Johanes Swenberg

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gate all around I/O engineering
- Patent number 11,923,441
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Steven C. H. Hung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injector with baffle
- Patent number 11,529,592
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate interface engineering with doped layer
- Patent number 11,456,178
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate all around I/O engineering
- Patent number 11,450,759
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal oxidation processes for 3D NAND
- Patent number 11,322,347
- Issue date May 3, 2022
- Applied Materials, Inc.
- Johanes F. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cap oxidation for FinFET formation
- Patent number 11,271,097
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Steven C. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffusion barrier layer
- Patent number 11,189,479
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Benjamin Colombeau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injector with baffle
- Patent number 11,077,410
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Argon addition to remote plasma oxidation
- Patent number 11,081,340
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Hansel Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film treatment process
- Patent number 10,971,357
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 10,872,763
- Issue date Dec 22, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Argon addition to remote plasma oxidation
- Patent number 10,636,650
- Issue date Apr 28, 2020
- Applied Materials, Inc.
- Hansel Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorination during ALD high-k, fluorination post high-k and use of...
- Patent number 10,580,643
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Johanes S. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenation and nitridization processes for modifying effective o...
- Patent number 10,510,545
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Houda Graoui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenation and nitridization processes for reducing oxygen conte...
- Patent number 10,504,779
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Johanes S. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenation and nitridization processes for modifying effective o...
- Patent number 10,431,466
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Johanes S. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modifying work function of a metal film with a plasma process
- Patent number 10,347,492
- Issue date Jul 9, 2019
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenation and nitridization processes for reducing oxygen conte...
- Patent number 10,236,207
- Issue date Mar 19, 2019
- Applied Materials, Inc.
- Johanes S. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenation and nitridization processes for modifying effective o...
- Patent number 10,103,027
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- Johanes S. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices suitable for narrow pitch applications and me...
- Patent number 9,530,898
- Issue date Dec 27, 2016
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for selective oxidation of a substrate
- Patent number 9,514,968
- Issue date Dec 6, 2016
- Applied Materials, Inc.
- Agus Tjandra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
NH3 containing plasma nitridation of a layer on a substrate
- Patent number 9,054,048
- Issue date Jun 9, 2015
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing substrates using an ion shield
- Patent number 9,048,190
- Issue date Jun 2, 2015
- Applied Materials, Inc.
- Jeffrey Tobin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for single step selective nitridation
- Patent number 9,023,700
- Issue date May 5, 2015
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for conformal treatment of dielectric films using inductivel...
- Patent number 9,012,336
- Issue date Apr 21, 2015
- Applied Materials, Inc.
- Heng Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling edge performance in an inducti...
- Patent number 8,999,106
- Issue date Apr 7, 2015
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for selective oxidation of a substrate
- Patent number 8,993,458
- Issue date Mar 31, 2015
- Applied Materials, Inc.
- Agus Tjandra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices suitable for narrow pitch applications and me...
- Patent number 8,871,645
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote radical hydride dopant incorporation for delta doping in sil...
- Patent number 8,846,509
- Issue date Sep 30, 2014
- Applied Materials, Inc.
- Christopher S. Olsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for single step selective nitridation
- Patent number 8,748,259
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEGMENTED FORMATION OF GATE INTERFACE
- Publication number 20240339318
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240234133
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gate All Around I/O Engineering
- Publication number 20220399457
- Publication date Dec 15, 2022
- Applied Materials, Inc.
- Steven C.H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE INTERFACE ENGINEERING WITH DOPED LAYER
- Publication number 20210398814
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Steven C. H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS INJECTOR WITH BAFFLE
- Publication number 20210322934
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Treatments To Improve Device Performance
- Publication number 20210193468
- Publication date Jun 24, 2021
- Applied Materials, Inc.
- Steven C.H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAP OXIDATION FOR FINFET FORMATION
- Publication number 20210134986
- Publication date May 6, 2021
- Applied Materials, Inc.
- Steven C. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate All Around I/O Engineering
- Publication number 20210104617
- Publication date Apr 8, 2021
- Applied Materials, Inc.
- Steven C.H. Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diffusion Barrier Layer
- Publication number 20200357629
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Benjamin Colombeau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20200350157
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARGON ADDITION TO REMOTE PLASMA OXIDATION
- Publication number 20200251331
- Publication date Aug 6, 2020
- Applied Materials, Inc.
- Hansel LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL OXIDATION PROCESSES FOR 3D NAND
- Publication number 20200194251
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Johanes F. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SILICON-GERMANIUM PRE-CLEAN
- Publication number 20200144397
- Publication date May 7, 2020
- Applied Materials, Inc.
- Abhishek DUBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TREATMENT PROCESS
- Publication number 20200111659
- Publication date Apr 9, 2020
- Applied Materials, Inc.
- Wei LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming Silicon-Containing Layers
- Publication number 20200075332
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Johanes F. Swenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFYING WORK FUNCTION OF A METAL FILM WITH A PLASMA PROCESS
- Publication number 20190287805
- Publication date Sep 19, 2019
- Applied Materials, Inc.
- Steven C. H. HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARGON ADDITION TO REMOTE PLASMA OXIDATION
- Publication number 20190221427
- Publication date Jul 18, 2019
- Applied Materials, Inc.
- Hansel LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...
- Publication number 20190172716
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Houda GRAOUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR REDUCING OXYGEN CONTE...
- Publication number 20190157143
- Publication date May 23, 2019
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...
- Publication number 20190115219
- Publication date Apr 18, 2019
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS INJECTOR WITH BAFFLE
- Publication number 20190105614
- Publication date Apr 11, 2019
- Applied Materials, Inc.
- Vishwas Kumar PANDEY
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
MODIFYING WORK FUNCTION OF A METAL FILM WITH A PLASMA PROCESS
- Publication number 20180218911
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Steven C. H. HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...
- Publication number 20170365480
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATION AND NITRIDIZATION PROCESSES FOR REDUCING OXYGEN CONTE...
- Publication number 20170365512
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINATION DURING ALD HIGH-K, FLUORINATION POST HIGH-K AND USE OF...
- Publication number 20170236702
- Publication date Aug 17, 2017
- Applied Materials, Inc.
- Johanes S. SWENBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING SUBSTRATES USING AN ION SHIELD
- Publication number 20150332941
- Publication date Nov 19, 2015
- Applied Materials, Inc.
- JEFFREY TOBIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SELECTIVE OXIDATION OF A SUBSTRATE
- Publication number 20150206777
- Publication date Jul 23, 2015
- Applied Materials, Inc.
- AGUS TJANDRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES SUITABLE FOR NARROW PITCH APPLICATIONS AND ME...
- Publication number 20150102396
- Publication date Apr 16, 2015
- Applied Materials, Inc.
- UDAYAN GANGULY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR SINGLE STEP SELECTIVE NITRIDATION
- Publication number 20140342543
- Publication date Nov 20, 2014
- Udayan GANGULY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Conformal Treatment of Dielectric Films Us...
- Publication number 20140302686
- Publication date Oct 9, 2014
- Heng Pan
- H01 - BASIC ELECTRIC ELEMENTS

Johanes Swenberg

Person

Patents Grantslast 30 patents

Gate all around I/O engineering

Gas injector with baffle

Gate interface engineering with doped layer

Gate all around I/O engineering

Conformal oxidation processes for 3D NAND

Cap oxidation for FinFET formation

Diffusion barrier layer

Gas injector with baffle

Argon addition to remote plasma oxidation

Thin film treatment process

Treatments to enhance material structures

Argon addition to remote plasma oxidation

Fluorination during ALD high-k, fluorination post high-k and use of...

Hydrogenation and nitridization processes for modifying effective o...

Hydrogenation and nitridization processes for reducing oxygen conte...

Hydrogenation and nitridization processes for modifying effective o...

Modifying work function of a metal film with a plasma process

Hydrogenation and nitridization processes for reducing oxygen conte...

Hydrogenation and nitridization processes for modifying effective o...

Semiconductor devices suitable for narrow pitch applications and me...

Methods and apparatus for selective oxidation of a substrate

NH3 containing plasma nitridation of a layer on a substrate

Methods and apparatus for processing substrates using an ion shield

Method and apparatus for single step selective nitridation

Method for conformal treatment of dielectric films using inductivel...

Apparatus and method for controlling edge performance in an inducti...

Methods and apparatus for selective oxidation of a substrate

Semiconductor devices suitable for narrow pitch applications and me...

Remote radical hydride dopant incorporation for delta doping in sil...

Method and apparatus for single step selective nitridation

Patents Applicationslast 30 patents

SEGMENTED FORMATION OF GATE INTERFACE

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

Gate All Around I/O Engineering

GATE INTERFACE ENGINEERING WITH DOPED LAYER

GAS INJECTOR WITH BAFFLE

Treatments To Improve Device Performance

CAP OXIDATION FOR FINFET FORMATION

Gate All Around I/O Engineering

Diffusion Barrier Layer

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

ARGON ADDITION TO REMOTE PLASMA OXIDATION

CONFORMAL OXIDATION PROCESSES FOR 3D NAND

METHODS AND APPARATUS FOR SILICON-GERMANIUM PRE-CLEAN

THIN FILM TREATMENT PROCESS

Methods Of Forming Silicon-Containing Layers

MODIFYING WORK FUNCTION OF A METAL FILM WITH A PLASMA PROCESS

ARGON ADDITION TO REMOTE PLASMA OXIDATION

HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...

HYDROGENATION AND NITRIDIZATION PROCESSES FOR REDUCING OXYGEN CONTE...

HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...

GAS INJECTOR WITH BAFFLE

MODIFYING WORK FUNCTION OF A METAL FILM WITH A PLASMA PROCESS

HYDROGENATION AND NITRIDIZATION PROCESSES FOR MODIFYING EFFECTIVE O...

HYDROGENATION AND NITRIDIZATION PROCESSES FOR REDUCING OXYGEN CONTE...

FLUORINATION DURING ALD HIGH-K, FLUORINATION POST HIGH-K AND USE OF...

METHODS AND APPARATUS FOR PROCESSING SUBSTRATES USING AN ION SHIELD

METHODS AND APPARATUS FOR SELECTIVE OXIDATION OF A SUBSTRATE

SEMICONDUCTOR DEVICES SUITABLE FOR NARROW PITCH APPLICATIONS AND ME...

METHOD AND APPARATUS FOR SINGLE STEP SELECTIVE NITRIDATION

Apparatus and Method for Conformal Treatment of Dielectric Films Us...