Johannes D. de Veer

Person

Menlo Park, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Overlay metrology on bonded wafers
- Patent number 11,309,202
- Issue date Apr 19, 2022
- KLA Corporation
- Shankar Krishnan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spectroscopy with tailored spectral sampling
- Patent number 10,151,631
- Issue date Dec 11, 2018
- KLA-Tencor Corporation
- Mark A. Neil
- G01 - MEASURING TESTING
Information Patent Grant
Selectably configurable multiple mode spectroscopic ellipsometry
- Patent number 9,404,872
- Issue date Aug 2, 2016
- KLA-Tencor Corporation
- Haiming Wang
- G01 - MEASURING TESTING
Information Patent Grant
Multiple angles of incidence semiconductor metrology systems and me...
- Patent number 9,310,290
- Issue date Apr 12, 2016
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Grant
Dynamically adjustable semiconductor metrology system
- Patent number 9,228,943
- Issue date Jan 5, 2016
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Grant
Light source tracking in optical metrology system
- Patent number 9,146,156
- Issue date Sep 29, 2015
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Grant
Multiple angles of incidence semiconductor metrology systems and me...
- Patent number 9,116,103
- Issue date Aug 25, 2015
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Grant
Discrete polarization scatterometry
- Patent number 8,896,832
- Issue date Nov 25, 2014
- KLA-Tencor Corp.
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods for high aspect ratio and large later...
- Patent number 8,860,937
- Issue date Oct 14, 2014
- KLA-Tencor Corp.
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Optical system polarizer calibration
- Patent number 8,797,534
- Issue date Aug 5, 2014
- KLA-Tencor Corporation
- Johannes D. de Veer
- G01 - MEASURING TESTING
Information Patent Grant
Optical system polarizer calibration
- Patent number 8,570,514
- Issue date Oct 29, 2013
- KLA-Tencor Corporation
- Johannes D. de Veer
- G01 - MEASURING TESTING
Information Patent Grant
Optical film topography and thickness measurement
- Patent number 6,999,180
- Issue date Feb 14, 2006
- KLA-Tencor Technologies Corporation
- Gary R. Janik
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
OVERLAY METROLOGY ON BONDED WAFERS
- Publication number 20210242060
- Publication date Aug 5, 2021
- KLA Corporation
- Shankar Krishnan
- G01 - MEASURING TESTING
Information Patent Application
Spectroscopy with Tailored Spectral Sampling
- Publication number 20180094978
- Publication date Apr 5, 2018
- KLA-Tencor Corporation
- Mark A. Neil
- G01 - MEASURING TESTING
Information Patent Application
MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND ME...
- Publication number 20150285735
- Publication date Oct 8, 2015
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND ME...
- Publication number 20140375981
- Publication date Dec 25, 2014
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
Optical System Polarizer Calibration
- Publication number 20140043608
- Publication date Feb 13, 2014
- KLA-Tencor Corporation
- Johannes D. de Veer
- G01 - MEASURING TESTING
Information Patent Application
Dynamically Adjustable Semiconductor Metrology System
- Publication number 20130114085
- Publication date May 9, 2013
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM
- Publication number 20130033704
- Publication date Feb 7, 2013
- KLA-Tencor Corporation
- Guorong V. Zhuang
- G01 - MEASURING TESTING
Information Patent Application
Optical System Polarizer Calibration
- Publication number 20120320377
- Publication date Dec 20, 2012
- KLA-Tencor Corporation
- Johannes D. de Veer
- G01 - MEASURING TESTING
Information Patent Application
DISCRETE POLARIZATION SCATTEROMETRY
- Publication number 20110310388
- Publication date Dec 22, 2011
- KLA-Tencor Corporation
- Andrew V. Hill
- G02 - OPTICS

Johannes D. de Veer

Person

Patents Grantslast 30 patents

Overlay metrology on bonded wafers

Spectroscopy with tailored spectral sampling

Selectably configurable multiple mode spectroscopic ellipsometry

Multiple angles of incidence semiconductor metrology systems and me...

Dynamically adjustable semiconductor metrology system

Light source tracking in optical metrology system

Multiple angles of incidence semiconductor metrology systems and me...

Discrete polarization scatterometry

Metrology systems and methods for high aspect ratio and large later...

Optical system polarizer calibration

Optical system polarizer calibration

Optical film topography and thickness measurement

Patents Applicationslast 30 patents

OVERLAY METROLOGY ON BONDED WAFERS

Spectroscopy with Tailored Spectral Sampling

MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND ME...

MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND ME...

Optical System Polarizer Calibration

Dynamically Adjustable Semiconductor Metrology System

LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM

Optical System Polarizer Calibration

DISCRETE POLARIZATION SCATTEROMETRY