Jiong Jiang

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Correction for flare effects in lithography system
- Patent number 10,423,745
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Correction for flare effects in lithography system
- Patent number 8,887,104
- Issue date Nov 11, 2014
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20150058815
- Publication date Feb 26, 2015
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20130185681
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING