Jinho AHN

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Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Pellicle cleaning apparatus and pellicle cleaning method using the...
- Patent number 12,032,281
- Issue date Jul 9, 2024
- Samsung Electronics Co., Ltd.
- Byunghoon Lee
- B08 - CLEANING
Information Patent Grant
Mask protective module, pellicle having the same, and lithography a...
- Patent number 11,940,726
- Issue date Mar 26, 2024
- Industry-University Cooperation Foundation Hanyang University
- Jinho Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask protective module, pellicle having the same, and lithography a...
- Patent number 11,402,746
- Issue date Aug 2, 2022
- Industry-University Cooperation Foundation Hanyang University
- Jinho Ahn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for extreme ultraviolet lithography process and method of fabr...
- Patent number 10,061,190
- Issue date Aug 28, 2018
- IUCF-HYU(Industry-University Cooperation Foundation Hanyang University)
- Jung Sik Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV lithography
- Patent number 9,958,770
- Issue date May 1, 2018
- Industry-University Cooperation Foundation Hanyang University
- Jinho Ahn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MULTI-LAYERED MOLECULAR FILM PHOTORESIST HAVING MOLECULAR LINE STRU...
- Publication number 20240061330
- Publication date Feb 22, 2024
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Myung Mo SUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE CLEANING APPARATUS AND PELLICLE CLEANING METHOD USING THE...
- Publication number 20230205078
- Publication date Jun 29, 2023
- Samsung Electronics Co., Ltd.
- Byunghoon LEE
- B08 - CLEANING
Information Patent Application
MASK PROTECTIVE MODULE, PELLICLE HAVING THE SAME, AND LITHOGRAPHY A...
- Publication number 20220334467
- Publication date Oct 20, 2022
- Industry-University Cooperation Foundation Hanyang University
- Jinho AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND METHOD FOR MANUFACTURI...
- Publication number 20210397078
- Publication date Dec 23, 2021
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Jinho AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK PROTECTIVE MODULE, PELLICLE HAVING THE SAME, AND LITHOGRAPHY A...
- Publication number 20190204732
- Publication date Jul 4, 2019
- Industry-University Cooperation Foundation Hanyang University
- Jinho AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY
- Publication number 20170038675
- Publication date Feb 9, 2017
- Industry-University Cooperation Foundation Hanyang University
- Jinho AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND METHOD OF FABR...
- Publication number 20160357099
- Publication date Dec 8, 2016
- Industry-University Cooperation Foundation Hanyang University (IUCF-HYU)
- Jung Sik KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Pellicle cleaning apparatus and pellicle cleaning method using the...

Mask protective module, pellicle having the same, and lithography a...

Mask protective module, pellicle having the same, and lithography a...

Mask for extreme ultraviolet lithography process and method of fabr...

Pellicle for EUV lithography

Patents Applicationslast 30 patents

MULTI-LAYERED MOLECULAR FILM PHOTORESIST HAVING MOLECULAR LINE STRU...

PELLICLE CLEANING APPARATUS AND PELLICLE CLEANING METHOD USING THE...

MASK PROTECTIVE MODULE, PELLICLE HAVING THE SAME, AND LITHOGRAPHY A...

MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND METHOD FOR MANUFACTURI...

MASK PROTECTIVE MODULE, PELLICLE HAVING THE SAME, AND LITHOGRAPHY A...

PELLICLE FOR EUV LITHOGRAPHY

MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND METHOD OF FABR...