Jiro HIGASHIJIMA

Person

Koshi City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and cleaning method of mist guard
- Patent number 12,148,632
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Yusuke Hashimoto
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and manufacturing method therefor
- Patent number 11,715,650
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Yusuke Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,574,827
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Tadashi Iino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,430,673
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Yusuke Hashimoto
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,158,525
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Yasuhiro Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,056,335
- Issue date Jul 6, 2021
- Tokyo Electron Limited
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus, substrate processing method and rec...
- Patent number 11,024,518
- Issue date Jun 1, 2021
- Tokyo Electron Limited
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of cleaning substrate proces...
- Patent number 10,486,208
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and method of cleaning substrate pro...
- Patent number 10,475,671
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Jiro Higashijima
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Liquid processing apparatus
- Patent number 10,297,473
- Issue date May 21, 2019
- Tokyo Electron Limited
- Terufumi Wakiyama
- B08 - CLEANING
Information Patent Grant
Substrate processing system
- Patent number 10,276,425
- Issue date Apr 30, 2019
- Tokyo Electron Limited
- Terufumi Wakiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 9,953,848
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Terufumi Wakiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing aparatus
- Patent number 9,953,852
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Jiro Higashijima
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 9,933,702
- Issue date Apr 3, 2018
- Tokyo Electron Limited
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,818,626
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,793,142
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 9,773,687
- Issue date Sep 26, 2017
- Tokyo Electron Limited
- Terufumi Wakiyama
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 9,508,569
- Issue date Nov 29, 2016
- Tokyo Electron Limited
- Shigehisa Inoue
- B08 - CLEANING
Information Patent Grant
Liquid treatment apparatus and method
- Patent number 9,396,975
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus for separating processing sol...
- Patent number 9,355,871
- Issue date May 31, 2016
- Tokyo Electron Limited
- Jiro Higashijima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Liquid arm cleaning unit for substrate processing apparatus
- Patent number 9,190,311
- Issue date Nov 17, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- B08 - CLEANING
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 9,159,594
- Issue date Oct 13, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid treatment apparatus with lift pin plate
- Patent number 9,048,269
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid cleaning apparatus with controlled liquid port eje...
- Patent number 9,022,045
- Issue date May 5, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,944,081
- Issue date Feb 3, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,905,051
- Issue date Dec 9, 2014
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method and storage m...
- Patent number 8,887,741
- Issue date Nov 18, 2014
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 8,741,099
- Issue date Jun 3, 2014
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,696,863
- Issue date Apr 15, 2014
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid treatment apparatus and method
- Patent number 8,607,807
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240157408
- Publication date May 16, 2024
- TOKYO ELECTRON LIMITED
- Daisuke GOTO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE GRIPPING DEVICE
- Publication number 20240124984
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Yusuke HASHIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF MIST GUARD
- Publication number 20230001458
- Publication date Jan 5, 2023
- TOKYO ELECTRON LIMITED
- Yusuke Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20210327728
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Yusuke HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND MANUFACTURING METHOD THEREFOR
- Publication number 20210043467
- Publication date Feb 11, 2021
- TOKYO ELECTRON LIMITED
- Yusuke Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200357667
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Tadashi IINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200152443
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20190067048
- Publication date Feb 28, 2019
- Tokyo Electron Limited
- Yasuhiro Takaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20180221925
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID SUPPLY METHOD
- Publication number 20180090306
- Publication date Mar 29, 2018
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF CLEANING SUBSTRATE PROCES...
- Publication number 20170361364
- Publication date Dec 21, 2017
- TOKYO ELECTRON LIMITED
- Nobuhiro Ogata
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20170345689
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Terufumi Wakiyama
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF CLEANING SUBSTRATE PRO...
- Publication number 20170200624
- Publication date Jul 13, 2017
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170059996
- Publication date Mar 2, 2017
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20160148827
- Publication date May 26, 2016
- TOKYO ELECTRON LIMITED
- Terufumi Wakiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20160118275
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Shigehisa Inoue
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20150187613
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Terufumi Wakiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20150114561
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20150090305
- Publication date Apr 2, 2015
- TOKYO ELECTRON LIMITED
- Terufumi Wakiyama
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140251539
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Tsuyoshi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140116478
- Publication date May 1, 2014
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140116480
- Publication date May 1, 2014
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20120318301
- Publication date Dec 20, 2012
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Processing Apparatus and Liquid Processing Method
- Publication number 20120192899
- Publication date Aug 2, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120186744
- Publication date Jul 26, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120186607
- Publication date Jul 26, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Processing Apparatus and Liquid Processing Method
- Publication number 20120180822
- Publication date Jul 19, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Processing Apparatus
- Publication number 20120180829
- Publication date Jul 19, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- B08 - CLEANING
Information Patent Application
Liquid Processing Apparatus and Liquid Processing Method
- Publication number 20120180828
- Publication date Jul 19, 2012
- Jiro HIGASHIJIMA
- B08 - CLEANING
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120160278
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS

Jiro HIGASHIJIMA

Person

Patents Grantslast 30 patents

Substrate processing apparatus and cleaning method of mist guard

Substrate processing apparatus and manufacturing method therefor

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus

Substrate processing apparatus, substrate processing method and rec...

Substrate processing apparatus, method of cleaning substrate proces...

Substrate processing apparatus and method of cleaning substrate pro...

Liquid processing apparatus

Substrate processing system

Substrate liquid processing apparatus

Liquid processing aparatus

Substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Liquid processing apparatus

Substrate liquid processing apparatus

Liquid treatment apparatus and method

Substrate liquid processing apparatus for separating processing sol...

Liquid arm cleaning unit for substrate processing apparatus

Liquid processing apparatus and liquid processing method

Substrate liquid treatment apparatus with lift pin plate

Substrate liquid cleaning apparatus with controlled liquid port eje...

Liquid processing apparatus and liquid processing method

Liquid processing apparatus and liquid processing method

Liquid processing apparatus, liquid processing method and storage m...

Liquid processing apparatus

Liquid processing apparatus and liquid processing method

Liquid treatment apparatus and method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE GRIPPING DEVICE

SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD OF MIST GUARD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND MANUFACTURING METHOD THEREFOR

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID SUPPLY METHOD

SUBSTRATE PROCESSING APPARATUS, METHOD OF CLEANING SUBSTRATE PROCES...

LIQUID PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND METHOD OF CLEANING SUBSTRATE PRO...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM

SUBSTRATE LIQUID PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS

LIQUID PROCESSING APPARATUS

LIQUID PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

Liquid Processing Apparatus and Liquid Processing Method

LIQUID TREATMENT APPARATUS AND METHOD

LIQUID TREATMENT APPARATUS AND METHOD

Liquid Processing Apparatus and Liquid Processing Method

Liquid Processing Apparatus

Liquid Processing Apparatus and Liquid Processing Method

LIQUID TREATMENT APPARATUS AND METHOD