Jiro Hata

Person

Yamanashi-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for plasma processing by shaping an induced electric field
- Patent number RE40963
- Issue date Nov 10, 2009
- Tokyo Electron Limited
- Nobuo Ishii
- 427 - Coating processes
Information Patent Grant
Plasma process apparatus
- Patent number RE39020
- Issue date Mar 21, 2006
- Tokyo Electron, Ltd.
- Kiichi Hama
- 156 - Adhesive bonding and miscellaneous chemical manufacture
Information Patent Grant
Plasma processing apparatus
- Patent number 6,350,347
- Issue date Feb 26, 2002
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma processing by shaping an induced electric field
- Patent number 6,265,031
- Issue date Jul 24, 2001
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,136,140
- Issue date Oct 24, 2000
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,136,139
- Issue date Oct 24, 2000
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming polycrystalline silicon film in process of manufa...
- Patent number RE36371
- Issue date Nov 2, 1999
- Tokyo Electron Limited
- Issei Imahashi
- 427 - Coating processes
Information Patent Grant
Plasma processing apparatus
- Patent number 5,938,883
- Issue date Aug 17, 1999
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,795,429
- Issue date Aug 18, 1998
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process apparatus
- Patent number 5,792,261
- Issue date Aug 11, 1998
- Tokyo Electron Limited
- Kiichi Hama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 5,571,366
- Issue date Nov 5, 1996
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma film forming method and apparatus and plasma processing appa...
- Patent number 5,531,834
- Issue date Jul 2, 1996
- Tokyo Electron Kabushiki Kaisha
- Shuichi Ishizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for manufacturing a liquid crystal display substrate, and...
- Patent number 5,529,630
- Issue date Jun 25, 1996
- Tokyo Electron Limited
- Issei Imahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process apparatus
- Patent number 5,525,159
- Issue date Jun 11, 1996
- Tokyo Electron Limited
- Kiichi Hama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus using vertical gas inlets one on top of...
- Patent number 5,522,934
- Issue date Jun 4, 1996
- Tokyo Electron Limited
- Akira Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching apparatus and method therefor
- Patent number 5,476,182
- Issue date Dec 19, 1995
- Tokyo Electron Limited
- Shuichi Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a liquid crystal display substrate
- Patent number 5,413,958
- Issue date May 9, 1995
- Tokyo Electron Limited
- Issei Imahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming polycrystalling silicon film in process of manufa...
- Patent number 5,372,836
- Issue date Dec 13, 1994
- Tokyo Electron Limited
- Issei Imahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Method for plasma processing by shaping an induced electric field

Plasma process apparatus

Plasma processing apparatus

Method for plasma processing by shaping an induced electric field

Plasma processing apparatus

Plasma processing apparatus

Method of forming polycrystalline silicon film in process of manufa...

Plasma processing apparatus

Plasma processing apparatus

Plasma process apparatus

Plasma processing apparatus

Plasma film forming method and apparatus and plasma processing appa...

Apparatus for manufacturing a liquid crystal display substrate, and...

Plasma process apparatus

Plasma processing apparatus using vertical gas inlets one on top of...

Etching apparatus and method therefor

Method for manufacturing a liquid crystal display substrate

Method of forming polycrystalling silicon film in process of manufa...