
Publication number
20090142859
Publication date
Jun 4, 2009
Applied Materials, Inc.
JINGBAO LIU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIE...
Publication number
20090008033
Publication date
Jan 8, 2009
Applied Materials, Inc.
Roger Alan Lindley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of controlling sidewall profile by using intermittent, perio...
Publication number
20080286979
Publication date
Nov 20, 2008
APPLIED MATERIALS, INC.
Taeho Shin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HALOGEN-FREE AMORPHOUS CARBON MASK ETCH HAVING HIGH SELECTIVITY TO...
Publication number
20080230511
Publication date
Sep 25, 2008
APPLIED MATERIALS, INC.
Jong Mun Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS FOR ETCHING HIGH ASPECT RATIO FEATURES
Publication number
20080203056
Publication date
Aug 28, 2008
JUDY WANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etch process using etch uniformity control by using composit...
Publication number
20070249173
Publication date
Oct 25, 2007
APPLIED MATERIALS, INC.
Jong Mun Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etch reactor with distribution of etch gases across a wafer...
Publication number
20070247075
Publication date
Oct 25, 2007
APPLIED MATERIALS, INC.
Jong Mun Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of controlling silicon-containing polymer build up during et...
Publication number
20070243714
Publication date
Oct 18, 2007
APPLIED MATERIALS, INC.
Taeho Shin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA CONTROL USING DUAL CATHODE FREQUENCY MIXING
Publication number
20070000611
Publication date
Jan 4, 2007
Applied Materials, Inc.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma control using dual cathode frequency mixing
Publication number
20050090118
Publication date
Apr 28, 2005
APPLIED MATERIALS, INC.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for shaping a magnetic field in a magnetic fie...
Publication number
20040182516
Publication date
Sep 23, 2004
APPLIED MATERIALS, INC.
Roger Alan Lindley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Apparatus for uniformly etching a dielectric layer
Publication number
20040149394
Publication date
Aug 5, 2004
APPLIED MATERIALS, INC.
Kenny L. Doan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Ashable layers for reducing critical dimensions of integrated circu...
Publication number
20030219988
Publication date
Nov 27, 2003
APPLIED MATERIALS, INC.
Hongqing Shan
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Flash step preparatory to dielectric etch
Publication number
20030045116
Publication date
Mar 6, 2003
APPLIED MATERIALS, INC.
Zhuxu Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Magnetically enhanced plasma oxide etch using hexafluorobutadiene
Publication number
20020173162
Publication date
Nov 21, 2002
Jingbao Liu
H01 - BASIC ELECTRIC ELEMENTS