Jingjing Liu

Person

Milpitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Biased cover ring for a substrate processing system
- Patent number 11,049,701
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Adolph Miller Allen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Extension of PVD chamber with multiple reaction gases, high bias po...
- Patent number 10,927,449
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Jingjing Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density, low stress amorphous carbon film, and process and equ...
- Patent number 10,858,727
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- Jingjing Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve film quality for PVD carbon with reactive gas and...
- Patent number 10,570,506
- Issue date Feb 25, 2020
- Applied Materials, Inc.
- Bhargav Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulse shape controller for sputter sources
- Patent number 10,566,177
- Issue date Feb 18, 2020
- Applied Materials, Inc.
- Michael Stowell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diamond like carbon layer formed by an electron beam plasma process
- Patent number 10,249,495
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Yang Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanocrystalline diamond carbon film for 3D NAND hardmask application
- Patent number 9,865,464
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Yongmei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for etching metal using a combination of plasma and solid s...
- Patent number 9,576,810
- Issue date Feb 21, 2017
- Applied Materials, Inc.
- Subhash Deshmukh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanocrystalline diamond carbon film for 3D NAND hardmask application
- Patent number 9,502,262
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Yongmei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for spacer deposition and selective removal i...
- Patent number 9,484,202
- Issue date Nov 1, 2016
- Applied Materials, Inc.
- Jie Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma source based cyclic CVD process for nanocrystalline d...
- Patent number 9,382,625
- Issue date Jul 5, 2016
- Applied Materials, Inc.
- Jun Xue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature tungsten metallization process
- Patent number 8,835,311
- Issue date Sep 16, 2014
- Applied Materials, Inc.
- Joshua Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature tungsten metallization process
- Patent number 8,617,985
- Issue date Dec 31, 2013
- Applied Materials, Inc.
- Joshua Collins
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS
- Publication number 20190228970
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXTENSION OF PVD CHAMBER WITH MULTIPLE REACTION GASES, HIGH BIAS PO...
- Publication number 20180209035
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Jingjing LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND...
- Publication number 20180209037
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Bhargav CITLA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIASED COVER RING FOR A SUBSTRATE PROCESSING SYSTEM
- Publication number 20180151325
- Publication date May 31, 2018
- ADOLPH MILLER ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)
- Publication number 20180108519
- Publication date Apr 19, 2018
- Applied Materials, Inc.
- VIACHSLAV BABAYAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH DENSITY, LOW STRESS AMORPHOUS CARBON FILM, AND PROCESS AND EQU...
- Publication number 20180051368
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Jingjing Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSE SHAPE CONTROLLER FOR SPUTTER SOURCES
- Publication number 20180044781
- Publication date Feb 15, 2018
- Applied Materials, Inc.
- Michael STOWELL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS
- Publication number 20170372899
- Publication date Dec 28, 2017
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION
- Publication number 20170062216
- Publication date Mar 2, 2017
- Applied Materials, Inc.
- Yongmei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV-ASSISTED REACTIVE ION ETCH FOR COPPER
- Publication number 20170011887
- Publication date Jan 12, 2017
- Applied Materials, Inc.
- Subhash Deshmukh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION
- Publication number 20160064500
- Publication date Mar 3, 2016
- Applied Materials, Inc.
- Yongmei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA SOURCE BASED CYCLIC CVD PROCESS FOR NANOCRYSTALLINE D...
- Publication number 20150315707
- Publication date Nov 5, 2015
- Applied Materials, Inc.
- Jun XUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR ETCHING METAL USING A COMBINATION OF PLASMA AND SOLID S...
- Publication number 20150099369
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Subhash Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED DC PLASMA ETCHING PROCESS AND APPARATUS
- Publication number 20140273487
- Publication date Sep 18, 2014
- Subhash Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV-ASSISTED REACTIVE ION ETCH FOR COPPER
- Publication number 20140262755
- Publication date Sep 18, 2014
- Subhash Deshmukh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE TUNGSTEN METALLIZATION PROCESS
- Publication number 20140187038
- Publication date Jul 3, 2014
- Applied Materials, Inc.
- Joshua COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method And Apparatus For Low Temperature ALD Deposition
- Publication number 20140023794
- Publication date Jan 23, 2014
- Maitreyee Mahajani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE TUNGSTEN METALLIZATION PROCESS
- Publication number 20130109172
- Publication date May 2, 2013
- JOSHUA COLLINS
- H01 - BASIC ELECTRIC ELEMENTS

Jingjing Liu

Person

Patents Grantslast 30 patents

Biased cover ring for a substrate processing system

Extension of PVD chamber with multiple reaction gases, high bias po...

High density, low stress amorphous carbon film, and process and equ...

Method to improve film quality for PVD carbon with reactive gas and...

Pulse shape controller for sputter sources

Diamond like carbon layer formed by an electron beam plasma process

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Process for etching metal using a combination of plasma and solid s...

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Apparatus and methods for spacer deposition and selective removal i...

Remote plasma source based cyclic CVD process for nanocrystalline d...

High temperature tungsten metallization process

High temperature tungsten metallization process

Patents Applicationslast 30 patents

DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS

EXTENSION OF PVD CHAMBER WITH MULTIPLE REACTION GASES, HIGH BIAS PO...

METHOD TO IMPROVE FILM QUALITY FOR PVD CARBON WITH REACTIVE GAS AND...

BIASED COVER RING FOR A SUBSTRATE PROCESSING SYSTEM

POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)

HIGH DENSITY, LOW STRESS AMORPHOUS CARBON FILM, AND PROCESS AND EQU...

PULSE SHAPE CONTROLLER FOR SPUTTER SOURCES

DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS

NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION

UV-ASSISTED REACTIVE ION ETCH FOR COPPER

NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION

REMOTE PLASMA SOURCE BASED CYCLIC CVD PROCESS FOR NANOCRYSTALLINE D...

PROCESS FOR ETCHING METAL USING A COMBINATION OF PLASMA AND SOLID S...

PULSED DC PLASMA ETCHING PROCESS AND APPARATUS

UV-ASSISTED REACTIVE ION ETCH FOR COPPER

HIGH TEMPERATURE TUNGSTEN METALLIZATION PROCESS

Method And Apparatus For Low Temperature ALD Deposition

HIGH TEMPERATURE TUNGSTEN METALLIZATION PROCESS