Joel Seligson

Person

D.N. Misgav, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Structured illumination for contrast enhancement in overlay metrology
- Patent number 10,274,425
- Issue date Apr 30, 2019
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Grant
Near field metrology
- Patent number 10,261,014
- Issue date Apr 16, 2019
- KLA-Tencor Corporation
- Noam Sapiens
- G02 - OPTICS
Information Patent Grant
Compound objectives for imaging and scatterometry overlay
- Patent number 10,139,528
- Issue date Nov 27, 2018
- KLA-Tencor Corporation
- Joel Seligson
- G02 - OPTICS
Information Patent Grant
Structured illumination for contrast enhancement in overlay metrology
- Patent number 9,645,079
- Issue date May 9, 2017
- KLA-Tencor Corporation
- Joel Seligson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for lithographic mask production
- Patent number 9,442,369
- Issue date Sep 13, 2016
- KLA-Tencor Corporation
- Dmitry Shur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optics symmetrization for metrology
- Patent number 9,164,397
- Issue date Oct 20, 2015
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Structured illumination for contrast enhancement in overlay metrology
- Patent number 9,104,120
- Issue date Aug 11, 2015
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods
- Patent number 9,080,971
- Issue date Jul 14, 2015
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Flexible scatterometry metrology system and method
- Patent number 8,908,175
- Issue date Dec 9, 2014
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Discrete polarization scatterometry
- Patent number 8,896,832
- Issue date Nov 25, 2014
- KLA-Tencor Corp.
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods
- Patent number 8,873,054
- Issue date Oct 28, 2014
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Illumination control
- Patent number 8,681,413
- Issue date Mar 25, 2014
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Overlay metrology by pupil phase analysis
- Patent number 8,582,114
- Issue date Nov 12, 2013
- KLA-Tencor Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology systems and methods
- Patent number 8,441,639
- Issue date May 14, 2013
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for determining overlay and uses of same
- Patent number 7,876,438
- Issue date Jan 25, 2011
- KLA-Tencor Technologies Corporation
- Mark Ghinovker
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and apparatus for increasing metrology or inspection tool th...
- Patent number 7,724,375
- Issue date May 25, 2010
- KLA-Tencor Corporation
- Alex Novikov
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for determining overlay and uses of same
- Patent number 7,608,468
- Issue date Oct 27, 2009
- KLA-Tencor Technologies, Corp.
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical gain approach for enhancement of overlay and alignment syst...
- Patent number 7,602,491
- Issue date Oct 13, 2009
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Order selected overlay metrology
- Patent number 7,528,941
- Issue date May 5, 2009
- KLA-Tencor Technolgies Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Continuously varying offset mark and methods of determining overlay
- Patent number 7,440,105
- Issue date Oct 21, 2008
- KLA-Tencor Technologies Corporation
- Michael E. Adel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of overlay diagnostics for enhanced automatic process control
- Patent number 7,310,789
- Issue date Dec 18, 2007
- KLA-Tencor Technologies Corporation
- Joel L. Seligson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of overlay diagnostics for enhanced automatic process control
- Patent number 7,111,256
- Issue date Sep 19, 2006
- KLA-Tencor Technologies Corporation
- Joel L. Seligson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of overlay diagnostics for enhanced automatic process control
- Patent number 6,928,628
- Issue date Aug 9, 2005
- KLA-Tencor Technologies Corporation
- Joel L. Seligson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Autofocusing apparatus and method for high resolution microscope sy...
- Patent number 6,172,349
- Issue date Jan 9, 2001
- KLA-Tencor Corporation
- Isaac Katz
- G02 - OPTICS
Information Patent Grant
Imaging apparatus which includes a light-valve array having electro...
- Patent number 4,805,038
- Issue date Feb 14, 1989
- Eastman Kodak Company
- Joel L. Seligson
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Patents Applicationslast 30 patents

Information Patent Application
Structured Illumination for Contrast Enhancement in Overlay Metrology
- Publication number 20170307523
- Publication date Oct 26, 2017
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Application
Structured Illumination for Contrast Enhancement in Overlay Metrology
- Publication number 20160003735
- Publication date Jan 7, 2016
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Application
NEAR FIELD METROLOGY
- Publication number 20150198524
- Publication date Jul 16, 2015
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Application
Metrology Systems and Methods
- Publication number 20150036142
- Publication date Feb 5, 2015
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
Metrology Systems and Methods
- Publication number 20130229661
- Publication date Sep 5, 2013
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS
- Publication number 20130044331
- Publication date Feb 21, 2013
- KLA-Tencor Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION CONTROL
- Publication number 20120327503
- Publication date Dec 27, 2012
- KLA-Tencor Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY
- Publication number 20120206729
- Publication date Aug 16, 2012
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Application
OPTICS SYMMETRIZATION FOR METROLOGY
- Publication number 20120033226
- Publication date Feb 9, 2012
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
DISCRETE POLARIZATION SCATTEROMETRY
- Publication number 20110310388
- Publication date Dec 22, 2011
- KLA-Tencor Corporation
- Andrew V. Hill
- G02 - OPTICS
Information Patent Application
METROLOGY SYSTEMS AND METHODS
- Publication number 20110069312
- Publication date Mar 24, 2011
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and Methods for Determining Overlay and Uses of Same
- Publication number 20100005442
- Publication date Jan 7, 2010
- KLA-Tencor Technologies Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL GAIN APPROACH FOR ENHANCEMENT OF OVERLAY AND ALIGNMENT SYST...
- Publication number 20080266561
- Publication date Oct 30, 2008
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
ORDER SELECTED OVERLAY METROLOGY
- Publication number 20070279630
- Publication date Dec 6, 2007
- KLA-Tencor Technologies Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Use of overlay diagnostics for enhanced automatic process control
- Publication number 20060280357
- Publication date Dec 14, 2006
- KLA-Tencor Technologies, Corporation
- Joel L. Seligson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Continuously varying offset mark and methods of determining overlay
- Publication number 20050195398
- Publication date Sep 8, 2005
- KLA-Tencor Technologies Corporation
- Michael E. Adel
- B82 - NANO-TECHNOLOGY
Information Patent Application
Use of overlay diagnostics for enhanced automatic process control
- Publication number 20040040003
- Publication date Feb 26, 2004
- KLA-Tencor Technologies, Corporation
- Joel L. Seligson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Use of overlay diagnostics for enhanced automatic process control
- Publication number 20040038455
- Publication date Feb 26, 2004
- KLA-Tencor Technologies, Corporation
- Joel L. Seligson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Joel Seligson

Person

Patents Grantslast 30 patents

Structured illumination for contrast enhancement in overlay metrology

Near field metrology

Compound objectives for imaging and scatterometry overlay

Structured illumination for contrast enhancement in overlay metrology

Method and apparatus for lithographic mask production

Optics symmetrization for metrology

Structured illumination for contrast enhancement in overlay metrology

Metrology systems and methods

Flexible scatterometry metrology system and method

Discrete polarization scatterometry

Metrology systems and methods

Illumination control

Overlay metrology by pupil phase analysis

Metrology systems and methods

Apparatus and methods for determining overlay and uses of same

Method and apparatus for increasing metrology or inspection tool th...

Apparatus and methods for determining overlay and uses of same

Optical gain approach for enhancement of overlay and alignment syst...

Order selected overlay metrology

Continuously varying offset mark and methods of determining overlay

Use of overlay diagnostics for enhanced automatic process control

Use of overlay diagnostics for enhanced automatic process control

Use of overlay diagnostics for enhanced automatic process control

Autofocusing apparatus and method for high resolution microscope sy...

Imaging apparatus which includes a light-valve array having electro...

Patents Applicationslast 30 patents

Structured Illumination for Contrast Enhancement in Overlay Metrology

Structured Illumination for Contrast Enhancement in Overlay Metrology

NEAR FIELD METROLOGY

Metrology Systems and Methods

Metrology Systems and Methods

OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS

ILLUMINATION CONTROL

STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY

OPTICS SYMMETRIZATION FOR METROLOGY

DISCRETE POLARIZATION SCATTEROMETRY

METROLOGY SYSTEMS AND METHODS

Apparatus and Methods for Determining Overlay and Uses of Same

OPTICAL GAIN APPROACH FOR ENHANCEMENT OF OVERLAY AND ALIGNMENT SYST...

ORDER SELECTED OVERLAY METROLOGY

Use of overlay diagnostics for enhanced automatic process control

Continuously varying offset mark and methods of determining overlay

Use of overlay diagnostics for enhanced automatic process control

Use of overlay diagnostics for enhanced automatic process control