Jinsong Yin

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing a contact for a semiconductor component an...
- Patent number 9,202,758
- Issue date Dec 1, 2015
- GLOBALFOUNDRIES Inc.
- Paul R. Besser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a contact in a semiconductor device with engineer...
- Patent number 8,039,391
- Issue date Oct 18, 2011
- Spansion LLC
- Jinsong Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aggressive cleaning process for semiconductor device contact formation
- Patent number 7,476,604
- Issue date Jan 13, 2009
- Advanced Micro Devices, Inc.
- Ning Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor component having a contact structure and method of ma...
- Patent number 7,407,882
- Issue date Aug 5, 2008
- Spansion LLC
- Connie Pin-Chin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a memory device having a nanocrystal charg...
- Patent number 7,335,594
- Issue date Feb 26, 2008
- Spansion LLC
- Connie Pin-Chin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor component that inhibits fo...
- Patent number 7,217,660
- Issue date May 15, 2007
- Spansion LLC
- Connie Pin-Chin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a metal gate structure with tuning of work functi...
- Patent number 7,071,086
- Issue date Jul 4, 2006
- Advanced Micro Devices, Inc.
- Christy Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with metal gate and high-k tantalum oxide or t...
- Patent number 7,060,571
- Issue date Jun 13, 2006
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Engineered metal gate electrode
- Patent number 7,033,888
- Issue date Apr 25, 2006
- Advanced Micro Devices, Inc.
- James N. Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a contact in a semiconductor device with formatio...
- Patent number 6,927,162
- Issue date Aug 9, 2005
- Advanced Micro Devices, Inc.
- Wen Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
One step deposition method for high-k dielectric and metal gate ele...
- Patent number 6,893,910
- Issue date May 17, 2005
- Advanced Micro Devices, Inc.
- Christy Mei-Chu Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device comprising silicon-ric...
- Patent number 6,861,350
- Issue date Mar 1, 2005
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate dielectric quality for replacement metal gate transistors
- Patent number 6,830,998
- Issue date Dec 14, 2004
- Advanced Micro Devices, Inc.
- James Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Engineered metal gate electrode
- Patent number 6,727,560
- Issue date Apr 27, 2004
- Advanced Micro Devices, Inc.
- James N. Pan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of forming a metal gate structure with tuning of work functi...
- Publication number 20040214416
- Publication date Oct 28, 2004
- Advanced Micro Devices, Inc.
- Christy Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Engineered metal gate electrode
- Publication number 20040175910
- Publication date Sep 9, 2004
- Advanced Micro Devices, Inc.
- James N. Pan
- H01 - BASIC ELECTRIC ELEMENTS

Jinsong Yin

Person

Patents Grantslast 30 patents

Method for manufacturing a contact for a semiconductor component an...

Method of forming a contact in a semiconductor device with engineer...

Aggressive cleaning process for semiconductor device contact formation

Semiconductor component having a contact structure and method of ma...

Method for manufacturing a memory device having a nanocrystal charg...

Method for manufacturing a semiconductor component that inhibits fo...

Method of forming a metal gate structure with tuning of work functi...

Semiconductor device with metal gate and high-k tantalum oxide or t...

Engineered metal gate electrode

Method of forming a contact in a semiconductor device with formatio...

One step deposition method for high-k dielectric and metal gate ele...

Method of manufacturing semiconductor device comprising silicon-ric...

Gate dielectric quality for replacement metal gate transistors

Engineered metal gate electrode

Patents Applicationslast 30 patents

Method of forming a metal gate structure with tuning of work functi...

Engineered metal gate electrode