Jinyuan Chen

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
High frequency power supply device and high frequency power supplyi...
- Patent number 10,201,069
- Issue date Feb 5, 2019
- Pearl Kogyo Co., Ltd.
- Eiich Hayano
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus
- Patent number 9,271,384
- Issue date Feb 23, 2016
- IDEAL ENERGY (SHANGHAI) SUNFLOWER THIN FILM EQUIPMENT, LTD.
- Jinyuan Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-station decoupled reactive ion etch chamber
- Patent number 9,208,998
- Issue date Dec 8, 2015
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-station decoupled reactive ion etch chamber
- Patent number 8,366,829
- Issue date Feb 5, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitive CVD reactor and methods for plasma CVD process
- Patent number 8,297,225
- Issue date Oct 30, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method of sensing and removing residual charge from a pr...
- Patent number 8,111,499
- Issue date Feb 7, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple frequency plasma chamber, switchable RF system, and proces...
- Patent number 7,503,996
- Issue date Mar 17, 2009
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYI...
- Publication number 20150289355
- Publication date Oct 8, 2015
- PEARL KOGYO CO., LTD.
- Eiich Hayano
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma Processing Apparatus
- Publication number 20130249399
- Publication date Sep 26, 2013
- Jinyuan Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
- Publication number 20130008605
- Publication date Jan 10, 2013
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER HAVING SWITCHABLE BIAS POWER AND A SWITCHABLE FREQUE...
- Publication number 20110030900
- Publication date Feb 10, 2011
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF SENSING AND REMOVING RESIDUAL CHARGE FROM A PR...
- Publication number 20100271744
- Publication date Oct 28, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND BASE FOR PLASMA REACTOR HAVING IMPROVED WAF...
- Publication number 20100271745
- Publication date Oct 28, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
- Publication number 20100126667
- Publication date May 27, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-STATION PLASMA REACTOR WITH MULTIPLE PLASMA REGIONS
- Publication number 20090139453
- Publication date Jun 4, 2009
- AIHUA CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCES...
- Publication number 20080251207
- Publication date Oct 16, 2008
- ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA,
- Jinyuan Chen
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYI...
- Publication number 20080128087
- Publication date Jun 5, 2008
- EIICH HAYANO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
- Publication number 20080011424
- Publication date Jan 17, 2008
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald YIN
- H01 - BASIC ELECTRIC ELEMENTS

Jinyuan Chen

Person

Patents Grantslast 30 patents

High frequency power supply device and high frequency power supplyi...

Plasma processing apparatus

Multi-station decoupled reactive ion etch chamber

Multi-station decoupled reactive ion etch chamber

Capacitive CVD reactor and methods for plasma CVD process

System and method of sensing and removing residual charge from a pr...

Multiple frequency plasma chamber, switchable RF system, and proces...

Patents Applicationslast 30 patents

HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYI...

Plasma Processing Apparatus

MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER

PLASMA CHAMBER HAVING SWITCHABLE BIAS POWER AND A SWITCHABLE FREQUE...

SYSTEM AND METHOD OF SENSING AND REMOVING RESIDUAL CHARGE FROM A PR...

ELECTROSTATIC CHUCK AND BASE FOR PLASMA REACTOR HAVING IMPROVED WAF...

CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS

MULTI-STATION PLASMA REACTOR WITH MULTIPLE PLASMA REGIONS

MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCES...

HIGH FREQUENCY POWER SUPPLY DEVICE AND HIGH FREQUENCY POWER SUPPLYI...

MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER