Jiro Yokoya

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,494,866
- Issue date Nov 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative tone resist composition for solvent developing and method...
- Patent number 9,459,528
- Issue date Oct 4, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomohiro Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,411,224
- Issue date Aug 9, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,405,200
- Issue date Aug 2, 2016
- TOYKO OHKA KOGYO CO., LTD.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,377,685
- Issue date Jun 28, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,029,070
- Issue date May 12, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,023,585
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,023,577
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 8,968,990
- Issue date Mar 3, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,956,800
- Issue date Feb 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern and novel comp...
- Patent number 8,900,795
- Issue date Dec 2, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming resist pattern and resist composition
- Patent number 8,877,432
- Issue date Nov 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,486,605
- Issue date Jul 16, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method for a process of liquid immersion lithography
- Patent number 8,409,360
- Issue date Apr 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning liquid for lithography and a cleaning method using it for...
- Patent number 8,058,220
- Issue date Nov 15, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220107564
- Publication date Apr 7, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro YOKOYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210141309
- Publication date May 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210141308
- Publication date May 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210026243
- Publication date Jan 28, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20150147702
- Publication date May 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20150111155
- Publication date Apr 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE TONE RESIST COMPOSITION FOR SOLVENT DEVELOPING AND METHOD...
- Publication number 20140363770
- Publication date Dec 11, 2014
- Tomohiro Oikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130344436
- Publication date Dec 26, 2013
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20130260314
- Publication date Oct 3, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130189618
- Publication date Jul 25, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMP...
- Publication number 20130177854
- Publication date Jul 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130177853
- Publication date Jul 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130137047
- Publication date May 30, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hideto Nito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130115555
- Publication date May 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130084523
- Publication date Apr 4, 2013
- TOKYO OHKA KOGYO CO., LTD.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130078572
- Publication date Mar 28, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20130017500
- Publication date Jan 17, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20120183899
- Publication date Jul 19, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION
- Publication number 20110262872
- Publication date Oct 27, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jiro Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid for lithography and a cleaning method using it for...
- Publication number 20110061678
- Publication date Mar 17, 2011
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning liquid and a cleaning method
- Publication number 20110056511
- Publication date Mar 10, 2011
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110008728
- Publication date Jan 13, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100190108
- Publication date Jul 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jiro Yokoya

Person

Patents Grantslast 30 patents

Resist composition and method of forming resist pattern

Negative tone resist composition for solvent developing and method...

Method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and novel comp...

Method of forming resist pattern and resist composition

Positive resist composition and method of forming resist pattern

Cleaning method for a process of liquid immersion lithography

Cleaning liquid for lithography and a cleaning method using it for...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

NEGATIVE TONE RESIST COMPOSITION FOR SOLVENT DEVELOPING AND METHOD...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMP...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION

Cleaning liquid for lithography and a cleaning method using it for...

Cleaning liquid and a cleaning method

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN