Johann Trenkler

Person

Schwabisch Gmund, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective optical element and EUV lithography appliance
- Patent number 9,910,193
- Issue date Mar 6, 2018
- Carl Zeiss SMT GmbH
- Johann Trenkler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection objective and method for its manufacture
- Patent number 8,944,615
- Issue date Feb 3, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Reflective optical element and EUV lithography appliance
- Patent number 8,891,163
- Issue date Nov 18, 2014
- Carl Zeiss SMT GmbH
- Johann Trenkler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element and EUV lithography appliance
- Patent number 8,537,460
- Issue date Sep 17, 2013
- Carl Zeiss SMT GmbH
- Johann Trenkler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element and EUV lithography appliance
- Patent number 8,243,364
- Issue date Aug 14, 2012
- Carl Zeiss SMT GmbH
- Johann Trenkler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection objective for microlithography, projection exposure appa...
- Patent number 8,228,483
- Issue date Jul 24, 2012
- Carl Zeiss SMT GmbH
- Ulrich Loering
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Optical element for radiation in the EUV and/or soft X-ray region a...
- Patent number 8,164,077
- Issue date Apr 24, 2012
- Carl Zeiss SMT GmbH
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element and EUV lithography appliance
- Patent number 7,952,797
- Issue date May 31, 2011
- Carl Zeiss SMT GmbH
- Johann Trenkler
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element for radiation in the EUV and/or soft X-ray region a...
- Patent number 7,646,004
- Issue date Jan 12, 2010
- Carl Zeiss SMT AG
- Marco Wedowski
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Protective coating system for reflective optical elements, reflecti...
- Patent number 7,629,055
- Issue date Dec 8, 2009
- Carl Zeiss SMT AG
- Johann Trenkler
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection objective and method for its manufacture
- Patent number 7,429,116
- Issue date Sep 30, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for cleaning a surface of a component of a lithographic proj...
- Patent number 7,116,394
- Issue date Oct 3, 2006
- ASML Netherlands B.V.
- Levinus Pieter Bakker
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
- Publication number 20180224585
- Publication date Aug 9, 2018
- Carl Zeiss SMT GMBH
- Johann TRENKLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
- Publication number 20150055111
- Publication date Feb 26, 2015
- Carl Zeiss SMT GMBH
- Johann Trenkler
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
- Publication number 20130301023
- Publication date Nov 14, 2013
- Johann Trenkler
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
- Publication number 20120293779
- Publication date Nov 22, 2012
- CARL ZEISS SMT GMBH
- Johann TRENKLER
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
- Publication number 20110228237
- Publication date Sep 22, 2011
- Carl Zeiss SMT GMBH
- Johann TRENKLER
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...
- Publication number 20100195070
- Publication date Aug 5, 2010
- Carl Zeiss SMT AG
- Ulrich Loering
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE
- Publication number 20100149517
- Publication date Jun 17, 2010
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION A...
- Publication number 20100067653
- Publication date Mar 18, 2010
- Carl Zeiss SMT AG
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
- Publication number 20090251772
- Publication date Oct 8, 2009
- Carl Zeiss SMT AG
- Johann TRENKLER
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE
- Publication number 20090015951
- Publication date Jan 15, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Optical element for radiation in the EUV and/or soft X-ray region a...
- Publication number 20070114466
- Publication date May 24, 2007
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflective optical element and EUV lithography appliance
- Publication number 20060066940
- Publication date Mar 30, 2006
- Johann Trenkler
- G02 - OPTICS
Information Patent Application
Protective coating system for reflective optical elements, reflecti...
- Publication number 20050276988
- Publication date Dec 15, 2005
- Johann Trenkler
- G02 - OPTICS
Information Patent Application
Projection objective and method for its manufacture
- Publication number 20050134980
- Publication date Jun 23, 2005
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Method for cleaning a surface of a component of a lithographic proj...
- Publication number 20040218157
- Publication date Nov 4, 2004
- ASML NETHERLANDS B.V.
- Levinus Pieter Bakker
- B08 - CLEANING

Johann Trenkler

Person

Patents Grantslast 30 patents

Reflective optical element and EUV lithography appliance

Projection objective and method for its manufacture

Reflective optical element and EUV lithography appliance

Reflective optical element and EUV lithography appliance

Reflective optical element and EUV lithography appliance

Projection objective for microlithography, projection exposure appa...

Optical element for radiation in the EUV and/or soft X-ray region a...

Reflective optical element and EUV lithography appliance

Optical element for radiation in the EUV and/or soft X-ray region a...

Protective coating system for reflective optical elements, reflecti...

Projection objective and method for its manufacture

Method for cleaning a surface of a component of a lithographic proj...

Patents Applicationslast 30 patents

REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE

REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE

REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE

REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE

REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPA...

PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE

OPTICAL ELEMENT FOR RADIATION IN THE EUV AND/OR SOFT X-RAY REGION A...

REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE

PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE

Optical element for radiation in the EUV and/or soft X-ray region a...

Reflective optical element and EUV lithography appliance

Protective coating system for reflective optical elements, reflecti...

Projection objective and method for its manufacture

Method for cleaning a surface of a component of a lithographic proj...