Jiro YOKOTA

Person

Tsukuba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for storage and supply of F3NO-free FNO gases a...
- Patent number 12,106,940
- Issue date Oct 1, 2024
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Ayaka Nishiyama
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Chemistries for etching multi-stacked layers
- Patent number 11,075,084
- Issue date Jul 27, 2021
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Peng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SiN selective etch to SiO2 with non-plasma dry process for 3D NAND...
- Patent number 10,529,581
- Issue date Jan 7, 2020
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Chih-Yu Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES A...
- Publication number 20220208517
- Publication date Jun 30, 2022
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Ayaka NISHIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES A...
- Publication number 20200203127
- Publication date Jun 25, 2020
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Ayaka NISHIYAMA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SiN SELECTIVE ETCH TO SiO2 WITH NON-PLASMA DRY PROCESS FOR 3D NAND...
- Publication number 20190206696
- Publication date Jul 4, 2019
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Chih-Yu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMISTRIES FOR ETCHING MULTI-STACKED LAYERS
- Publication number 20170365487
- Publication date Dec 21, 2017
- L'Air Liquide, Société Anonyme pour l'Etude et I'Exploitation des Procédés Ge...
- Peng SHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)MOLYBDENUM MOLECULES FOR DEPOSITION...
- Publication number 20160040289
- Publication date Feb 11, 2016
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Julien GATINEAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)TUNGSTEN MOLECULES FOR DEPOSITION OF...
- Publication number 20160032454
- Publication date Feb 4, 2016
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Julien GATINEAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)MOLYBDENUM MOLECULES FOR DEPOSITION...
- Publication number 20160002786
- Publication date Jan 7, 2016
- L'Air Liquide, Société Anonyme pour l'Etude et I'Exploitation des Procédés Ge...
- Julien GATINEAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jiro YOKOTA

Person

Patents Grantslast 30 patents

Systems and methods for storage and supply of F3NO-free FNO gases a...

Chemistries for etching multi-stacked layers

SiN selective etch to SiO2 with non-plasma dry process for 3D NAND...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES A...

SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES A...

SiN SELECTIVE ETCH TO SiO2 WITH NON-PLASMA DRY PROCESS FOR 3D NAND...

CHEMISTRIES FOR ETCHING MULTI-STACKED LAYERS

BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)MOLYBDENUM MOLECULES FOR DEPOSITION...

BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)TUNGSTEN MOLECULES FOR DEPOSITION OF...

BIS(ALKYLIMIDO)-BIS(ALKYLAMIDO)MOLYBDENUM MOLECULES FOR DEPOSITION...