Joachim Hartjes

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical arrangement and method for repairing the optical arrangemen...
- Patent number 11,467,500
- Issue date Oct 11, 2022
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Grant
Method and device for determining the heating state of an optical e...
- Patent number 11,320,314
- Issue date May 3, 2022
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Support of an optical unit
- Patent number 11,307,503
- Issue date Apr 19, 2022
- Carl Zeiss SMT GmbH
- Martin Vogt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement for EUV radiation with a shield for protection...
- Patent number 11,137,687
- Issue date Oct 5, 2021
- Carl Zeiss SMT GmbH
- Bjoern Liebaug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical module with an anticollision device for module components
- Patent number 11,054,755
- Issue date Jul 6, 2021
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, lithography apparatus and method
- Patent number 10,613,443
- Issue date Apr 7, 2020
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Grant
Optical component for use in a radiation source module of a project...
- Patent number 10,288,894
- Issue date May 14, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus comprising a measuring system for mea...
- Patent number 10,162,270
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus including mechanism to reduce influen...
- Patent number 10,162,267
- Issue date Dec 25, 2018
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an optical element for an optical system, in p...
- Patent number 10,146,138
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G02 - OPTICS
Information Patent Grant
Projection exposure apparatus with wavefront measuring device and o...
- Patent number 10,012,911
- Issue date Jul 3, 2018
- Carl Zeiss SMT GmbH
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus with segmented mirror
- Patent number 9,846,375
- Issue date Dec 19, 2017
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for microlithography comprising an op...
- Patent number 9,759,550
- Issue date Sep 12, 2017
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for microlithography comprising an op...
- Patent number 9,714,822
- Issue date Jul 25, 2017
- Carl Zeiss SMT GmbH
- Alexander Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocking element for protecting optical elements in projection expo...
- Patent number 9,684,243
- Issue date Jun 20, 2017
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and cooling system for cooling an optical element for EUV ap...
- Patent number 9,671,584
- Issue date Jun 6, 2017
- Carl Zeiss SMT GmbH
- Guenther Dengel
- F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information Patent Grant
Facet mirror device
- Patent number 9,599,910
- Issue date Mar 21, 2017
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for thermal actuation of a mirror in a microlithographi...
- Patent number 9,500,957
- Issue date Nov 22, 2016
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV microlithography illumination optical system and EUV attenuator...
- Patent number 9,482,959
- Issue date Nov 1, 2016
- Carl Zeiss SMT GmbH
- Nicolas Schmidts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facet mirror device
- Patent number 9,465,208
- Issue date Oct 11, 2016
- Carl Zeiss SMT GmbH
- Martin Vogt
- G02 - OPTICS
Information Patent Grant
Liquid cooled EUV reflector
- Patent number 9,423,590
- Issue date Aug 23, 2016
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Grant
Arrangement for mirror temperature measurement and/or thermal actua...
- Patent number 9,207,541
- Issue date Dec 8, 2015
- Carl Zeiss SMT GmbH
- Markus Hauf
- G01 - MEASURING TESTING
Information Patent Grant
Optical element unit and method of supporting an optical element
- Patent number 9,134,501
- Issue date Sep 15, 2015
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Grant
Optical element having a plurality of reflective facet elements
- Patent number 9,063,336
- Issue date Jun 23, 2015
- Carl Zeiss SMT GmbH
- Marc Kirch
- G02 - OPTICS
Information Patent Grant
Mirror with a mirror carrier and projection exposure apparatus
- Patent number 8,831,170
- Issue date Sep 9, 2014
- Carl Zeiss SMT GmbH
- Rutger Wevers
- G02 - OPTICS
Information Patent Grant
Illumination optics for EUV microlithography and related system and...
- Patent number 8,587,767
- Issue date Nov 19, 2013
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical module with minimized overrun of the optical element
- Patent number 8,441,747
- Issue date May 14, 2013
- Carl Zeiss SMT GmbH
- Willi Heintel
- G02 - OPTICS
Information Patent Grant
Method and apparatus for setting an illumination optical unit
- Patent number 8,345,219
- Issue date Jan 1, 2013
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF AN OPTICAL E...
- Publication number 20210148762
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G01 - MEASURING TESTING
Information Patent Application
SUPPORT OF AN OPTICAL UNIT
- Publication number 20210116823
- Publication date Apr 22, 2021
- Carl Zeiss SMT GMBH
- Martin Vogt
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT AND METHOD FOR REPAIRING THE OPTICAL ARRANGEMEN...
- Publication number 20200209758
- Publication date Jul 2, 2020
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION...
- Publication number 20200166847
- Publication date May 28, 2020
- Carl Zeiss SMT GMBH
- Bjoern LIEBAUG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20190196339
- Publication date Jun 27, 2019
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Application
OPTICAL MODULE WITH AN ANTICOLLISION DEVICE FOR MODULE COMPONENTS
- Publication number 20190171118
- Publication date Jun 6, 2019
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH WAVEFRONT MEASURING DEVICE AND O...
- Publication number 20170336714
- Publication date Nov 23, 2017
- Carl Zeiss SMT GMBH
- Michael Arnz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Producing An Optical Element For An Optical System, In P...
- Publication number 20170315452
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G02 - OPTICS
Information Patent Application
OPTICAL COMPONENT
- Publication number 20170293154
- Publication date Oct 12, 2017
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
Optical Element Unit And Method Of Supporting An Optical Element
- Publication number 20160109679
- Publication date Apr 21, 2016
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS INCLUDING MECHANISM TO REDUCE INFLUEN...
- Publication number 20150316854
- Publication date Nov 5, 2015
- Carl Zeiss SMT GMBH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN OP...
- Publication number 20150198437
- Publication date Jul 16, 2015
- Carl Zeiss SMT GMBH
- Alexander Wolf
- G01 - MEASURING TESTING
Information Patent Application
BLOCKING ELEMENT FOR PROTECTING OPTICAL ELEMENTS IN PROJECTION EXPO...
- Publication number 20150177626
- Publication date Jun 25, 2015
- Carl Zeiss SMT GMBH
- Joachim HARTJES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND COOLING SYSTEM FOR COOLING AN OPTICAL ELEMENT FOR EUV AP...
- Publication number 20150103426
- Publication date Apr 16, 2015
- Carl Zeiss SMT GMBH
- Guenther Dengel
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY APPARATUS WITH SEGMENTED MIRROR
- Publication number 20150103327
- Publication date Apr 16, 2015
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection Exposure Apparatus Comprising a Measuring System for Mea...
- Publication number 20140340664
- Publication date Nov 20, 2014
- Sascha Bleidistel
- G01 - MEASURING TESTING
Information Patent Application
ARRANGEMENT FOR THERMAL ACTUATION OF A MIRROR IN A MICROLITHOGRAPHI...
- Publication number 20140139816
- Publication date May 22, 2014
- Joachim Hartjes
- G02 - OPTICS
Information Patent Application
FACET MIRROR DEVICE
- Publication number 20140104589
- Publication date Apr 17, 2014
- Martin Vogt
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT
- Publication number 20140071523
- Publication date Mar 13, 2014
- Joachim Hartjes
- G02 - OPTICS
Information Patent Application
Projection Exposure Tool for Microlithography and Method for Microl...
- Publication number 20130182264
- Publication date Jul 18, 2013
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Arrangement for mirror temperature measurement and/or thermal actua...
- Publication number 20130176544
- Publication date Jul 11, 2013
- Carl Zeiss SMT GMBH
- Markus Hauf
- G02 - OPTICS
Information Patent Application
FACET MIRROR DEVICE
- Publication number 20130120730
- Publication date May 16, 2013
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR SETTING AN ILLUMINATION OPTICAL UNIT
- Publication number 20120300195
- Publication date Nov 29, 2012
- Carl Zeiss SMT GMBH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS
- Publication number 20120293785
- Publication date Nov 22, 2012
- Carl Zeiss SMT GMBH
- Marc Kirch
- G02 - OPTICS
Information Patent Application
FACET MIRROR FOR USE IN MICROLITHOGRAPHY
- Publication number 20120287414
- Publication date Nov 15, 2012
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G02 - OPTICS
Information Patent Application
EUV MICROLITHOGRAPHY ILLUMINATION OPTICAL SYSTEM AND EUV ATTENUATOR...
- Publication number 20120069313
- Publication date Mar 22, 2012
- Carl Zeiss SMT GMBH
- Nicolas Schmidts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND...
- Publication number 20110063598
- Publication date Mar 17, 2011
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL UNIT HAVING ADJUSTABLE FORCE ACTION ON AN OPTICAL MODULE
- Publication number 20110019171
- Publication date Jan 27, 2011
- Carl Zeiss SMT AG
- Erich Schubert
- G02 - OPTICS
Information Patent Application
Optical element unit and method of supporting an optical element
- Publication number 20090147229
- Publication date Jun 11, 2009
- Carl Zeiss SMT AG
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
Optical module with minimized overrun of the optical element
- Publication number 20080204689
- Publication date Aug 28, 2008
- Carl Zeiss SMT AG
- Willi Heintel
- G02 - OPTICS

Joachim Hartjes

Person

Patents Grantslast 30 patents

Optical arrangement and method for repairing the optical arrangemen...

Method and device for determining the heating state of an optical e...

Support of an optical unit

Optical arrangement for EUV radiation with a shield for protection...

Optical module with an anticollision device for module components

Optical system, lithography apparatus and method

Optical component for use in a radiation source module of a project...

Projection exposure apparatus comprising a measuring system for mea...

Projection exposure apparatus including mechanism to reduce influen...

Method for producing an optical element for an optical system, in p...

Projection exposure apparatus with wavefront measuring device and o...

Lithography apparatus with segmented mirror

Projection exposure apparatus for microlithography comprising an op...

Projection exposure apparatus for microlithography comprising an op...

Blocking element for protecting optical elements in projection expo...

Method and cooling system for cooling an optical element for EUV ap...

Facet mirror device

Arrangement for thermal actuation of a mirror in a microlithographi...

EUV microlithography illumination optical system and EUV attenuator...

Facet mirror device

Liquid cooled EUV reflector

Arrangement for mirror temperature measurement and/or thermal actua...

Optical element unit and method of supporting an optical element

Optical element having a plurality of reflective facet elements

Mirror with a mirror carrier and projection exposure apparatus

Illumination optics for EUV microlithography and related system and...

Optical module with minimized overrun of the optical element

Method and apparatus for setting an illumination optical unit

Patents Applicationslast 30 patents

METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF AN OPTICAL E...

SUPPORT OF AN OPTICAL UNIT

OPTICAL ARRANGEMENT AND METHOD FOR REPAIRING THE OPTICAL ARRANGEMEN...

OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION...

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

OPTICAL MODULE WITH AN ANTICOLLISION DEVICE FOR MODULE COMPONENTS

PROJECTION EXPOSURE APPARATUS WITH WAVEFRONT MEASURING DEVICE AND O...

Method For Producing An Optical Element For An Optical System, In P...

OPTICAL COMPONENT

Optical Element Unit And Method Of Supporting An Optical Element

PROJECTION EXPOSURE APPARATUS INCLUDING MECHANISM TO REDUCE INFLUEN...

PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN OP...

BLOCKING ELEMENT FOR PROTECTING OPTICAL ELEMENTS IN PROJECTION EXPO...

METHOD AND COOLING SYSTEM FOR COOLING AN OPTICAL ELEMENT FOR EUV AP...

LITHOGRAPHY APPARATUS WITH SEGMENTED MIRROR

Projection Exposure Apparatus Comprising a Measuring System for Mea...

ARRANGEMENT FOR THERMAL ACTUATION OF A MIRROR IN A MICROLITHOGRAPHI...

FACET MIRROR DEVICE

OPTICAL ELEMENT

Projection Exposure Tool for Microlithography and Method for Microl...

Arrangement for mirror temperature measurement and/or thermal actua...

FACET MIRROR DEVICE

METHOD AND APPARATUS FOR SETTING AN ILLUMINATION OPTICAL UNIT

OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS

FACET MIRROR FOR USE IN MICROLITHOGRAPHY

EUV MICROLITHOGRAPHY ILLUMINATION OPTICAL SYSTEM AND EUV ATTENUATOR...

ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND...

OPTICAL UNIT HAVING ADJUSTABLE FORCE ACTION ON AN OPTICAL MODULE

Optical element unit and method of supporting an optical element

Optical module with minimized overrun of the optical element