Jisoo Oh

Person

lncheon, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of fabricating semiconductor devices
- Patent number 10,522,401
- Issue date Dec 31, 2019
- Samsung Electronics Co., Ltd.
- Sungwoo Myung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating semiconductor devices
- Patent number 10,186,457
- Issue date Jan 22, 2019
- Samsung Electronics Co., Ltd.
- Sungwoo Myung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices
- Patent number 10,043,889
- Issue date Aug 7, 2018
- Samsung Electronics Co., Ltd.
- GeumJung Seong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods for fabricating the same
- Patent number 9,806,168
- Issue date Oct 31, 2017
- Samsung Electronics Co., Ltd.
- GeumJung Seong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of fabricating the same
- Patent number 9,806,166
- Issue date Oct 31, 2017
- Samsung Electronics Co., Ltd.
- Sungwoo Myung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
WIRING STRUCTURES AND METHODS OF MANUFACTURING THE SAME
- Publication number 20250192041
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Seongcheon AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE INCLUDING A METAL WIRING LAYER
- Publication number 20250192042
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Wonsuk LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20250167111
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Jisoo OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICES
- Publication number 20250120140
- Publication date Apr 10, 2025
- Samsung Electronics Co., Ltd.
- Jisoo Oh
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250070021
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Ki-Il KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20240392191
- Publication date Nov 28, 2024
- SEMES CO., LTD.
- Kyungseok MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20240392192
- Publication date Nov 28, 2024
- SEMES CO., LTD.
- Kyungseok MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FABRICATING SEMICONDUCTOR DEVICES
- Publication number 20190157147
- Publication date May 23, 2019
- Samsung Electronics Co., Ltd.
- Sungwoo MYUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FABRICATING SEMICONDUCTOR DEVICES
- Publication number 20180061958
- Publication date Mar 1, 2018
- Samsung Electronics Co., Ltd.
- Sungwoo MYUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices
- Publication number 20180033867
- Publication date Feb 1, 2018
- GeumJung Seong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20170200802
- Publication date Jul 13, 2017
- Samsung Electronics Co., Ltd.
- Sungwoo MYUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS FOR FABRICATING THE SAME
- Publication number 20160240630
- Publication date Aug 18, 2016
- GeumJung Seong
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Methods of fabricating semiconductor devices

Methods of fabricating semiconductor devices

Semiconductor devices

Semiconductor devices and methods for fabricating the same

Semiconductor devices and methods of fabricating the same

Patents Applicationslast 30 patents

WIRING STRUCTURES AND METHODS OF MANUFACTURING THE SAME

INTEGRATED CIRCUIT DEVICE INCLUDING A METAL WIRING LAYER

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

INTEGRATED CIRCUIT DEVICES

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

METHODS OF FABRICATING SEMICONDUCTOR DEVICES

METHODS OF FABRICATING SEMICONDUCTOR DEVICES

Semiconductor Devices

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICES AND METHODS FOR FABRICATING THE SAME