Johan Maria Van Boxmeer

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Saint Oedenrode, NL

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Patents Grantslast 30 patents

Information Patent Grant
Method of determining an optimal focus height for a metrology appar...
- Patent number 10,571,363
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optimizing the position and/or size of a measurement illu...
- Patent number 10,488,765
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Johan Maria Van Boxmeer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scatterometer and lithographic apparatus
- Patent number 8,994,921
- Issue date Mar 31, 2015
- ASML Netherlands B.V.
- Johan Maria Van Boxmeer
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus lithographic apparatus, lithographi...
- Patent number 7,869,022
- Issue date Jan 11, 2011
- ASML Netherlands B.V.
- Johan Maria Van Boxmeer
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus, method of exposing a substrate, method of m...
- Patent number 7,835,017
- Issue date Nov 16, 2010
- ASML Netherlands B.V.
- Theodorus Marinus Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...
- Publication number 20190242782
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING
Information Patent Application
Method of Optimizing the Position and/or Size of a Measurement Illu...
- Publication number 20190107786
- Publication date Apr 11, 2019
- ASML NETHERLANDS B.V.
- Johan Maria VAN BOXMEER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCATTEROMETER AND LITHOGRAPHIC APPARATUS
- Publication number 20110261339
- Publication date Oct 27, 2011
- ASML Netherlands B.V.
- Johan Maria Van Boxmeer
- G01 - MEASURING TESTING
Information Patent Application
Focus Sensor, Inspection Apparatus, Lithographic Apparatus and Cont...
- Publication number 20110102774
- Publication date May 5, 2011
- ASML NETHERLANDS B.V.
- Arnold Sinke
- G02 - OPTICS
Information Patent Application
Lithographic Apparatus, Method of Exposing a Substrate, Method of M...
- Publication number 20070252963
- Publication date Nov 1, 2007
- ASML NETHERLANDS B.V.
- Theodorus Marinus Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY