Joanna Dziewiszek

Person

Boxborough, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of electroplating photoresist defined features from copper e...
- Patent number 10,508,349
- Issue date Dec 17, 2019
- Rohm and Haas Electronic Materials LLC
- Ravi Pokhrel
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method of filling through-holes to reduce voids and other defects
- Patent number 10,508,357
- Issue date Dec 17, 2019
- Rohm and Haas Electronic Materials LLC
- Nagarajan Jayaraju
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper electroplating baths and electroplating methods capable of e...
- Patent number 10,190,228
- Issue date Jan 29, 2019
- Rohm and Haas Electronic Materials LLC
- Matthew Thorseth
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method of electroplating photoresist defined features from copper e...
- Patent number 10,104,782
- Issue date Oct 16, 2018
- Dow Global Technologies LLC
- Matthew Thorseth
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method of electroplating photoresist defined features from copper e...
- Patent number 10,100,421
- Issue date Oct 16, 2018
- Dow Global Technologies LLC
- Matthew Thorseth
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method of electroplating photoresist defined features from copper e...
- Patent number 9,932,684
- Issue date Apr 3, 2018
- Rohm and Haas Electronic Materials LLC
- Matthew Thorseth
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Polymorphs of N-malonyl-bis(N′-methyl-N′-thiobenzoylhydrazide)
- Patent number 9,051,250
- Issue date Jun 9, 2015
- Synta Pharmaceuticals Corp.
- Elena Kostik
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymorphs of N-malonyl-bis(N′-methyl-N′-thiobenzoylhydrazide)
- Patent number 8,637,704
- Issue date Jan 28, 2014
- Synta Pharmaceuticals Corp.
- Elena Kostik
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FILLING THROUGH-HOLES TO REDUCE VOIDS
- Publication number 20230279577
- Publication date Sep 7, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Nagarajan Jayaraju
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF ELECTROPLATING PHOTORESIST DEFINED FEATURES FROM COPPER E...
- Publication number 20170370014
- Publication date Dec 28, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Ravi Pokhrel
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
COPPER ELECTROPLATING BATHS AND ELECTROPLATING METHODS CAPABLE OF E...
- Publication number 20170283970
- Publication date Oct 5, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Matthew Thorseth
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF FILLING THROUGH-HOLES TO REDUCE VOIDS AND OTHER DEFECTS
- Publication number 20170233886
- Publication date Aug 17, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Nagarajan Jayaraju
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF ELECTROPLATING PHOTORESIST DEFINED FEATURES FROM COPPER E...
- Publication number 20170037526
- Publication date Feb 9, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Matthew Thorseth
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF ELECTROPLATING PHOTORESIST DEFINED FEATURES FROM COPPER E...
- Publication number 20170042037
- Publication date Feb 9, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Matthew Thorseth
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF ELECTROPLATING PHOTORESIST DEFINED FEATURES FROM COPPER E...
- Publication number 20170037527
- Publication date Feb 9, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Matthew Thorseth
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
POLYMORPHS OF N-MALONYL-BIS(N`-METHYL-N`-THIOBENZOYLHYDRAZIDE)
- Publication number 20140350115
- Publication date Nov 27, 2014
- Synta Pharmaceuticals Corp.
- Elena Kostik
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Polymorphs of N-Malonyl-Bis(N'-Methyl-N'-Thiobenzoylhydrazide)
- Publication number 20110196025
- Publication date Aug 11, 2011
- Synta Pharmaceuticals Corp.
- Elena I. Kostik
- C07 - ORGANIC CHEMISTRY

Joanna Dziewiszek

Person

Patents Grantslast 30 patents

Method of electroplating photoresist defined features from copper e...

Method of filling through-holes to reduce voids and other defects

Copper electroplating baths and electroplating methods capable of e...

Method of electroplating photoresist defined features from copper e...

Method of electroplating photoresist defined features from copper e...

Method of electroplating photoresist defined features from copper e...

Polymorphs of N-malonyl-bis(N′-methyl-N′-thiobenzoylhydrazide)

Polymorphs of N-malonyl-bis(N′-methyl-N′-thiobenzoylhydrazide)

Patents Applicationslast 30 patents

METHOD OF FILLING THROUGH-HOLES TO REDUCE VOIDS

METHOD OF ELECTROPLATING PHOTORESIST DEFINED FEATURES FROM COPPER E...

COPPER ELECTROPLATING BATHS AND ELECTROPLATING METHODS CAPABLE OF E...

METHOD OF FILLING THROUGH-HOLES TO REDUCE VOIDS AND OTHER DEFECTS

METHOD OF ELECTROPLATING PHOTORESIST DEFINED FEATURES FROM COPPER E...

METHOD OF ELECTROPLATING PHOTORESIST DEFINED FEATURES FROM COPPER E...

METHOD OF ELECTROPLATING PHOTORESIST DEFINED FEATURES FROM COPPER E...

POLYMORPHS OF N-MALONYL-BIS(N`-METHYL-N`-THIOBENZOYLHYDRAZIDE)

Polymorphs of N-Malonyl-Bis(N'-Methyl-N'-Thiobenzoylhydrazide)