Jochen Hetzler

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method and device for correcting a telecentricity error of an imagi...
- Patent number 12,105,427
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for characterizing the surface shape of a test ob...
- Patent number 11,879,720
- Issue date Jan 23, 2024
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Method for calibrating a measuring apparatus
- Patent number 11,774,237
- Issue date Oct 3, 2023
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Compensation optical system for an interferometric measuring system
- Patent number 11,199,396
- Issue date Dec 14, 2021
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Measuring device for interferometric determination of a shape of an...
- Patent number 10,527,403
- Issue date Jan 7, 2020
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Measuring method and measuring arrangement for an imaging optical s...
- Patent number 10,502,545
- Issue date Dec 10, 2019
- Carl Zeiss SMT GmbH
- Ulrich Wegmann
- G01 - MEASURING TESTING
Information Patent Grant
Test device and method for testing a mirror
- Patent number 10,422,718
- Issue date Sep 24, 2019
- Carl Zeiss SMT GmbH
- Hans-Michael Stiepan
- G01 - MEASURING TESTING
Information Patent Grant
Method for aligning a mirror of a microlithographic projection expo...
- Patent number 10,359,703
- Issue date Jul 23, 2019
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric measuring arrangement
- Patent number 10,337,850
- Issue date Jul 2, 2019
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 10,303,068
- Issue date May 28, 2019
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Method for aligning a mirror of a microlithographic projection expo...
- Patent number 10,101,667
- Issue date Oct 16, 2018
- Carl Zeiss SMT GmbH
- Rolf Freimann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask inspection system for inspecting lithography masks
- Patent number 10,054,426
- Issue date Aug 21, 2018
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,709,902
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror of a projection exposure apparatus for microlithography with...
- Patent number 9,606,339
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,442,393
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,052,606
- Issue date Jun 9, 2015
- Carl Zeiss SMT GmbH
- Andras G. Major
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure tool for microlithography and method for microl...
- Patent number 9,046,792
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,982,325
- Issue date Mar 17, 2015
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and calibration mask for calibrating a position measuring ap...
- Patent number 8,617,774
- Issue date Dec 31, 2013
- Carl Zeiss SMS GmbH
- Norbert Kerwien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for microlithography
- Patent number 8,436,982
- Issue date May 7, 2013
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,107,054
- Issue date Jan 31, 2012
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element and method of calibrating a measuring apparatus com...
- Patent number 8,089,634
- Issue date Jan 3, 2012
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Hologram and method of manufacturing an optical element using a hol...
- Patent number 7,848,031
- Issue date Dec 7, 2010
- Carl Zeiss SMT AG
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Optical system, method of manufacturing an optical system and metho...
- Patent number 7,605,926
- Issue date Oct 20, 2009
- Carl Zeiss SMT AG
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing an optical element using a hologram
- Patent number 7,061,626
- Issue date Jun 13, 2006
- Carl Zeiss SMT AG
- Frank Schillke
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MEASUREMENT DEVICE FOR INTERFEROMETRIC MEASUREMENT OF A SURFACE SHAPE
- Publication number 20240077305
- Publication date Mar 7, 2024
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND DEVICE FOR CORRECTING A TELECENTRICITY ERROR OF AN IMAGI...
- Publication number 20230050291
- Publication date Feb 16, 2023
- Carl Zeiss SMT GMBH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING DEVICE FOR INTERFEROMETRIC SHAPE MEASUREMENT
- Publication number 20220390709
- Publication date Dec 8, 2022
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
MEASURING APPARATUS FOR INTERFEROMETRIC SHAPE MEASUREMENT
- Publication number 20220349700
- Publication date Nov 3, 2022
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CALIBRATING A MEASURING APPARATUS
- Publication number 20220187061
- Publication date Jun 16, 2022
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT FOR A TEST INTERFEROMETER
- Publication number 20220170735
- Publication date Jun 2, 2022
- Carl Zeiss SMT GMBH
- Alexander Winkler
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT METHOD FOR INTERFEROMETRICALLY DETERMINING A SURFACE SHAPE
- Publication number 20220011095
- Publication date Jan 13, 2022
- Carl Zeiss SMT GMBH
- Hans Michael STIEPAN
- G01 - MEASURING TESTING
Information Patent Application
DEVICE AND METHOD FOR CHARACTERIZING THE SURFACE SHAPE OF A TEST OB...
- Publication number 20210372781
- Publication date Dec 2, 2021
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
COMPENSATION OPTICAL SYSTEM FOR AN INTERFEROMETRIC MEASURING SYSTEM
- Publication number 20200225028
- Publication date Jul 16, 2020
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
MEASURING DEVICE FOR INTERFEROMETRIC DETERMINATION OF A SHAPE OF AN...
- Publication number 20190154427
- Publication date May 23, 2019
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ALIGNING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPO...
- Publication number 20190049853
- Publication date Feb 14, 2019
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERFEROMETRIC MEASURING ARRANGEMENT
- Publication number 20180106591
- Publication date Apr 19, 2018
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Application
MEASURING METHOD AND MEASURING ARRANGEMENT FOR AN IMAGING OPTICAL S...
- Publication number 20180087891
- Publication date Mar 29, 2018
- Carl Zeiss SMT GMBH
- Ulrich WEGMANN
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20170371251
- Publication date Dec 28, 2017
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
TEST DEVICE AND METHOD FOR TESTING A MIRROR
- Publication number 20170343449
- Publication date Nov 30, 2017
- Carl Zeiss SMT GMBH
- Hans-Michael STIEPAN
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20170082931
- Publication date Mar 23, 2017
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ALIGNING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPO...
- Publication number 20170023865
- Publication date Jan 26, 2017
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK INSPECTION SYSTEM FOR INSPECTING LITHOGRAPHY MASKS
- Publication number 20160123724
- Publication date May 5, 2016
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20160116851
- Publication date Apr 28, 2016
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT AND MEASURING METHOD
- Publication number 20150198438
- Publication date Jul 16, 2015
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...
- Publication number 20150042975
- Publication date Feb 12, 2015
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
Projection Exposure Tool for Microlithography and Method for Microl...
- Publication number 20130252146
- Publication date Sep 26, 2013
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Application
Projection Exposure Tool for Microlithography and Method for Microl...
- Publication number 20130182264
- Publication date Jul 18, 2013
- Carl Zeiss SMT GMBH
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20130077074
- Publication date Mar 28, 2013
- Carl Zeiss SMT GMBH
- Andras G. Major
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES,...
- Publication number 20120224186
- Publication date Sep 6, 2012
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G02 - OPTICS
Information Patent Application
METHOD AND CALIBRATION MASK FOR CALIBRATING A POSITION MEASURING AP...
- Publication number 20120160007
- Publication date Jun 28, 2012
- CARL ZEISS SMS GMBH
- Norbert Kerwien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20120092637
- Publication date Apr 19, 2012
- Carl Zeiss SMT GMBH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20100201959
- Publication date Aug 12, 2010
- Carl Zeiss SMT AG
- Helmut Beierl
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COM...
- Publication number 20100177321
- Publication date Jul 15, 2010
- Carl Zeiss SMT AG
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY
- Publication number 20100134768
- Publication date Jun 3, 2010
- Carl Zeiss SMT AG
- Jochen Hetzler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jochen Hetzler

Person

Patents Grantslast 30 patents

Method and device for correcting a telecentricity error of an imagi...

Device and method for characterizing the surface shape of a test ob...

Method for calibrating a measuring apparatus

Compensation optical system for an interferometric measuring system

Measuring device for interferometric determination of a shape of an...

Measuring method and measuring arrangement for an imaging optical s...

Test device and method for testing a mirror

Method for aligning a mirror of a microlithographic projection expo...

Interferometric measuring arrangement

Projection exposure tool for microlithography and method for microl...

Method for aligning a mirror of a microlithographic projection expo...

Mask inspection system for inspecting lithography masks

Projection exposure tool for microlithography and method for microl...

Mirror of a projection exposure apparatus for microlithography with...

Projection exposure tool for microlithography and method for microl...

Microlithographic projection exposure apparatus

Projection exposure tool for microlithography and method for microl...

Microlithographic projection exposure apparatus

Method and calibration mask for calibrating a position measuring ap...

Projection objective for microlithography

Microlithographic projection exposure apparatus

Optical element and method of calibrating a measuring apparatus com...

Hologram and method of manufacturing an optical element using a hol...

Optical system, method of manufacturing an optical system and metho...

Method of manufacturing an optical element using a hologram

Patents Applicationslast 30 patents

MEASUREMENT DEVICE FOR INTERFEROMETRIC MEASUREMENT OF A SURFACE SHAPE

METHOD AND DEVICE FOR CORRECTING A TELECENTRICITY ERROR OF AN IMAGI...

MEASURING DEVICE FOR INTERFEROMETRIC SHAPE MEASUREMENT

MEASURING APPARATUS FOR INTERFEROMETRIC SHAPE MEASUREMENT

METHOD FOR CALIBRATING A MEASURING APPARATUS

DIFFRACTIVE OPTICAL ELEMENT FOR A TEST INTERFEROMETER

MEASUREMENT METHOD FOR INTERFEROMETRICALLY DETERMINING A SURFACE SHAPE

DEVICE AND METHOD FOR CHARACTERIZING THE SURFACE SHAPE OF A TEST OB...

COMPENSATION OPTICAL SYSTEM FOR AN INTERFEROMETRIC MEASURING SYSTEM

MEASURING DEVICE FOR INTERFEROMETRIC DETERMINATION OF A SHAPE OF AN...

METHOD FOR ALIGNING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPO...

INTERFEROMETRIC MEASURING ARRANGEMENT

MEASURING METHOD AND MEASURING ARRANGEMENT FOR AN IMAGING OPTICAL S...

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

TEST DEVICE AND METHOD FOR TESTING A MIRROR

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

METHOD FOR ALIGNING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPO...

MASK INSPECTION SYSTEM FOR INSPECTING LITHOGRAPHY MASKS

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

DIFFRACTIVE OPTICAL ELEMENT AND MEASURING METHOD

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROL...

Projection Exposure Tool for Microlithography and Method for Microl...

Projection Exposure Tool for Microlithography and Method for Microl...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES,...

METHOD AND CALIBRATION MASK FOR CALIBRATING A POSITION MEASURING AP...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COM...

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY