Joel M. Cook

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for material deposition
- Patent number 8,490,573
- Issue date Jul 23, 2013
- Lam Research Corporation
- Yezdi Dordi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for electroless depositing a material on a surface of a wafer
- Patent number 7,875,554
- Issue date Jan 25, 2011
- Lam Research Corporation
- Yezdi Dordi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for material deposition in semiconductor fabri...
- Patent number 7,358,186
- Issue date Apr 15, 2008
- Lam Research Corporation
- Yezdi Dordi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processes for treating morphologically-modified silicon electrode s...
- Patent number 7,192,875
- Issue date Mar 20, 2007
- Lam Research Corporation
- Joel M. Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and apparatus for improved global dual-damascene pla...
- Patent number 6,939,796
- Issue date Sep 6, 2005
- Lam Research Corporation
- Shrikant P. Lohokare
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and apparatus for improved local dual-damascene plan...
- Patent number 6,821,899
- Issue date Nov 23, 2004
- Lam Research Corporation
- Shrikant P. Lohokare
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for reducing polymer deposition on substrate support
- Patent number 6,306,244
- Issue date Oct 23, 2001
- Lam Research Corporation
- William S. Kennedy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for running a high density plasma etcher to achieve reduced...
- Patent number 6,255,221
- Issue date Jul 3, 2001
- Lam Research Corporation
- Eric A. Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts for semiconductor device
- Patent number 6,165,910
- Issue date Dec 26, 2000
- Lam Research Corporation
- Janet M. Flanner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for igniting a plasma inside a plasma processing reactor
- Patent number 6,028,286
- Issue date Feb 22, 2000
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlling method and apparatus for a plasma processin...
- Patent number 5,863,376
- Issue date Jan 26, 1999
- Lam Research Corporation
- Thomas E. Wicker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for etching self-aligned contacts
- Patent number 5,783,496
- Issue date Jul 21, 1998
- Lam Research Corporation
- Janet M. Flanner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic field enhanced plasma processing chamber
- Patent number 5,346,579
- Issue date Sep 13, 1994
- Applied Materials, Inc.
- Joel M. Cook
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and Apparatus for Material Deposition
- Publication number 20110081779
- Publication date Apr 7, 2011
- LAM RESEARCH CORPORATION
- Yezdi Dordi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and Apparatus for Material Deposition
- Publication number 20080153291
- Publication date Jun 26, 2008
- LAM RESEARCH CORPORATION
- Yezdi Dordi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for material deposition
- Publication number 20050130415
- Publication date Jun 16, 2005
- LAM RESEARCH CORPORATION
- Yezdi Dordi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System, method and apparatus for improved global dual-damascene pla...
- Publication number 20040248408
- Publication date Dec 9, 2004
- LAM RESEARCH CORPORATION
- Shrikant P. Lohokare
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System, method and apparatus for improved local dual-damascene plan...
- Publication number 20040180545
- Publication date Sep 16, 2004
- LAM RESEARCH CORPORATION
- Shrikant P. Lohokare
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for running a high density plasma etcher to achieve reduced...
- Publication number 20020029853
- Publication date Mar 14, 2002
- Eric A. Hudson
- H01 - BASIC ELECTRIC ELEMENTS

Joel M. Cook

Person

Patents Grantslast 30 patents

Method and apparatus for material deposition

Method for electroless depositing a material on a surface of a wafer

Method and apparatus for material deposition in semiconductor fabri...

Processes for treating morphologically-modified silicon electrode s...

System, method and apparatus for improved global dual-damascene pla...

System, method and apparatus for improved local dual-damascene plan...

Apparatus for reducing polymer deposition on substrate support

Methods for running a high density plasma etcher to achieve reduced...

Self-aligned contacts for semiconductor device

Method for igniting a plasma inside a plasma processing reactor

Temperature controlling method and apparatus for a plasma processin...

Methods and apparatus for etching self-aligned contacts

Magnetic field enhanced plasma processing chamber

Patents Applicationslast 30 patents

Method and Apparatus for Material Deposition

Method and Apparatus for Material Deposition

Method and apparatus for material deposition

System, method and apparatus for improved global dual-damascene pla...

System, method and apparatus for improved local dual-damascene plan...

Methods for running a high density plasma etcher to achieve reduced...