Johannes Christiaan Maria JASPER

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Patterning process improvement involving optical aberration
- Patent number 11,422,472
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Paulus Jacobus Maria Van Adrichem
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,146,142
- Issue date Dec 4, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic method and apparatus
- Patent number 9,904,180
- Issue date Feb 27, 2018
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 9,791,787
- Issue date Oct 17, 2017
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,606,448
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,442,388
- Issue date Sep 13, 2016
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithographic method and assembly
- Patent number 9,423,701
- Issue date Aug 23, 2016
- ASML Netherlands B.V.
- Shaoxian Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 9,304,411
- Issue date Apr 5, 2016
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,681,309
- Issue date Mar 25, 2014
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas manifold, module for a lithographic apparatus, lithographic app...
- Patent number 8,675,169
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Frank Johannes Jacobus Van Boxtel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis leveling in lithographic projection apparatus
- Patent number 7,019,815
- Issue date Mar 28, 2006
- ASML Netherlands B.V.
- Johannes C. M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis levelling in lithographic projection apparatus
- Patent number 6,674,510
- Issue date Jan 6, 2004
- ASML Netherlands B.V.
- Johannes C. M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic apparatus
- Patent number 6,239,862
- Issue date May 29, 2001
- ASM Lithography B.V.
- Johannes C. H. Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic apparatus
- Patent number 6,067,146
- Issue date May 23, 2000
- ASM Lithography B.V.
- Johannes C. H. Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning-slit exposure device
- Patent number 5,889,580
- Issue date Mar 30, 1999
- ASM Lithography BV
- Johannes C.M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERNING PROCESS IMPROVEMENT INVOLVING OPTICAL ABERRATION
- Publication number 20210165332
- Publication date Jun 3, 2021
- ASML NETHERLANDS B.V.
- Paulus Jacobus Maria VAN ADRICHEM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190086819
- Publication date Mar 21, 2019
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20170160650
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20160062243
- Publication date Mar 3, 2016
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20150346606
- Publication date Dec 3, 2015
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140071420
- Publication date Mar 13, 2014
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20130235361
- Publication date Sep 12, 2013
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070030469
- Publication date Feb 8, 2007
- ASML NETHERLANDS B.V.
- Johannes Christiaan Maria Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20060176459
- Publication date Aug 10, 2006
- ASML NETHERLANDS B.V.
- Theodorus Marinus Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20050157281
- Publication date Jul 21, 2005
- ASML NETHERLANDS B.V.
- Johannes C.M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing methods, mask and meth...
- Publication number 20050140949
- Publication date Jun 30, 2005
- ASML NETHERLANDS B.V.
- Johannes Christiaan Maria Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050122498
- Publication date Jun 9, 2005
- ASML NETHERLANDS B.V.
- Johannes Christiaan Maria Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050094119
- Publication date May 5, 2005
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20050088638
- Publication date Apr 28, 2005
- ASML NETHERLANDS B.V.
- Johannes C.M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20040080737
- Publication date Apr 29, 2004
- ASML NETHERLANDS B.V.
- Johannes Christiaan Maria Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Johannes Christiaan Maria JASPER

Person

Patents Grantslast 30 patents

Patterning process improvement involving optical aberration

Lithographic apparatus and device manufacturing method

Lithographic method and apparatus

Lithographic method and apparatus

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic method and assembly

Lithographic method and apparatus

Lithographic apparatus and device manufacturing method

Gas manifold, module for a lithographic apparatus, lithographic app...

Off-axis leveling in lithographic projection apparatus

Off-axis levelling in lithographic projection apparatus

Photolithographic apparatus

Photolithographic apparatus

Scanning-slit exposure device

Patents Applicationslast 30 patents

PATTERNING PROCESS IMPROVEMENT INVOLVING OPTICAL ABERRATION

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic Method and Apparatus

Lithographic Method and Apparatus

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Lithographic Method and Apparatus

Lithographic apparatus and device manufacturing method

Off-axis levelling in lithographic projection apparatus

Off-axis levelling in lithographic projection apparatus

Lithographic apparatus, device manufacturing methods, mask and meth...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Off-axis levelling in lithographic projection apparatus

Off-axis levelling in lithographic projection apparatus