Joerg Zimmermann

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination optical unit and optical system for EUV projection lit...
- Patent number 10,976,668
- Issue date Apr 13, 2021
- Carl Zeiss SMT GmbH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for predicting at least one illumination parameter for evalu...
- Patent number 10,394,128
- Issue date Aug 27, 2019
- Carl Zeiss SMT GmbH
- Ralf Gehrke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for predicting at least one illumination parameter for evalu...
- Patent number 10,078,267
- Issue date Sep 18, 2018
- Carl Zeiss SMT GmbH
- Ralf Gehrke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus...
- Patent number 9,785,052
- Issue date Oct 10, 2017
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting an illumination setting
- Patent number 9,690,203
- Issue date Jun 27, 2017
- Carl Zeiss SMT GmbH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Collector
- Patent number 9,645,503
- Issue date May 9, 2017
- Carl Zeiss SMT GmbH
- Ingo Saenger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination system for an EUV lithography device and facet mirror...
- Patent number 9,551,941
- Issue date Jan 24, 2017
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for projection lithography
- Patent number 9,507,269
- Issue date Nov 29, 2016
- Carl Zeiss SMT GmbH
- Christoph Hennerkes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus...
- Patent number 9,500,956
- Issue date Nov 22, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus
- Patent number 9,323,156
- Issue date Apr 26, 2016
- Carl Zeiss SMT GmbH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and projection exposure apparatus for mi...
- Patent number 7,800,732
- Issue date Sep 21, 2010
- Carl Zeiss SMT AG
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ILLUMINATION OPTICAL UNIT AND OPTICAL SYSTEM FOR EUV PROJECTION LIT...
- Publication number 20200041911
- Publication date Feb 6, 2020
- Carl Zeiss SMT GMBH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREDICTING AT LEAST ONE ILLUMINATION PARAMETER FOR EVALU...
- Publication number 20190004432
- Publication date Jan 3, 2019
- Carl Zeiss SMT GMBH
- Ralf Gehrke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREDICTING AT LEAST ONE ILLUMINATION PARAMETER FOR EVALU...
- Publication number 20170212426
- Publication date Jul 27, 2017
- Carl Zeiss SMT GMBH
- Ralf Gehrke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR...
- Publication number 20160004164
- Publication date Jan 7, 2016
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ADJUSTING AN ILLUMINATION SETTING
- Publication number 20150153652
- Publication date Jun 4, 2015
- Carl Zeiss SMT GMBH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL UNIT AND OPTICAL SYSTEM FOR EUV PROJECTION LIT...
- Publication number 20150042974
- Publication date Feb 12, 2015
- Carl Zeiss SMT GMBH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLLECTOR
- Publication number 20140192339
- Publication date Jul 10, 2014
- Ingo Saenger
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...
- Publication number 20140132942
- Publication date May 15, 2014
- Ingo Saenger
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY
- Publication number 20140111785
- Publication date Apr 24, 2014
- Christoph Hennerkes
- G02 - OPTICS
Information Patent Application
Optical System of a Microlithographic Projection Exposure Apparatus...
- Publication number 20130188160
- Publication date Jul 25, 2013
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20130050673
- Publication date Feb 28, 2013
- Carl Zeiss SMT GMBH
- Ingo Saenger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...
- Publication number 20100157266
- Publication date Jun 24, 2010
- Carl Zeiss SMT AG
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Joerg Zimmermann

Person

Patents Grantslast 30 patents

Illumination optical unit and optical system for EUV projection lit...

Method for predicting at least one illumination parameter for evalu...

Method for predicting at least one illumination parameter for evalu...

Optical system of a microlithographic projection exposure apparatus...

Method for adjusting an illumination setting

Collector

Illumination system for an EUV lithography device and facet mirror...

Illumination optical unit for projection lithography

Optical system of a microlithographic projection exposure apparatus...

Optical system of a microlithographic projection exposure apparatus

Projection exposure method and projection exposure apparatus for mi...

Patents Applicationslast 30 patents

ILLUMINATION OPTICAL UNIT AND OPTICAL SYSTEM FOR EUV PROJECTION LIT...

METHOD FOR PREDICTING AT LEAST ONE ILLUMINATION PARAMETER FOR EVALU...

METHOD FOR PREDICTING AT LEAST ONE ILLUMINATION PARAMETER FOR EVALU...

ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR...

METHOD FOR ADJUSTING AN ILLUMINATION SETTING

ILLUMINATION OPTICAL UNIT AND OPTICAL SYSTEM FOR EUV PROJECTION LIT...

COLLECTOR

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...

ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY

Optical System of a Microlithographic Projection Exposure Apparatus...

OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MI...