Johan Joost Koning

Person

Delft, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 11,738,376
- Issue date Aug 29, 2023
- ASML Netherlands, B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 10,987,705
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 10,632,509
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Method and system for the removal and/or avoidance of contamination...
- Patent number 9,981,293
- Issue date May 29, 2018
- Mapper Lithography IP B.V.
- Marc Smits
- B08 - CLEANING
Information Patent Grant
Target processing unit
- Patent number 9,941,093
- Issue date Apr 10, 2018
- Mapper Lithography IP B.V.
- Johan Joost Koning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrostatic lens structure
- Patent number RE46452
- Issue date Jun 27, 2017
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
Information Patent Grant
Target processing unit
- Patent number 9,263,234
- Issue date Feb 16, 2016
- Mapper Lithography IP B.V.
- Johan Joost Koning
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Charged particle optical device
- Patent number 9,111,657
- Issue date Aug 18, 2015
- Mapper Lithography IP B.V.
- Sohail Chatoor
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Enhanced integrity projection lens assembly
- Patent number 8,987,679
- Issue date Mar 24, 2015
- Mapper Lithography IP B.V.
- Johan Joost Koning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced integrity projection lens assembly
- Patent number 8,716,671
- Issue date May 6, 2014
- Johan Joost Koning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage shielding arrangement of a charged particle lithograph...
- Patent number 8,624,478
- Issue date Jan 7, 2014
- Mapper Lithography IP B.V.
- Johan Joost Koning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced integrity projection lens assembly
- Patent number 8,362,441
- Issue date Jan 29, 2013
- Mapper Lithography IP B.V.
- Johan Joost Koning
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electrostatic lens structure
- Patent number 8,198,602
- Issue date Jun 12, 2012
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20240017301
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20230352266
- Publication date Nov 2, 2023
- ASML NETHERLANDS B.V.
- Stijn Wilem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20210237129
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Marc SMITS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20200230665
- Publication date Jul 23, 2020
- ASML Netherlands B.V.
- Marc SMITS
- B08 - CLEANING
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20180236505
- Publication date Aug 23, 2018
- MAPPER LITHOGRAPHY IP BV
- Marc Smits
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC LENS STRUCTURE
- Publication number 20170309438
- Publication date Oct 26, 2017
- MAPPER LITHOGRAPHY IP BV
- Stijn Willem Herman Karel STEENBRINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...
- Publication number 20170304878
- Publication date Oct 26, 2017
- MAPPER LITHOGRAPHY IP BV
- Marc Smits
- B08 - CLEANING
Information Patent Application
TARGET PROCESSING UNIT
- Publication number 20160126055
- Publication date May 5, 2016
- MAPPER LITHOGRAPHY IP BV
- Johan Joost Koning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET PROCESSING UNIT
- Publication number 20150090895
- Publication date Apr 2, 2015
- MAPPER LITHOGRAPHY IP BV
- Johan Joost Koning
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CHARGED PARTICLE OPTICAL DEVICE
- Publication number 20150069259
- Publication date Mar 12, 2015
- MAPPER LITHOGRAPHY IP BV
- Sohail Chatoor
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY
- Publication number 20140175300
- Publication date Jun 26, 2014
- JOHAN JOOST KONING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY
- Publication number 20130256554
- Publication date Oct 3, 2013
- Johan Joost Koning
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE METHOD
- Publication number 20110261344
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G01 - MEASURING TESTING
Information Patent Application
ELECTROSTATIC LENS STRUCTURE
- Publication number 20110216299
- Publication date Sep 8, 2011
- MAPPER LITHOGRAPHY IP BV
- Stijn Willem STEENBRINK
- B82 - NANO-TECHNOLOGY
Information Patent Application
ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY
- Publication number 20110084220
- Publication date Apr 14, 2011
- Johan Joost Koning
- B82 - NANO-TECHNOLOGY
Information Patent Application
HIGH VOLTAGE SHIELDING ARRANGEMENT
- Publication number 20110084592
- Publication date Apr 14, 2011
- Johan Joost Koning
- H01 - BASIC ELECTRIC ELEMENTS

Johan Joost Koning

Person

Patents Grantslast 30 patents

Method and system for the removal and/or avoidance of contamination...

Method and system for the removal and/or avoidance of contamination...

Method and system for the removal and/or avoidance of contamination...

Method and system for the removal and/or avoidance of contamination...

Target processing unit

Electrostatic lens structure

Target processing unit

Charged particle optical device

Enhanced integrity projection lens assembly

Enhanced integrity projection lens assembly

High voltage shielding arrangement of a charged particle lithograph...

Enhanced integrity projection lens assembly

Electrostatic lens structure

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

ELECTRON-OPTICAL DEVICE

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

ELECTROSTATIC LENS STRUCTURE

METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION...

TARGET PROCESSING UNIT

TARGET PROCESSING UNIT

CHARGED PARTICLE OPTICAL DEVICE

ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY

ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY

EXPOSURE METHOD

ELECTROSTATIC LENS STRUCTURE

ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY

HIGH VOLTAGE SHIELDING ARRANGEMENT