Jodi Grzeskowiak

Person

Cuddebackville, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for tuning stress transitions of films on a substrate
- Patent number 11,990,334
- Issue date May 21, 2024
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a narrow trench
- Patent number 11,841,617
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Anton J. Devilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning a substrate using a sidewall spacer etch mask
- Patent number 11,782,346
- Issue date Oct 10, 2023
- Tokyo Electron Limited
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to form narrow slot contacts
- Patent number 11,682,559
- Issue date Jun 20, 2023
- Tokyo Electron Limited
- Michael Murphy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling semiconductor film thickness
- Patent number 11,656,550
- Issue date May 23, 2023
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of bottom-up metallization in a recessed feature
- Patent number 11,450,562
- Issue date Sep 20, 2022
- Tokyo Electron Limited
- Kai-Hung Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple patterning processes
- Patent number 11,417,526
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for planarization of organic films
- Patent number 11,393,694
- Issue date Jul 19, 2022
- Tokyo Electron Limited
- Anton Devilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D directed self-assembly for nanostructures
- Patent number 11,342,427
- Issue date May 24, 2022
- Tokyo Electron Limited
- Anton deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for planarization of spin-on and CVD-deposited organic films
- Patent number 11,335,566
- Issue date May 17, 2022
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reverse contact and silicide process for three-dimensional semicond...
- Patent number 11,322,401
- Issue date May 3, 2022
- Tokyo Electron Limited
- Jeffrey Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reverse contact and silicide process for three-dimensional logic de...
- Patent number 11,264,274
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Jeffrey Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for layer by layer growth of conformal films
- Patent number 11,201,051
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional device and method of forming the same
- Patent number 10,770,479
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- Jeffrey Smith
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Double Patterning Method of Patterning a Substrate
- Publication number 20240087892
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING A SEMICONDUCTOR WORKPIECE
- Publication number 20240085795
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Jodi Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A SUBSTRATE USING A SIDEWALL SPACER ETCH MASK
- Publication number 20230367217
- Publication date Nov 16, 2023
- TOKYO ELECTRON LIMITED
- Jodi GRZESKOWIAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOP-DOWN SELF-ALIGNMENT OF VIAS IN A SEMICONDUCTOR DEVICE FOR SUB-2...
- Publication number 20230352343
- Publication date Nov 2, 2023
- TOKYO ELECTRON LIMITED
- Jeffrey SMITH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self Aligned Multiple Patterning Method
- Publication number 20230290676
- Publication date Sep 14, 2023
- TOKYO ELECTRON LIMITED
- David Power
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO FORM NARROW SLOT CONTACTS
- Publication number 20230274940
- Publication date Aug 31, 2023
- TOKYO ELECTRON LIMITED
- Michael MURPHY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Patterns
- Publication number 20230052800
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING SEMICONDUCTOR FILM THICKNESS
- Publication number 20220066317
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO FORM NARROW SLOT CONTACTS
- Publication number 20210391180
- Publication date Dec 16, 2021
- TOKYO ELECTRON LIMITED
- Michael Murphy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Planarizing Organic Films
- Publication number 20210294148
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Jodi Grzeskowiak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multiple Patterning Processes
- Publication number 20210242020
- Publication date Aug 5, 2021
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D Directed Self-Assembly for Nanostructures
- Publication number 20210104609
- Publication date Apr 8, 2021
- TOKYO ELECTRON LIMITED
- Anton deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REVERSE CONTACT AND SILICIDE PROCESS FOR THREE-DIMENSIONAL SEMICOND...
- Publication number 20210098294
- Publication date Apr 1, 2021
- TOKYO ELECTRON LIMITED
- Jeffrey SMITH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REVERSE CONTACT AND SILICIDE PROCESS FOR THREE-DIMENSIONAL LOGIC DE...
- Publication number 20210098306
- Publication date Apr 1, 2021
- TOKYO ELECTRON LIMITED
- Jeffrey Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING A SUBSTRATE
- Publication number 20210088907
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Jodi GRZESKOWIAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A NARROW TRENCH
- Publication number 20210088904
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Anton J. DEVILLIERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF BOTTOM-UP METALLIZATION IN A RECESSED FEATURE
- Publication number 20210082750
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Kai-Hung YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TUNING STRESS TRANSITIONS OF FILMS ON A SUBSTRATE
- Publication number 20210020435
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Daniel FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PLANARIZATION OF SPIN-ON AND CVD-DEPOSITED ORGANIC FILMS
- Publication number 20210020453
- Publication date Jan 21, 2021
- Daniel FULFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR LAYER BY LAYER GROWTH OF CONFORMAL FILMS
- Publication number 20200152448
- Publication date May 14, 2020
- TOKYO ELECTRON LIMITED
- Jodi GRZESKOWIAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PLANARIZATION OF ORGANIC FILMS
- Publication number 20200152472
- Publication date May 14, 2020
- Tokyo Electron Limited
- Anton DEVILLIERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THREE-DIMENSIONAL DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20190288004
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Jeffrey SMITH
- H01 - BASIC ELECTRIC ELEMENTS

Jodi Grzeskowiak

Person

Patents Grantslast 30 patents

Method for tuning stress transitions of films on a substrate

Method of forming a narrow trench

Method of patterning a substrate using a sidewall spacer etch mask

Method to form narrow slot contacts

Controlling semiconductor film thickness

Method of bottom-up metallization in a recessed feature

Multiple patterning processes

Method for planarization of organic films

3D directed self-assembly for nanostructures

Method for planarization of spin-on and CVD-deposited organic films

Reverse contact and silicide process for three-dimensional semicond...

Reverse contact and silicide process for three-dimensional logic de...

Method for layer by layer growth of conformal films

Three-dimensional device and method of forming the same

Patents Applicationslast 30 patents

Double Patterning Method of Patterning a Substrate

PATTERNING A SEMICONDUCTOR WORKPIECE

METHOD OF PATTERNING A SUBSTRATE USING A SIDEWALL SPACER ETCH MASK

TOP-DOWN SELF-ALIGNMENT OF VIAS IN A SEMICONDUCTOR DEVICE FOR SUB-2...

Self Aligned Multiple Patterning Method

METHOD TO FORM NARROW SLOT CONTACTS

Methods of Forming Patterns

CONTROLLING SEMICONDUCTOR FILM THICKNESS

METHOD TO FORM NARROW SLOT CONTACTS

Planarizing Organic Films

Multiple Patterning Processes

3D Directed Self-Assembly for Nanostructures

REVERSE CONTACT AND SILICIDE PROCESS FOR THREE-DIMENSIONAL SEMICOND...

REVERSE CONTACT AND SILICIDE PROCESS FOR THREE-DIMENSIONAL LOGIC DE...

PATTERNING A SUBSTRATE

METHOD OF FORMING A NARROW TRENCH

METHOD OF BOTTOM-UP METALLIZATION IN A RECESSED FEATURE

METHOD FOR TUNING STRESS TRANSITIONS OF FILMS ON A SUBSTRATE

METHOD FOR PLANARIZATION OF SPIN-ON AND CVD-DEPOSITED ORGANIC FILMS

METHOD FOR LAYER BY LAYER GROWTH OF CONFORMAL FILMS

METHOD FOR PLANARIZATION OF ORGANIC FILMS

THREE-DIMENSIONAL DEVICE AND METHOD OF FORMING THE SAME