Johannes Christiaan Franken

Person

Knegsel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 10,394,141
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Michel Riepen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 9,753,383
- Issue date Sep 5, 2017
- ASML Netherlands B.V.
- Michel Riepen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source for an EUV optical lithographic apparatus, and lit...
- Patent number 9,753,372
- Issue date Sep 5, 2017
- ASML Netherlands B.V.
- Johannes Christiaan Leonardus Franken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conduit system for a lithographic apparatus, lithographic apparatus...
- Patent number 8,976,332
- Issue date Mar 10, 2015
- ASML Netherlands B.V.
- Martinus Wilhelmus Van Den Heuvel
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Lithographic apparatus, a radiation system, a device manufacturing...
- Patent number 8,736,806
- Issue date May 27, 2014
- ASML Netherlands B.V.
- Olav Waldemar Vladimir Frijns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and use of a r...
- Patent number 7,897,941
- Issue date Mar 1, 2011
- ASML Netherlands B.V.
- Johannes Christiaan Leonardus Franken
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Apparatus comprising a rotating contaminant trap
- Patent number 7,889,312
- Issue date Feb 15, 2011
- ASML Netherlands B.V.
- Johannes Christiaan Leonardus Franken
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for removal of deposition on an optical element, lithographi...
- Patent number 7,868,304
- Issue date Jan 11, 2011
- ASML Netherlands B.V.
- Levinus Pieter Bakker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation system and lithographic apparatus comprising the same
- Patent number 7,863,591
- Issue date Jan 4, 2011
- ASML Netherlands B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G01 - MEASURING TESTING
Information Patent Grant
Conduit system for a lithographic apparatus, lithographic apparatus...
- Patent number 7,843,548
- Issue date Nov 30, 2010
- ASML Netherlands B.V.
- Martinus Wilhelmus Van Den Heuvel
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Device arranged to measure a quantity relating to radiation and lit...
- Patent number 7,724,349
- Issue date May 25, 2010
- ASML Netherlands B.V.
- Wouter Anthon Soer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation system and lithographic apparatus comprising the same
- Patent number 7,541,603
- Issue date Jun 2, 2009
- ASML Netherlands B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- G01 - MEASURING TESTING
Information Patent Grant
Radiation source
- Patent number 7,501,642
- Issue date Mar 10, 2009
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus, device manufacturing method, and use of a r...
- Patent number 7,462,841
- Issue date Dec 9, 2008
- ASML Netherlands B.V.
- Johannes Christiaan Leonardus Franken
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 7,098,994
- Issue date Aug 29, 2006
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Radiation Source and Lithographic Apparatus
- Publication number 20170322499
- Publication date Nov 9, 2017
- ASML NETHERLANDS B.V.
- Michel RIEPEN
- F15 - FLUID-PRESSURE ACTUATORS HYDRAULICS OR PNEUMATICS IN GENERAL
Information Patent Application
Radiation Source for an EUV Optical Lithographic Apparatus, and Lit...
- Publication number 20160147160
- Publication date May 26, 2016
- ASML NETHERLANDS B.V.
- Johannes Christiaan Leonardus FRANKEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Collector, Radiation Source and Lithographic Apparatus
- Publication number 20160041374
- Publication date Feb 11, 2016
- ASML NETHERLANDS B.V.
- Ivo VANDERHALLEN
- G02 - OPTICS
Information Patent Application
Radiation Source and Lithographic Apparatus
- Publication number 20150338753
- Publication date Nov 26, 2015
- ASML NETHERLANDS B.V.
- Michel RIEPEN
- F15 - FLUID-PRESSURE ACTUATORS HYDRAULICS OR PNEUMATICS IN GENERAL
Information Patent Application
Lithographic Apparatus, a Radiation System, a Device Manufacturing...
- Publication number 20110242516
- Publication date Oct 6, 2011
- ASML NETHERLANDS B.V.
- Olav Waldemar Vladimir Frijns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP
- Publication number 20110096308
- Publication date Apr 28, 2011
- ASML NETHERLANDS B.V.
- Johannes Christiaan Leonardus FRANKEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
CONDUIT SYSTEM FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS...
- Publication number 20110032497
- Publication date Feb 10, 2011
- ASML NETHERLANDS B.V.
- Martinus Wilhelmus VAN DEN HEUVEL
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Apparatus comprising a rotating contaminant trap
- Publication number 20100259733
- Publication date Oct 14, 2010
- ASML NETHERLANDS B.V.
- Johannes Christiaan Franken
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radiation System and Lithographic Apparatus Comprising the Same
- Publication number 20090309048
- Publication date Dec 17, 2009
- ASML NETHERLANDS B.V.
- Maarten Marinus Johannes Wilhelmus VAN HERPEN
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus, device manufacturing method, and use of a r...
- Publication number 20090066924
- Publication date Mar 12, 2009
- ASML NETHERLANDS B.V.
- Johannes Christiaan Leonardus Franken
- F24 - HEATING RANGES VENTILATING
Information Patent Application
Device arranged to measure a quantity relating to radiation and lit...
- Publication number 20080273188
- Publication date Nov 6, 2008
- ASML NETHERLANDS B.V.
- Wouter Anthon Soer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Conduit system for a lithographic apparatus, lithographic apparatus...
- Publication number 20080143001
- Publication date Jun 19, 2008
- ASML NETHERLANDS B.V.
- Martinus Wilhelmus Van Den Heuvel
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Radiation source
- Publication number 20070152175
- Publication date Jul 5, 2007
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Johannes Christiaan Franken

Person

Patents Grantslast 30 patents

Radiation source and lithographic apparatus

Radiation source and lithographic apparatus

Radiation source for an EUV optical lithographic apparatus, and lit...

Conduit system for a lithographic apparatus, lithographic apparatus...

Lithographic apparatus, a radiation system, a device manufacturing...

Lithographic apparatus, device manufacturing method, and use of a r...

Apparatus comprising a rotating contaminant trap

Method for removal of deposition on an optical element, lithographi...

Radiation system and lithographic apparatus comprising the same

Conduit system for a lithographic apparatus, lithographic apparatus...

Device arranged to measure a quantity relating to radiation and lit...

Radiation system and lithographic apparatus comprising the same

Radiation source

Lithographic apparatus, device manufacturing method, and use of a r...

Lithographic apparatus, device manufacturing method, and device man...

Patents Applicationslast 30 patents

Radiation Source and Lithographic Apparatus

Radiation Source for an EUV Optical Lithographic Apparatus, and Lit...

Radiation Collector, Radiation Source and Lithographic Apparatus

Radiation Source and Lithographic Apparatus

Lithographic Apparatus, a Radiation System, a Device Manufacturing...

APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP

CONDUIT SYSTEM FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS...

Apparatus comprising a rotating contaminant trap

Radiation System and Lithographic Apparatus Comprising the Same

Lithographic apparatus, device manufacturing method, and use of a r...

Device arranged to measure a quantity relating to radiation and lit...

Conduit system for a lithographic apparatus, lithographic apparatus...

Radiation source