Johannes Andreas Henricus Maria Jacobs

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Veldhoven, NL

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Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus, reticle masking device for a lithographic a...
- Patent number 7,307,689
- Issue date Dec 11, 2007
- ASML Netherlands B.V.
- Maurice Philippe Du Mee
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Gas flushing system for use in lithographic apparatus
- Patent number 6,933,513
- Issue date Aug 23, 2005
- ASML Netherlands B.V.
- Tjarko Adriaan Rudolf Van Empel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Actuator
- Publication number 20120162628
- Publication date Jun 28, 2012
- ASML NETHERLANDS B.V.
- Fredrik Wilhelm Van Der Blij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, reticle masking device for a lithographic a...
- Publication number 20060139615
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Maurice Philippe Du Mee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY